Granted Patent B2

US 12,727,339 · App. 18/580,254 · Granted Sep 1, 2026

Inventors: Hayato Yamawaki (Atsugi, JP); Sachiko Kawakami (Atsugi, JP); Eriko Aoyama (Atsugi, JP); Miki Kurihara (Isehara, JP); Yoshinobu Asami (Isehara, JP); Takahiro Fujie (Isehara, JP); Ryo Tagashira (Isehara, JP)

Assignee: Semiconductor Energy Laboratory Co., Ltd.

H10K59/122H10K50/11H10K59/1201H10K59/121H10K59/80515H10K71/12H10K71/233H10K71/40H10K50/00H10K59/00H10K59/35H10K59/8052H10K71/60

Abstract

Claims (77)

1 . A display apparatus comprising:

a first pixel;

a second pixel adjacent to the first pixel;

a first insulating layer; and

a second insulating layer over the first insulating layer,

wherein the first pixel comprises:

a first pixel electrode;

a first EL layer covering the first pixel electrode;

a third insulating layer in contact with a first part of a top surface of the first EL layer; and

a common electrode over the first EL layer and the third insulating layer,

wherein the common electrode is in contact with a second part of the top surface of the first EL layer,

wherein the first EL layer is sandwiched between the first pixel electrode and the common electrode,

wherein the first EL layer comprises a first organic compound,

wherein an amount of an organic compound that comprises an oxide of the first organic compound or a partial structure of the first organic compound and is contained in the first EL layer is greater than 0 and less than or equal to 1/10 of an amount of the first organic compound contained in the first EL layer,

wherein the second pixel comprises:

a second pixel electrode;

a second EL layer covering the second pixel electrode;

a fourth insulating layer in contact with a first part of a top surface of the second EL layer; and

the common electrode over the second EL layer and the fourth insulating layer,

wherein the first insulating layer is in contact with a top surface and a side surface of the third insulating layer, a top surface and a side surface of the fourth insulating layer, a side surface of the first EL layer, and a side surface of the second EL layer,

wherein the first insulating layer, the third insulating layer, and the fourth insulating layer each comprise an inorganic material,

wherein the second insulating layer comprises an organic material,

wherein a first part of the second insulating layer overlaps with the first pixel electrode,

wherein a second part of the second insulating layer overlaps with the second pixel electrode,

wherein, in a cross-sectional view, a side surface of the second insulating layer has a tapered shape and a top surface of the second insulating layer has a convex shape,

wherein a taper angle of the tapered shape of the side surface of the second insulating layer is less than 90°, and

wherein the common electrode overlaps with the second insulating layer.

2 . The display apparatus according to claim 1 ,

wherein, in the cross-sectional view, a side surface of the first pixel electrode and a side surface of the second pixel electrode each have a tapered shape, and

wherein a taper angle of the tapered shape of the side surface of the first pixel electrode and a taper angle of the tapered shape of the side surface of the second pixel electrode are smaller than 90°.

3 . The display apparatus according to claim 1 ,

wherein the first insulating layer, the third insulating layer, and the fourth insulating layer each comprise aluminum oxide.

4 . The display apparatus according to claim 1 ,

wherein the second insulating layer comprises a photosensitive acrylic resin.

5 . The display apparatus according to claim 1 ,

wherein the top surface of the first EL layer, the top surface of the second EL layer, and the top surface of the second insulating layer each comprise a region in contact with the common electrode.

6 . The display apparatus according to claim 1 ,

wherein the first pixel comprises a common layer between the first EL layer and the common electrode,

wherein the second pixel comprises the common layer between the second EL layer and the common electrode, and

wherein the top surface of the first EL layer, the top surface of the second EL layer, and the top surface of the second insulating layer each comprise a region in contact with the common layer.

7 . A method for fabricating a display apparatus, comprising the steps of:

forming a first pixel electrode;

forming a first EL layer covering the first pixel electrode;

forming a first insulating layer in contact with a top surface of the first EL layer;

forming a second pixel electrode;

forming a second EL layer covering the second pixel electrode;

forming a second insulating layer in contact with a top surface of the second EL layer;

forming a third insulating layer to cover the first EL layer, the first insulating layer, the second EL layer, and the second insulating layer;

applying a photosensitive organic resin onto the third insulating layer;

performing a first light exposure to expose part of the photosensitive organic resin to visible rays or ultraviolet rays;

performing development to remove the part of the photosensitive organic resin and form a fourth insulating layer;

performing a first heat treatment to make a side surface of the fourth insulating layer have a tapered shape and make a top surface of the fourth insulating layer have a convex shape;

removing parts of the first insulating layer, the second insulating layer, and the third insulating layer to expose the top surface of the first EL layer and the top surface of the second EL layer; and

forming a common electrode to cover the first EL layer, the second EL layer, and the fourth insulating layer;

wherein, during a period from a time when the top surface of the first EL layer and the top surface of the second EL layer are exposed to a time when the common electrode is formed, an amount of ultraviolet rays to which the first EL layer and the second EL layer are exposed is controlled to be greater than 0 mJ/cm 2 and less than or equal to 1000 mJ/cm 2 .

8 . The method for fabricating a display apparatus, according to claim 7 ,

wherein the first EL layer and the second EL layer are formed by a photolithography method, and

wherein a distance between the first EL layer and the second EL layer is less than or equal to 8 μm in a region.

9 . The method for fabricating a display apparatus, according to claim 7 ,

wherein aluminum oxide is deposited as the third insulating layer by an ALD method.

10 . The method for fabricating a display apparatus, according to claim 7 ,

wherein the photosensitive organic resin is formed using a photosensitive acrylic resin.

11 . The method for fabricating a display apparatus, according to claim 7 ,

wherein viscosity of the photosensitive organic resin is greater than or equal to 1 cP and less than or equal to 1500 cP.

12 . The method for fabricating a display apparatus, according to claim 7 ,

wherein part of the photosensitive organic resin is positioned over a region overlapping with the first pixel electrode or the second pixel electrode.

13 . The method for fabricating a display apparatus, according to claim 7 , further comprising the step of:

performing a second heat treatment before the first light exposure,

wherein the second heat treatment is performed at a temperature of higher than or equal to 70° C. and lower than or equal to 120° C.

14 . The method for fabricating a display apparatus, according to claim 7 , further comprising the step of:

performing a second light exposure before the first heat treatment,

wherein the second light exposure is performed by irradiation with visible rays or ultraviolet rays at an energy density of greater than 0 mJ/cm 2 and less than or equal to 500 mJ/cm 2 .

15 . The method for fabricating a display apparatus, according to claim 7 ,

wherein the first heat treatment is performed at a temperature of higher than or equal to 70° C. and lower than or equal to 130° C.

16 . The method for fabricating a display apparatus, according to claim 7 , further comprising the step of:

performing a second heat treatment after the first heat treatment,

wherein the second heat treatment is performed at a temperature of higher than or equal to 80° C. and lower than or equal to 100° C.

Assignments (1)

Priority Claims (3)

Continuity (1)

References Cited (71)