Polishing pad, method for manufacturing the same, and method for manufacturing semiconductor device using the same
A polishing pad includes a polishing layer, wherein the polishing layer includes zinc (Zn), and a concentration of the zinc (Zn) is 0.5 ppm to 40 ppm parts by weight based on the total weight of the polishing layer. In an exemplary embodiment, a polishing pad is provided wherein a concentration of the zinc (Zn) is 0.5 ppm to 40 ppm parts by weight based on the total weight of the polishing layer, a concentration of the iron (Fe) is 1 ppm to 50 ppm parts by weight based on the total weight of the polishing layer, and a concentration of the aluminum (Al) is 2 ppm to 50 ppm parts by weight based on the total weight of the polishing layer.
1 . A polishing pad comprising:
a polishing layer,
wherein the polishing layer includes zinc (Zn), and
a concentration of the zinc (Zn) is 0.5 ppm to 40 ppm parts by weight based on a total weight of the polishing layer,
wherein the polishing layer has a total oxidizing power index of 1.5 to 10 represented by the following Equation 3:
Total oxidizing power index=(Con. Al ×Oxi. Al )+(Con. Zn ×Oxi. Zn )+(Con. Al ×Oxi. Al ) [Equation 3]
wherein Con. Al is a concentration value in ppm of the weight of aluminum based on the total weight of the polishing layer, Con. Zn is the concentration of zinc (Zn), Con. Fe is a concentration value in ppm of the weight of iron (Fe) based on the total weight of the polishing layer,
the Oxi. Al is an ionization index of the aluminum (Al), and is a value obtained by dividing the reciprocal of the primary ionization energy of the aluminum (Al) by the sum of the reciprocal of the primary ionization energy of the aluminum (Al), the reciprocal of the primary ionization energy of the zinc (Zn), and the reciprocal of the primary ionization energy of the iron (Fe),
the Oxi. zn is an ionization index of the zinc (Zn), and is a value obtained by dividing the reciprocal of the primary ionization energy of the zinc (Zn) by the sum of the reciprocal of the primary ionization energy of aluminum (Al), the reciprocal of the primary ionization energy of the zinc (Zn), and the reciprocal of the primary ionization energy of the iron (Fe), and
the Oxi. Fe is an ionization index of the iron (Fe), and is a value obtained by dividing the reciprocal of the primary ionization energy of the iron (Fe) by the sum of the reciprocal of the primary ionization energy of the aluminum (Al), the reciprocal of the primary ionization energy of the zinc (Zn), and the reciprocal of the primary ionization energy of the iron (Fe).
2 . The polishing pad of claim 1 , wherein the polishing layer further includes iron (Fe), and
a concentration of the iron (Fe) is 1 ppm to 50 ppm parts by weight based on the total weight of the polishing layer.
3 . The polishing pad of claim 1 , wherein the polishing layer further includes aluminum (Al), and
a concentration of the aluminum (Al) is 2 ppm to 50 ppm parts by weight based on the total weight of the polishing layer.
4 . The polishing pad of claim 1 , wherein a metal included in the polishing layer has an oxidation number of +1 to +3.
5 . The polishing pad of claim 1 , wherein a total sum of the concentrations of the iron (Fe), the zinc (Zn) and the aluminum (Al) included in the polishing layer is 5 ppm to 40 ppm parts by weight based on the total weight of the polishing layer.
6 . The polishing pad of claim 1 , wherein a concentration of the zinc (Zn) included in the polishing layer in a region from a polishing surface to a depth of ½ of a total thickness is 0.5 ppm to 40 ppm parts by weight based on the total weight of the polishing layer.
7 . The polishing pad of claim 1 , wherein a concentration of the iron (Fe) included in the polishing layer in a region from a polishing surface to a depth of ½ of a total thickness is 1 ppm to 40 ppm parts by weight based on the total weight of the polishing layer.
8 . The polishing pad of claim 1 , wherein a concentration of the aluminum (Al) included in the polishing layer in a region from a polishing surface to a depth of ½ of a total thickness is 2 ppm to 50 ppm parts by weight based on the total weight of the polishing layer.
9 . The polishing pad of claim 1 , wherein a sum of the concentrations of the iron (Fe), the zinc (Zn), and the aluminum (Al) from a polishing surface of the polishing layer to a depth of ½ of a total thickness is 5 ppm to 40 ppm parts by weight based on the total weight of the polishing layer.
10 . The polishing pad of claim 1 , wherein the polishing layer has a hardness of 53 to 60 Shore D, and the polishing layer has an elongation of 80 to 110%.