Adaptive interconnect structure for semiconductor package
A package includes a first package component including a semiconductor die, wherein the semiconductor die includes conductive pads, wherein the semiconductor die is surrounded by an encapsulant; an adaptive interconnect structure on the semiconductor die, wherein the adaptive interconnect structure includes conductive lines, wherein each conductive line physically and electrically contacts a respective conductive pad; and first bond pads, wherein each first bond pad physically and electrically contacts a respective conductive line; and a second package component including an interconnect structure, wherein the interconnect structure includes second bond pads, wherein each second bond pad is directly bonded to a respective first bond pad, wherein each second bond pad is laterally offset from a corresponding conductive pad which is electrically coupled to that second bond pad.
1 . A method comprising:
attaching a first semiconductor device to a first side of a carrier, wherein the first semiconductor device comprises a first conductive pad on a first side of the first semiconductor device, wherein a first surface of the first conductive pad is exposed;
forming a first adaptive interconnect structure on the first side of the first semiconductor device, comprising:
determining a first lateral offset between a first lateral location of the first conductive pad of the first semiconductor device and a second lateral location, wherein the second lateral location corresponds to a location of a bond pad of a package component;
based on the first lateral offset, forming a first conductive line on the first surface of the first conductive pad, wherein the first conductive line extends from the first lateral location to the second lateral location; and
forming a second conductive pad on a first surface of the first conductive line, wherein the second conductive pad is at the second lateral location, wherein the first conductive line directly contacts the first conductive pad and the second conductive pad; and
bonding the second conductive pad to the bond pad.
2 . The method of claim 1 , wherein the determining of the first lateral offset is performed after attaching the first semiconductor device to the carrier.
3 . The method of claim 1 further comprising:
forming a second adaptive interconnect structure on a back side of the first semiconductor device, comprising:
determining a second lateral offset between a third lateral location of a first through-substrate via of the first semiconductor device and a fourth lateral location, wherein the fourth lateral location corresponds to a location of a conductive feature of a back-side redistribution structure; and
based on the second lateral offset, forming a second conductive line on the first through-substrate via, wherein the second conductive line extends from the third lateral location to the fourth lateral location.
4 . The method of claim 3 , wherein the second conductive line physically and electrically connects the first through-substrate via of the first semiconductor device and a second through-substrate via of a second semiconductor device.
5 . The method of claim 3 further comprising forming a back-side redistribution structure over the back side of the first semiconductor device, wherein the back-side redistribution structure is electrically connected to the second conductive line.
6 . The method of claim 1 further comprising forming the first adaptive interconnect structure on a first side of a third semiconductor device, wherein the first adaptive interconnect structure comprises a third conductive line extending from a fifth lateral location of a third conductive pad of the first semiconductor device to a sixth lateral location of a fourth conductive pad of the third semiconductor device.
7 . The method of claim 1 , wherein forming the first conductive line comprises using a programmable photolithographic tool to form an opening in a mask corresponding to the first conductive line.
8 . The method of claim 7 , wherein the programmable photolithographic tool is a laser writing system.
9 . The method of claim 1 , wherein the package component comprises through substrate vias, and further comprising forming a redistribution structure over and electrically connected to the through substrate vias.
10 . A method comprising:
attaching a plurality of integrated circuit dies to a carrier, wherein each integrated conductive die comprises a plurality of conductive pads at a top surface of that integrated circuit die;
measuring a location of each conductive pad of each of the plurality of integrated circuit dies;
determining a lateral offset for each conductive pad of each of the plurality of integrated circuit dies, wherein each lateral offset represents a difference between the measured location of a respective conductive pad of the plurality of conductive pads and a desired location of the respective conductive pad of the plurality of conductive pads;
forming a first dielectric layer over the plurality of integrated circuit dies;
patterning a plurality of first openings in the first dielectric layer, wherein the pattern for each of the first openings is based on the measured location, the lateral offset, and the desired location of a respective conductive pad of the plurality of conductive pads;
depositing a first conductive material in the plurality of first openings, wherein top surfaces of the first conductive material and the first dielectric layer are level;
forming a second dielectric layer over the first dielectric layer;
patterning a plurality of second openings in the second dielectric layer, wherein the pattern for each of the second openings is based on the desired location of a respective conductive pad of the plurality of conductive pads; and
depositing a second conductive material in the plurality of second openings to form a plurality of first bonding pads, wherein top surfaces of the plurality of first bonding pads and the second dielectric layer are level.
11 . The method of claim 10 further comprising directly bonding a package component to the plurality of first bonding pads.
12 . The method of claim 11 , wherein the package component comprises a plurality of second bonding pads, wherein the location of each second bonding pad corresponds to a desired location of a respective conductive pad of the plurality of conductive pads.
13 . The method of claim 11 , wherein directly bonding a package component to the plurality of first bonding pads comprises bonding each first bonding pad to a corresponding second bonding pad using metal-to-metal bonding.
14 . The method of claim 10 , wherein patterning the plurality of first openings comprises:
depositing a photoresist over the first dielectric layer;
using a programmable photolithography tool to pattern the photoresist; and
etching the first dielectric layer using the patterned photoresist as an etching mask.
15 . The method of claim 14 , wherein the programmable photolithography tool is a maskless photolithography system.
16 . The method of claim 10 further comprising:
patterning a plurality of third openings in the first dielectric layer, wherein the pattern for each of the third openings is determined from the measured location of a conductive pad of a first integrated circuit die of the plurality of integrated circuit dies and from the measured location of a conductive pad of a second integrated circuit die of the plurality of integrated circuit dies; and
depositing the first conductive material in the plurality of third openings.
17 . A method comprising:
forming an adaptive interconnect structure on a first package component, wherein the first package component comprises a semiconductor die, wherein the semiconductor die comprises a plurality of conductive pads, wherein forming the adaptive interconnect structure comprises:
forming a plurality of conductive lines over the semiconductor die, wherein each conductive line physically and electrically contacts a corresponding conductive pad of the semiconductor die;
forming a bonding layer over the conductive lines, wherein a width of the bonding layer is greater than a width of the semiconductor die; and
forming a plurality of first bond pads in the bonding layer and over the conductive lines, wherein each first bond pad physically and electrically contacts a corresponding conductive line, wherein each conductive line connects a corresponding first bond pad to a corresponding conductive pad, wherein each first bond pad is laterally offset from its corresponding conductive pad; and
bonding a second package component to the bonding layer of the adaptive interconnect structure using a dielectric-to-dielectric bonding process, wherein the second package component comprises second bond pads, wherein the bonding comprises directly bonding each second bond pad to a corresponding first bond pad.
18 . The method of claim 17 further comprising:
forming an encapsulant surrounding the semiconductor die; and
forming a first dielectric layer extending over the semiconductor die and over the encapsulant, wherein the conductive lines are formed in the first dielectric layer.
19 . The method of claim 17 , wherein each first bond pad has the same lateral offset from its corresponding conductive pad.
20 . The method of claim 1 , wherein the first adaptive interconnect structure has a width greater than a width of the first semiconductor device.