Thermal choke plate
Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a lid plate seated on the chamber body. The lid plate may define a first plurality of apertures and a second plurality of apertures. The systems may include a plurality of lid stacks equal to a number of the first plurality of apertures. Each lid stack may include a choke plate seated on the lid plate along a first surface of the choke plate. The choke plate may define a first aperture axially aligned with an associated aperture of the first plurality of apertures. The choke plate may define a second aperture axially aligned with an associated aperture of the second plurality of apertures. The choke plate may define protrusions extending from each of a top and bottom surface of the choke plate that are arranged substantially symmetrically about the first aperture.
1 . A substrate processing system comprising:
a chamber body defining a transfer region;
a lid plate seated on the chamber body, wherein the lid plate defines a first plurality of apertures through the lid plate and a second plurality of apertures through the lid plate; and
a plurality of lid stacks equal to a number of apertures of the first plurality of apertures defined through the lid plate, wherein the plurality of lid stacks at least partially define a plurality of processing regions vertically offset from the transfer region, and wherein each lid stack of the plurality of lid stacks comprises:
a choke plate seated on the lid plate along a first surface of the choke plate, wherein:
the choke plate defines a first aperture axially aligned with an associated aperture of the first plurality of apertures, and wherein the choke plate defines a second aperture axially aligned with an associated aperture of the second plurality of apertures; and
the choke plate defines a first set of protrusions extending from a first surface of the choke plate, the first set of protrusions being arranged substantially symmetrically about the first aperture;
the choke plate is seated on the lid plate on the first set of protrusions;
the choke plate defines a second set of protrusions extending from a second surface of the choke plate, the second set of protrusions being arranged substantially symmetrically about the first aperture;
a pumping liner seated on the second set of protrusions of the choke plate; and
a faceplate seated on the pumping liner.
2 . The substrate processing system of claim 1 , wherein:
the choke plate comprises a rim defining the first aperture; and
the rim extends along a sidewall of the lid plate defining the associated aperture of the first plurality of apertures.
3 . The substrate processing system of claim 1 , wherein:
the associated aperture of the second plurality of apertures defined through the lid plate and the second aperture defined through the choke plate form a flow channel extending from the pumping liner.
4 . The substrate processing system of claim 1 , wherein:
the choke plate defines a first channel in the second surface of the choke plate radially inward of the second set of protrusions; and
the choke plate defines a second channel in the second surface of the choke plate radially outward of the second set of protrusions.
5 . The substrate processing system of claim 1 , further comprising:
a blocker plate seated on the faceplate.
6 . The substrate processing system of claim 5 , further comprising:
a faceplate heater seated on the faceplate and positioned radially outward of the blocker plate.
7 . The substrate processing system of claim 5 , further comprising:
a gasbox seated on the blocker plate.
8 . The substrate processing system of claim 1 , wherein:
the second aperture defined through the choke plate is laterally offset from the first aperture defined through the choke plate.
9 . The substrate processing system of claim 1 , wherein:
each protrusion of the second set of protrusions is vertically aligned with a protrusion of the first set of protrusions.
10 . The substrate processing system of claim 1 , wherein:
the first surface of the choke plate defines a step that is disposed radially outward from the first set of protrusions.
11 . The substrate processing system of claim 10 , wherein:
the step is recessed relative to the first surface by a distance of between about 0.05 mm and 0.50 mm.
12 . The substrate processing system of claim 1 , wherein:
an outer periphery of the choke plate is generally tear drop-shaped.
13 . The substrate processing system of claim 1 , wherein:
each protrusion of the first set of protrusions and the second set of protrusions has a width of between about 1 mm and 10 mm.
14 . A substrate processing chamber choke plate, comprising:
a plate defining a first aperture through the plate and a second aperture through the plate, wherein:
the second aperture is laterally offset from the first aperture;
the plate defines a first set of protrusions extending from a first surface of the plate, the first set of protrusions being arranged substantially symmetrically about the first aperture; and
the plate defines a second set of protrusions extending from a second surface of the plate opposite the first surface of the plate, the second set of protrusions being arranged substantially symmetrically about the first aperture.
15 . The substrate processing chamber choke plate of claim 14 , wherein:
the plate comprises a rim defining the first aperture, and wherein the rim extends vertically from the first surface of the plate.
16 . The substrate processing chamber choke plate of claim 14 , wherein:
the first set of protrusions are disposed at regular intervals about the first aperture; and
the second set of protrusions are disposed at regular intervals about the first aperture.
17 . The substrate processing chamber choke plate of claim 14 , wherein:
each of the first set of protrusions and the second set of protrusions has a length of between about 5 mm and 50 mm.
18 . The substrate processing chamber choke plate of claim 14 , wherein:
the plate defines a third set of protrusions extending from the first surface of the plate, the third set of protrusions being arranged substantially symmetrically about the second aperture; and
the plate defines a fourth set of protrusions extending from the second surface of the plate, the fourth set of protrusions being arranged substantially symmetrically about the second aperture.
19 . A substrate processing system comprising:
a processing chamber defining a processing region;
a pedestal configured to support a substrate within the processing region;
a choke plate defining a first aperture and a second aperture through the choke plate, wherein:
the choke plate defines a first set of protrusions extending from a first surface of the choke plate, the first set of protrusions being arranged substantially symmetrically about the first aperture; and
the choke plate defines a second set of protrusions extending from a second surface of the plate opposite the first surface of the choke plate, the second set of protrusions being arranged substantially symmetrically about the first aperture;
a pumping liner seated on the choke plate;
a faceplate seated on the pumping liner; and
a blocker plate seated on the faceplate.
20 . The substrate processing system of claim 19 , wherein:
the first set of protrusions is vertically aligned with the second set of protrusions.