RF power splitting and control
Embodiments disclosed herein include an apparatus that includes a radio frequency (RF) power supply, and a power splitter electrically coupled to the RF power supply. In an embodiment, the apparatus includes a plurality of impedance matches electrically coupled to the power splitter, where the power splitter is configured to split RF power from the RF power supply in order to supply the RF power to each of the plurality of impedance matches. In an embodiment, the apparatus further includes a plurality of chambers, wherein each chamber is electrically coupled to a different one of the plurality of impedance matches.
1 . An apparatus, comprising:
a radio frequency (RF) power supply;
a power splitter electrically coupled to the RF power supply;
a plurality of impedance matches electrically coupled between the power splitter, and a plurality of chambers; wherein the power splitter is intervening between the RF power supply and the plurality of impedance matches and is configured to split RF power from the RF power supply in order to supply the RF power to each of the plurality of impedance matches; and
wherein each chamber is electrically coupled to a different one of the plurality of impedance matches.
2 . The apparatus of claim 1 , wherein a number of the plurality of chambers is equal to a number of the plurality of impedance matches.
3 . The apparatus of claim 1 , wherein a number of the plurality of impedance matches is greater than a number of the plurality of chambers.
4 . The apparatus of claim 1 , wherein at least one of the plurality of chambers is configured to process a plurality of substrates in a batch process.
5 . The apparatus of claim 1 , wherein the power splitter is a high isolation power splitter.
6 . The apparatus of claim 1 , wherein the power splitter is a low isolation power splitter.
7 . The apparatus of claim 1 , wherein the plurality of impedance matches comprise a pi network match, an L network match, an inverted L network match, or a two stage L network match.
8 . The apparatus of claim 1 , wherein each of the plurality of impedance matches is independently controllable.
9 . The apparatus of claim 1 , further comprising: a plurality of reflected power sensors, wherein each of the plurality of reflected power sensors is electrically coupled between the power splitter and a different one of the plurality of impedance matches.
10 . The apparatus of claim 1 , further comprising: a process controller communicatively coupled to the plurality of impedance matches configured to control impedances of each of the plurality of impedance matches.
11 . An apparatus, comprising:
a radio frequency (RF) power generator;
a power splitter coupled to the RF power generator; a plurality of impedance matches, wherein each of the plurality of impedance matches are electrically coupled to each of a plurality of chambers, and wherein the power splitter is intervening between the RF power generator and the plurality of impedance matches and is configured to split RF power from the RF power generator to supply RF power to each of the plurality of impedance matches, and wherein each of the plurality of impedance matches comprises an actuator configured to alter an impedance of a respective impedance match;
a plurality of reflected power sensors, wherein each of the plurality of reflected power sensors is electrically coupled between the power splitter and a different one of the plurality of impedance matches; and
a controller, wherein the controller is configured to receive an input signal from each of the plurality of reflected power sensors and use the input signal to drive the actuators in order to alter the impedance of the respective impedance match.
12 . The apparatus of claim 11 , wherein each of the plurality of impedance matches comprises two actuators.
13 . The apparatus of claim 11 , wherein the controller comprises a real time processing unit (RTPU).
14 . The apparatus of claim 13 , wherein the RTPU comprises one or more of: an impedance match module, an impedance match calibration agent, and an impedance match frequency agent.
15 . The apparatus of claim 13 , wherein the RTPU comprises a safe operating area (SOA) supervisor control.
16 . The apparatus of claim 11 , wherein the plurality of impedance matches comprise a pi network match, an L network match, an inverted L network match, a multi-stage L network match, or a multi-stage inverted L network match.
17 . The apparatus of claim 11 , wherein the power splitter is a high isolation power splitter.
18 . An apparatus for controlling a plurality of impedance matches which are electrically coupled between a power splitter, and a plurality of chambers, wherein the power splitter is intervening between an Radio Frequency (RF) power supply and the plurality of impedance matches, the apparatus comprising:
coupling circuitry and analog control circuitry configured to receive incident and reflected RF voltages and RF current signals from a plurality of sensors; an RF control platform, wherein the RF control platform comprises:
programmable logic;
a real time processing unit (RTPU);
a message controller; and
a processor; and a plurality of motor control interfaces, wherein the plurality of motor control interfaces are configured to control impedances of the plurality of impedance matches.
19 . The apparatus of claim 18 , wherein the RTPU comprises one or more of: an impedance match module, an impedance match calibration agent, and an impedance match frequency agent, a safe operating area (SOA) supervisor control, a power model control, or a sensor calibration agent.
20 . The apparatus of claim 18 , wherein the apparatus is configured to provide impedance tuning and/or RF power balancing.