Gas supply apparatus for substrate processing apparatus
The present inventive concept relates to a gas supply apparatus for a substrate processing apparatus, the gas supply apparatus comprising: a first supply line connected to a first gas spray unit; a plurality of first gas supply devices connected to the first supply line; a first measurement device measuring a first pressure at the first supply line; a second supply line connected to a second gas spray unit; a plurality of second gas supply devices connected to the second supply line; and a second measurement device measuring a second pressure at the second supply line, wherein the first measurement device checks if the first pressure deviates from a first reference value, and the second measurement device checks if the second pressure deviates from a second reference value.
1. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit,
wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value
wherein the gas supply apparatus further comprises:
a control unit setting the first reference value and the second reference value; and
a storage unit accumulating pressure data measured by each of the first measurement module and the second measurement module,
wherein the control unit changes the first reference value and the second reference value by using the pressure data accumulated in the storage unit.
2. The gas supply apparatus of claim 1 , wherein the first gas supply unit comprises a first purge module supplying a purge gas to the first supply line.
3. The gas supply apparatus of claim 2 , wherein the first purge module continuously supplies the purge gas to the first supply line.
4. The gas supply apparatus of claim 1 , wherein the first measurement module compares the first pressure with the first reference value which differs for each of the first gas supply modules.
5. The gas supply apparatus of claim 1 , wherein, when it is checked that the first pressure is outside the first reference value, the first gas supply modules stop supply of a gas.
6. The gas supply apparatus of claim 1 , wherein the first gas supply unit and the second gas supply unit supply a gas to the first gas injection unit and the second gas injection unit installed in a first process chamber included in a substrate processing apparatus.
7. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit, wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value,
the first gas supply unit further comprises a first purge module supplying a purge gas to the first supply line, and
the first measurement module is connected to the first supply line between the first purge module and the first gas supply modules.
8. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit,
wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value,
the first gas supply unit further comprises a first purge module supplying a purge gas to the first supply line, and
when a process gas is supplied to the first supply line, the first measurement module checks whether the first pressure is outside the first reference value.
9. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit, wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value,
the first gas supply unit comprises a first detection module; and
the first detection module detects the first gas supply module injecting a gas where the first pressure is outside the first reference value, from among the first gas supply modules.
10. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit, wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value,
one first gas supply module among the first gas supply modules and one second gas supply module among the second gas supply modules are connected to each other through a first connection module, and
when it is checked by the first measurement module that the first pressure is outside the first reference value on the basis of a gas injected by the first gas supply module connected to the first connection module, the first connection module adjusts a supply amount of a gas.
11. A gas supply apparatus for substrate processing apparatus, the gas supply apparatus comprising:
a first gas supply unit for supplying a gas to a first gas injection unit; and
a second gas supply unit for supplying a gas to a second gas injection unit, wherein:
the first gas supply unit comprises a first supply line connected to the first gas injection unit, a plurality of first gas supply modules connected to the first supply line, and a first measurement module measuring a first pressure of the first supply line,
the second gas supply unit comprises a second supply line connected to the second gas injection unit, a plurality of second gas supply modules connected to the second supply line, and a second measurement module measuring a second pressure of the second supply line,
the first measurement module checks whether the first pressure is outside a first reference value,
the second measurement module checks whether the second pressure is outside a second reference value,
the first gas supply unit supplies a gas to the first gas injection unit installed in a first process chamber included in a substrate processing apparatus, and
the second gas supply unit supplies a gas to the second gas injection unit installed in a second process chamber included in the substrate processing apparatus.