Semiconductor device and method of manufacturing the same
Provided is a semiconductor device and method of manufacturing same. The semiconductor device includes: a transistor on a substrate; a first wiring layer on the transistor, the first wiring layer including a first wiring electrically connected to the transistor; and a second wiring layer on the first wiring layer, the second wiring layer including an interlayer insulating layer and a second wiring provided in the interlayer insulating layer, wherein the second wiring includes a line structure and a first via structure, wherein the first via structure vertically connects the line structure and the first wiring, wherein the first via structure includes: a first outer surface in contact with the interlayer insulating layer; and a second outer surface in contact with the interlayer insulating layer and facing a direction opposite from the first outer surface, wherein the first outer surface and the second outer surface are curved surfaces, and wherein a curvature of the first outer surface and a curvature of the second outer surface are different from each other.
1 . A semiconductor device comprising:
a transistor on a substrate;
a first wiring layer on the transistor, the first wiring layer comprising a first wiring electrically connected to the transistor; and
a second wiring layer on the first wiring layer, the second wiring layer comprising an interlayer insulating layer and a second wiring provided in the interlayer insulating layer,
wherein the second wiring comprises a line structure and a first via structure, wherein the first via structure vertically connects the line structure and the first wiring,
wherein the first via structure comprises:
a first outer surface in contact with the interlayer insulating layer; and
a second outer surface in contact with the interlayer insulating layer and facing a direction opposite from the first outer surface,
wherein the first outer surface and the second outer surface are curved surfaces, and
wherein a curvature of the first outer surface and a curvature of the second outer surface are different from each other.
2 . The semiconductor device of claim 1 , wherein the first via structure further comprises:
a first portion in contact with the interlayer insulating layer on the first outer surface; and
a second portion in contact with the interlayer insulating layer on the second outer surface, and
wherein a lowest level of the first portion is lower than a lowest level of the second portion.
3 . The semiconductor device of claim 1 , wherein a width of the first via structure decreases toward a lower surface of the first via structure.
4 . The semiconductor device of claim 1 , wherein a width of the first via structure decreases and then increases toward a lower surface of the first via structure.
5 . The semiconductor device of claim 1 , wherein a curvature of the first outer surface and a curvature of the second outer surface decrease toward an upper portion of the first via structure.
6 . The semiconductor device of claim 1 , further comprising an etch stop layer between the first wiring layer and the second wiring layer,
wherein the etch stop layer comprises a first stop layer, a second stop layer, and an insulating layer between the first stop layer and the second stop layer.
7 . The semiconductor device of claim 1 , wherein the line structure comprises:
a first line outer surface that is in contact with the interlayer insulating layer and is curved; and
a second line outer surface that is in contact with the interlayer insulating layer, is curved, and faces in a direction opposite from the first line outer surface, and
wherein a curvature of the first line outer surface and a curvature of the second line outer surface are different from each other.
8 . The semiconductor device of claim 1 , wherein the second wiring further comprises a second via structure connected to the line structure and adjacent to the first via structure,
wherein the second via structure comprises:
a third outer surface in contact with the interlayer insulating layer; and
a fourth outer surface in contact with the interlayer insulating layer and facing in a direction opposite from the third outer surface, and
wherein a curvature of the first outer surface is smaller than a curvature of the third outer surface.
9 . The semiconductor device of claim 8 , wherein a curvature of the fourth outer surface is greater than a curvature of the second outer surface.
10 . The semiconductor device of claim 8 , wherein a normal vector of each of the first outer surface and the fourth outer surface has a positive slope, and
wherein a normal vector of each of the second outer surface and the third outer surface has a negative slope.
11 . A semiconductor device comprising:
a transistor on a substrate;
a first wiring layer on the transistor, the first wiring layer comprising a first wiring electrically connected to the transistor; and
a second wiring layer on the first wiring layer, the second wiring layer comprising an interlayer insulating layer and a second wiring provided in the interlayer insulating layer,
wherein the second wiring comprises a line structure and a first via structure, wherein the first via structure connects the line structure and the first wiring in a first direction,
wherein the via structure comprises:
a first portion in contact with a first surface of the interlayer insulating layer; and
a second portion in contact with a second surface of the interlayer insulating layer, the second surface facing the first surface, and the second portion spaced apart from the first portion in a second direction perpendicular to the first direction,
wherein the first surface and the second surface are curved surfaces, and
wherein a lowest level of the first portion is lower than a lowest level of the second portion.
12 . The semiconductor device of claim 11 , wherein a curvature of the second surface is greater than a curvature of the first surface.
13 . The semiconductor device of claim 11 , wherein a width of the via structure decreases in a direction moving toward the first wiring.
14 . The semiconductor device of claim 11 , wherein a curvature of each of the first surface and the second surface increases in a direction moving toward the line structure.
15 . The semiconductor device of claim 11 , further comprising an etch stop layer between the first wiring layer and the second wiring layer,
wherein the etch stop layer comprises a first stop layer, a second stop layer, and an insulating layer between the first stop layer and the second stop layer.
16 . A semiconductor device comprising:
a transistor on a substrate;
a first wiring layer on the transistor, the first wiring layer comprising a first wiring electrically connected to the transistor;
a second wiring layer on the first wiring layer, the second wiring layer comprising an interlayer insulating layer and a second wiring provided in the interlayer insulating layer; and
an etch stop layer interposed between the first wiring layer and the second wiring layer,
wherein the second wiring comprises:
a line structure provided on an upper portion of the second wiring layer; and
a plurality of via structures vertically connecting the line structure and the first wiring,
wherein the plurality of via structures comprise first via structures and second via structures adjacent to each other,
wherein the first via structure comprises:
a first outer surface comprising a curved surface in contact with the interlayer insulating layer; and
a second outer surface comprising a curved surface in contact with the interlayer insulating layer and facing a direction opposite from the first outer surface,
wherein the second via structure comprises:
a third outer surface comprising a curved surface in contact with the interlayer insulating layer; and
a fourth outer surface comprising a curved surface in contact with the interlayer insulating layer and facing in a direction opposite from the third outer surface, and
wherein a curvature of the first outer surface is different from a curvature of the third outer surface.
17 . The semiconductor device of claim 16 , wherein a curvature of the fourth outer surface is different from a curvature of the second outer surface.
18 . The semiconductor device of claim 16 , wherein a normal vector of each of the first outer surface and the fourth outer surface have a positive slope, and
wherein a normal vector of each of the second outer surface and the third outer surface have a negative slope.
19 . The semiconductor device of claim 16 , wherein a width of each of the first via structure and the second via structure decreases in a direction toward the first wiring.
20 . The semiconductor device of claim 16 , wherein the curvature of the first outer surface is smaller than the curvature of the second outer surface, and
wherein the curvature of the third outer surface is smaller than the curvature of the fourth outer surface.