Method and system for the remediation of aquatic facilities
The invention relates to a method and system for the continuous treatment of the water of an aquatic facility using an integrated process control system to control a mixed halogen-based treatment comprising chlorine dioxide and a free halogen. The integrated process control system provides versatile control the chlorine dioxide and/or free halogen while employing in-situ generation of chlorine dioxide.
1. A method for controlling a continuous treatment of water of an aquatic facility using mixed halogen-based treatment, the method comprising:
providing a system comprising at least one sanitizer sensor for measuring a relative concentration of free halogen in the water, a pH sensor for measuring a pH of the water, a temperature sensor for measuring a temperature of the water, and a chlorine dioxide sensor for measuring a chlorine dioxide concentration in the water, the at least one sanitizer sensor, the pH sensor, the temperature sensor and the chlorine dioxide sensor being interfaced with a programmable controller;
the programmable controller is interfaced with chemical feed systems that are in fluid contact with the water, resulting in an integrated process control system;
the integrated process control system providing versatile control of the chlorine dioxide concentration and the free halogen concentration by:
measuring the chlorine dioxide concentration by the chlorine dioxide sensor;
measuring the relative concentration of free halogen by the at least one sanitizer sensor;
comparing the chlorine dioxide concentration to a chlorine dioxide setpoint;
comparing the free halogen concentration to a free halogen setpoint;
controlling the chlorine dioxide concentration using accelerated in-situ generation of the chlorine dioxide and/or applying a chlorite donor to the water for in-situ generation of chlorine dioxide using UV activation of chlorite or hypobromous acid activation of chlorite;
controlling the free halogen concentration by applying a free halogen donor to the water, and/or using the accelerated in-situ generation of the chlorine dioxide;
wherein the accelerated in-situ generation of the chlorine dioxide comprises the integrated process control system applying an acid, the free halogen and the chlorite donor to a conduit connected to the water;
allowing the acid, the free halogen and the chlorite donor to react in the conduit to form the chlorine dioxide and residual free halogen, and
supplying the chlorine dioxide and the residual free halogen from the conduit to the water of the aquatic facility.
2. The method according to claim 1 , further comprising: measuring the chlorine dioxide concentration and calculating a chlorine dioxide Ct value by the programmable controller;
sustaining the chlorine dioxide concentration between 0.1 to 1.0 ppm until a targeted chlorine dioxide Ct value is reached,
and wherein the programmable controller records a time and the chlorine dioxide Ct value reached, resets the chlorine dioxide Ct value to zero, then resumes calculating the chlorine dioxide Ct value.
3. The method according to claim 2 , wherein the programmable controller uses an algorithm to calculate the chlorine dioxide Ct value comprising:
Chlorine dioxide Ct value=[(Σ X n )÷ n]×T
Where:
“X n ” is the chlorine dioxide concentration in mg/l (or ppm) recorded at a point in time since beginning a remediation cycle;
“n” is a number of chlorine dioxide values recorded over a period of time since beginning the remediation cycle, and
“T” is the period of time (minutes) that has lapsed since beginning the remediation cycle.
4. The method according to claim 2 , further comprising calculating the chlorine dioxide Ct value based on a rolling average of the chlorine dioxide concentration in the water.
5. The method according to claim 1 , wherein the at least one sanitizer sensor is an ORP sensor.
6. The method according to claim 1 , wherein the at least one sanitizer sensor is an amperometric sensor.
7. The method according to claim 1 , wherein the chemical feed systems to apply the acid and the free halogen comprises an electrolysis device.
8. The method according to claim 1 , further comprising the mixed halogen-based treatment comprising the chlorine dioxide concentration between 0.1 to 1.0 ppm measured as ClO 2 .
9. The method according to claim 8 , wherein the chlorine dioxide concentration is between 0.2 to 0.8 ppm measured as ClO 2 .
10. The method according to claim 9 , wherein the chlorine dioxide concentration is between 0.3 to 0.6 ppm measured as ClO 2 .
11. The method according to claim 1 , further comprising the mixed halogen-based treatment comprising the free halogen concentration between 0.3 to 3.0 ppm reported as Cl 2 .
12. The method according to claim 11 , wherein the free halogen concentration is between 0.4 to 2.5 ppm reported as Cl 2 .
13. The method according to claim 12 , wherein the free halogen concentration is between 0.5 to 2.0 ppm reported as Cl 2 .
14. The method according to claim 1 , wherein the free halogen comprises free chlorine.
15. The method according to claim 1 , wherein the free halogen comprises free bromine.
16. The method according to claim 1 , wherein the free halogen comprises both free chlorine and free bromine.
17. The method according to claim 1 , wherein the accelerated in-situ generation of the chlorine dioxide comprises a molar ratio of the free halogen (reported as Cl 2 ) to the chlorite (reported as ClO 2 − ) is between 0.5:2 to 2:1 respectively.
18. The method according to claim 17 , wherein the molar ratio of the free halogen (reported as Cl 2 ) and the chlorite (reported as ClO 2 − ) is between 0.75:2 to 1.75:1 respectively.
19. The method according to claim 18 , wherein the molar ratio of the free halogen (reported as Cl 2 ) and the chlorite (reported as ClO 2 − ) is between 1:2 to 1:1 respectively.
20. A system for controlling a continuous treatment of water of an aquatic facility using mixed halogen-based treatment, the system comprising:
at least one sanitizer sensor for measuring a relative concentration of free halogen in the water, a pH sensor for measuring a pH of the water, a temperature sensor for measuring a temperature of the water, and a chlorine dioxide sensor for measuring a chlorine dioxide concentration in the water, the at least one sanitizer sensor, the pH sensor, the temperature sensor and the chlorine dioxide sensor being interfaced with a programmable controller;
the programmable controller is interfaced with chemical feed systems that are in fluid contact with the water, resulting in an integrated process control system;
the integrated process control system providing versatile control of the chlorine dioxide concentration and the free halogen concentration by:
measuring the chlorine dioxide concentration by the chlorine dioxide sensor;
measuring the relative concentration of free halogen by the at least one sanitizer sensor;
comparing the chlorine dioxide concentration to a chlorine dioxide setpoint;
comparing the free halogen concentration to a free halogen setpoint;
controlling the chlorine dioxide concentration using accelerated in-situ generation of the chlorine dioxide and/or applying the chlorite donor to the water for in-situ generation of the chlorine dioxide using UV activation of chlorite or hypobromous acid activation of chlorite;
controlling the free halogen concentration by applying a free halogen donor to the water, and/or using the accelerated in-situ generation of chlorine dioxide;
wherein the accelerated in-situ generation of the chlorine dioxide comprises the integrated process control system applying an acid, the free halogen and the chlorite donor to a conduit connected to the water;
allowing the acid, the free halogen and the chlorite donor to react in the conduit to form the chlorine dioxide and residual free halogen, and
supplying the chlorine dioxide and the residual free halogen from the conduit to the water of the aquatic facility.