Granted Patent B2

US 12,355,055 · App. 18/347,034 · Granted Jul 8, 2025

Inventors: James Watkins (South Hadley, MA); Michael R. Beaulieu (Chicopee, MA); Nicholas R. Hendricks (South Deerfield, MA)

Assignee: UNIVERSITY OF MASSACHUSETTS

H01M4/04G02B1/118H01B1/08H01B3/10H01B13/003H01M6/40H01M8/124H10K71/211B82Y30/00H01M4/0433H01M8/1286H10K30/82H10K50/813H10K2102/331Y02P70/50Y10T428/24893

Abstract

Claims (40)

1. A method of forming a patterned nanostructure, comprising:

applying a first nanoparticle composition to a surface of a substrate, wherein the first nanoparticle composition includes a plurality of first nanoparticles, and wherein the plurality of first nanoparticles has an average particle size of less than 100 nm;

using a first patterned mold to form the first nanoparticle composition into a first patterned nanostructure layer, wherein a first feature size of the first patterned nanostructure layer is less than 5 microns; and

treating the patterned nanostructure to remove organics from the patterned nanostructure.

2. The method of claim 1 , wherein treating the patterned nanostructure to remove organics from the patterned nanostructure includes treating the patterned nanostructure by one or more thermal processes, by one or more hydrothermal processes, by one or more treatments with plasmas, or by one or more UV irradiation processes.

3. The method of claim 1 , further comprising depositing a coating onto the first patterned nanostructure layer using atomic layer deposition.

4. The method of claim 3 , wherein the patterned nanostructure is treated to remove organics from the patterned nanostructure prior to atomic layer deposition.

5. The method of claim 3 , wherein the patterned nanostructure is treated to remove organics from the patterned nanostructure after atomic layer deposition.

6. The method of claim 1 , wherein the first nanoparticle composition includes a ceramic material.

7. The method of claim 1 , wherein using the first patterned mold to form the first nanoparticle composition into the first patterned nanostructure layer comprises pressing the first patterned mold into the first nanoparticle composition.

8. The method of claim 1 , wherein forming the first nanoparticle composition into the first patterned nanostructure layer further comprises using electromagnetic radiation to cure the first nanoparticle composition.

9. The method of claim 1 , wherein the first patterned nanostructure layer has an index of refraction of between 1.5 and 5.0.

10. The method of claim 1 , wherein a geometry of the first patterned nanostructure layer is constructed and arranged to manipulate electromagnetic radiation.

11. An optical device, comprising:

a patterned layer, wherein a feature size of the patterned layer is less than or equal to 5 microns, wherein the patterned layer comprises a composition including:

a plurality of nanoparticles, wherein the plurality of nanoparticles have an average particle size of less than 100 nm; and

a binder,

wherein the patterned layer has been treated to remove organics from the patterned layer.

12. The optical device of claim 11 , wherein the patterned layer has been treated to remove organics from the patterned layer by one or more thermal processes, by one or more hydrothermal processes, by one or more treatments with plasmas, or by one or more UV irradiation processes.

13. The optical device of claim 11 , further comprising:

an atomic layer deposition-deposited coating disposed on the patterned layer.

14. The optical device of claim 13 , wherein the patterned layer is treated to remove organics from the patterned layer prior to atomic layer deposition.

15. The optical device of claim 13 , wherein the patterned layer is treated to remove organics from the patterned layer after atomic layer deposition.

16. The optical device of claim 11 , wherein the plurality of nanoparticles includes a ceramic material.

17. The optical device of claim 11 , wherein the patterned layer is adapted to manipulate electromagnetic radiation.

18. The optical device of claim 11 , wherein the patterned layer has an index of refraction between 1.5 and 3.0.

19. The optical device of claim 11 , wherein the patterned layer is substantially optically transparent at at least one wavelength.

20. The optical device of claim 11 , further comprising:

an optically transparent substrate, and wherein the patterned layer is disposed on the substrate.

21. An optical device, comprising:

a patterned layer, wherein a feature size of the patterned layer is less than or equal to 5 microns, wherein the patterned layer comprises a composition including:

a plurality of nanoparticles, wherein the plurality of nanoparticles have an average particle size of less than 100 nm; and

a binder; and

wherein the device is substantially free of organics.

22. The optical device as in claim 21 , wherein the patterned layer has been treated to remove organics from the patterned layer by one or more thermal processes, by one or more hydrothermal processes, by one or more treatments with plasmas, or by one or more UV irradiation processes.

23. The optical device of claim 21 , further comprising:

an atomic layer deposition-deposited coating disposed on the patterned layer.

24. The optical device of claim 23 , wherein the patterned layer is treated to remove organics from the patterned layer prior to atomic layer deposition.

25. The optical device of claim 23 , wherein the patterned layer is treated to remove organics from the patterned layer after atomic layer deposition.

26. The optical device of claim 11 , wherein the plurality of nanoparticles includes a ceramic material.

Assignments (1)

Continuity (6)

References Cited (117)