Wafer integrated with permanent carrier and method therefor
View Patent ↗A semiconductor device has a wafer for supporting the device and a conductive layer formed over a top surface of the wafer. A carrier wafer is permanently bonded over the conductive layer. Within the wafer and the carrier wafer, an interconnect structure is formed. The interconnect structure includes a first via formed in the wafer that exposes the conductive layer, a second via formed in the carrier wafer that exposes the conductive layer, a first metal layer deposited over the first via, the first metal layer in electrical contact with the conductive layer, and a second metal layer deposited over the second via, the second metal layer in electrical contact with the conductive layer. First and second insulation layers are deposited over the first and second metal layers respectively. The first or second insulation layer has an etched portion to expose a portion of the first or second metal layer.
1. A semiconductor device, comprising:
a wafer for supporting the semiconductor device;
a conductive layer formed over a top surface of the wafer;
a carrier wafer permanently bonded over the conductive layer; and
an interconnect structure formed within the wafer and the carrier wafer, wherein the interconnect structure includes,
a first via formed in the wafer that exposes the conductive layer,
a second via formed in the carrier wafer that exposes the conductive layer,
a first metal layer deposited over the first via, the first metal layer in electrical contact with the conductive layer, and
a second metal layer deposited over the second via, the second metal layer in electrical contact with the conductive layer.
2. The semiconductor device of claim 1 , further including first and second insulation layers deposited over the first and second metal layers respectively, the first or second insulation layer has an etched portion that exposes a portion of the first or second metal layer.
3. The semiconductor device of claim 2 , further including:
a semiconductor package connected over the etched portion of the first or second insulation layer; and
underfill material deposited between the semiconductor package and the etched portion of the first or second insulation layer.
4. The semiconductor device of claim 1 , wherein the carrier wafer further includes a material selected from the group consisting of glass, silicon, silicon carbide, and ceramic.
5. The semiconductor device of claim 1 , wherein the carrier wafer is permanently bonded over an active surface of the wafer with an anodic bonding process.
6. The semiconductor device of claim 1 , wherein the interconnect structure within the wafer and the carrier wafer is formed with a fabrication process that exceeds approximately 350° C.
7. A semiconductor device, comprising:
a wafer for supporting the semiconductor device;
a conductive layer formed over a top surface of the wafer;
a carrier wafer permanently bonded over the conductive layer, the carrier wafer includes a material selected from the group consisting of glass, silicon, silicon carbide, and ceramic; and
an interconnect structure formed within the wafer and the carrier wafer, the interconnect structure includes:
a first metal layer formed in the wafer and in electrical contact with the conductive layer, and
a second metal layer formed in the carrier wafer and in electrical contact with the conductive layer.
8. The semiconductor device of claim 7 , further including:
a first via formed in the wafer, the first metal layer formed in the first via and in electrical contact with the conductive layer; and
a second via formed in the carrier wafer, the second metal layer formed in the second via and in electrical contact with the conductive layer.
9. The semiconductor device of claim 7 , further including first and second insulation layers deposited over the first and second metal layers respectively, the first or second insulation layer has an etched portion that exposes a portion of the first or second metal layer.
10. The semiconductor device of claim 9 , further including:
an under bump metallization layer formed over the etched portion of the first or second insulation layer; and
solder bumps formed over the under bump metallization layer.
11. The semiconductor device of claim 8 , further including a semiconductor package connected to the first or second metal layer.
12. The semiconductor device of claim 8 , wherein the interconnect structure is formed within the wafer at temperatures that exceed approximately 350° C.
13. A semiconductor device, comprising:
a first substrate
a conductive layer formed over a surface of the first substrate;
a second substrate permanently bonded to the conductive layer and first substrate;
a first interconnect structure formed over and through the first substrate and electrically connected to the conductive layer;
a second interconnect structure formed over and through the second substrate and electrically connected to the conductive layer; and
a first insulation layer deposited over and into the first interconnect structure; and
a second insulation layer deposited over and into the second interconnect structure.
14. The semiconductor device of claim 13 , wherein the first interconnect structure includes:
a first via formed through the first substrate to expose the conductive layer; and
a first metal layer formed over a surface of the first substrate and into the first via and electrically connected to the conductive layer.
15. The semiconductor device of claim 13 , further including a semiconductor package mounted to the second interconnect structure.
16. The semiconductor device of claim 13 , wherein the second substrate includes a material selected from the group consisting of glass, silicon, silicon carbide, and ceramic.
17. The semiconductor device of claim 13 , wherein the second substrate is permanently bonded to the first substrate with an anodic bonding process.
18. The semiconductor device of claim 13 , wherein the first interconnect structure is formed over and through the first substrate and the second interconnect structure is formed over and through the second substrate at a temperature in excess of approximately 350° C.
19. The semiconductor device of claim 13 , wherein the second interconnect structure includes:
a second via formed through the second substrate to expose the conductive layer; and
a second metal layer formed over a surface of the second substrate and into the second via and electrically connected to the conductive layer.
20. A method of making a semiconductor device, comprising:
providing a first substrate;
forming a first conductive layer over the first substrate;
mounting a second substrate to the first conductive layer and first substrate;
forming a first via through the first substrate to expose the first conductive layer;
conformally applying a first insulating layer over a surface of the first substrate and into the first via;
conformally applying a second conductive layer over the first insulating layer and into the first via and electrically connected to the first conductive layer;
forming a second via through the second substrate to expose the first conductive layer;
conformally applying a third conductive layer over a surface of the second substrate and into the second via and electrically connected to the first conductive layer;
forming a second insulating layer over the second conductive layer and into the first via; and
forming a third insulating layer over the third conductive layer and into the second via.
21. The method of claim 20 , including mounting a semiconductor package over the second substrate.
22. The method of claim 21 , including depositing an underfill material between the semiconductor package and the second substrate.
23. The method of claim 21 , including forming a shield over the semiconductor package.
24. The method of claim 21 , including forming a heat sink over the semiconductor package.
25. The method of claim 20 , including forming a plurality of bumps over the first conductive layer.
26. The method of claim 20 , including forming a fourth insulating layer between the first substrate and second substrate.
27. A method of making a semiconductor device, comprising:
providing a first substrate;
forming a first conductive layer over the first substrate;
mounting a second substrate to the first conductive layer and first substrate;
forming a first via through the first substrate to expose the first conductive layer;
forming a second conductive layer over a surface of the first substrate and into the first via and electrically connected to the first conductive layer;
forming a second via through the second substrate to expose the first conductive layer;
forming a third conductive layer over a surface of the second substrate and into the second via and electrically connected to the first conductive layer;
forming a first insulating layer over the second conductive layer and into the first via; and
forming a second insulating layer over the third conductive layer and into the second via.
28. The method of claim 27 , including mounting a semiconductor package over the second substrate.
29. The method of claim 28 , including depositing an underfill material between the semiconductor package and the second substrate.
30. The method of claim 28 , including forming a shield over the semiconductor package.
31. The method of claim 28 , including forming a heat sink over the semiconductor package.
32. The method of claim 27 , including forming a plurality of bumps over the first conductive layer.
33. The method of claim 27 , including forming a third insulating layer between the first substrate and second substrate.