Semiconductor device and method of forming the device using sacrificial carrier
View Patent ↗A semiconductor device is made by forming a photoresist layer over a metal carrier. A plurality of openings is formed in the photoresist layer extending to the metal carrier. A conductive material is selectively plated in the openings of the photoresist layer using the metal carrier as an electroplating current path to form wettable contact pads. A semiconductor die has bumps formed on its surface. The bumps are directly mounted to the wettable contact pads to align the die with respect to the wettable contact pads. An encapsulant is deposited over the die. The metal carrier is removed. An interconnect structure is formed over the encapsulant and electrically connected to the wettable contact pads. A plurality of conductive vias is formed through the encapsulant and extends to the contact pads. The conductive vias are aligned by the wettable contact pads with respect to the die to reduce interconnect pitch.
1. A method of making a semiconductor device, comprising:
providing a metal carrier;
forming a photoresist layer over the metal carrier;
forming openings in the photoresist layer extending to the metal carrier;
selectively electroplating a first conductive material in the openings of the photoresist layer using the metal carrier as an electroplating current path to form wettable contact pads;
mounting a first semiconductor die directly to the wettable contact pads with a plurality of bumps to align the first semiconductor die with respect to the wettable contact pads;
depositing a first encapsulant over the first semiconductor die;
removing the metal carrier;
forming an interconnect structure over the first encapsulant and electrically connected to the wettable contact pads;
forming vias through the first encapsulant over and extending to the wettable contact pads; and
depositing a second conductive material in the vias, the second conductive material in the vias being aligned by the wettable contact pads with respect to the first semiconductor die to reduce interconnect pitch.
2. The method of claim 1 , wherein forming the interconnect structure includes:
forming a conductive layer electrically connected to the wettable contact pads;
forming an insulating layer over the conductive layer; and
removing a portion of the insulating layer to expose the conductive layer.
3. The method of claim 1 , further including forming an insulating layer over the conductive material in the vias.
4. The method of claim 1 , wherein the first conductive material includes tin.
5. The method of claim 1 , further including forming a conductive pillar under the wettable contact pads.
6. The method of claim 1 , further including:
mounting a second semiconductor die over the interconnect structure; and
depositing a second encapsulant over the second semiconductor die and interconnect structure.
7. The method of claim 1 , wherein the wettable contact pads are separated with the photoresist layer.
8. A method of making a semiconductor device, comprising:
providing a metal carrier;
forming a photoresist layer over the metal carrier;
forming openings in the photoresist layer extending to the metal carrier;
selectively electroplating a conductive material over the metal carrier and in the openings of the photoresist layer using the metal carrier as an electroplating current path to form contact pads on the metal carrier;
mounting a first semiconductor die or component directly to the contact pads with a plurality of bumps to align the first semiconductor die or component with respect to the contact pads;
depositing a first encapsulant over the first semiconductor die or component; and
forming an interconnect structure over the first encapsulant and electrically connected to the contact pads.
9. The method of claim 8 , further including forming conductive vias through the first encapsulant and extending to the contact pads, the conductive vias being aligned by the contact pads with respect to the first semiconductor die or component to reduce interconnect pitch.
10. The method of claim 9 , further including forming an insulating layer over the conductive vias.
11. The method of claim 8 , wherein forming the interconnect structure includes:
forming a conductive layer electrically connected to the contact pads;
forming an insulating layer over the conductive layer; and
removing a portion of the insulating layer to expose the conductive layer.
12. The method of claim 8 , further including forming a conductive pillar under the contact pads.
13. The method of claim 8 , further including:
mounting a second semiconductor die or component over the interconnect structure; and
depositing a second encapsulant over the second semiconductor die or component and interconnect structure.
14. The method of claim 8 , wherein the contact pads are separated with the photoresist layer.