Semiconductor device and method of forming stepped interconnect layer for stacked semiconductor die
A semiconductor device comprises a first semiconductor die. An encapsulant is disposed around the first semiconductor die. A first stepped interconnect structure is disposed over a first surface of the encapsulant. An opening is formed in the first stepped interconnect structure. The opening in the first stepped interconnect structure is over the first semiconductor die. A second semiconductor die is disposed in the opening of the first stepped interconnect structure. A second stepped interconnect structure is disposed over the first stepped interconnect structure. A conductive pillar is formed through the encapsulant.
1. A method of making a semiconductor device, comprising:
providing a first semiconductor die;
depositing an encapsulant around the first semiconductor die;
forming a first stepped interconnect structure over a surface of the encapsulant by,
(a) forming an insulating layer, and
(b) forming a conductive via through the insulating layer; and
forming an opening in the insulating layer of the first stepped interconnect structure, wherein the opening extends through the insulating layer over the first semiconductor die.
2. The method of claim 1 , further including disposing a second semiconductor die in the opening of the first stepped interconnect structure.
3. The method of claim 1 , further including disposing a second stepped interconnect structure over the first stepped interconnect structure.
4. The method of claim 1 , further including forming a conductive pillar through the encapsulant.
5. The method of claim 1 , wherein forming the first stepped interconnect structure further includes:
providing a pre-formed interconnect substrate; and
disposing the pre-formed interconnect substrate over the surface of the encapsulant.
6. A semiconductor device, comprising:
a first semiconductor die;
an encapsulant disposed around the first semiconductor die; and
a first stepped electrical interconnect structure disposed over a surface of the encapsulant, wherein the first stepped electrical interconnect structure includes,
(a) an insulating layer, and
(b) a conductive via formed through the insulating layer with an opening in the insulating layer of the first stepped electrical interconnect structure, wherein the opening extends through the insulating layer to the surface of the encapsulant over the first semiconductor die.
7. The semiconductor device of claim 6 , further including a second semiconductor die disposed in the opening of the insulating layer of the first stepped electrical interconnect structure.
8. The semiconductor device of claim 6 , further including a second stepped electrical interconnect structure disposed over the first stepped electrical interconnect structure.
9. The semiconductor device of claim 6 , further including a conductive pillar formed through the encapsulant.
10. A semiconductor device, comprising:
a first semiconductor die;
an encapsulant disposed around the first semiconductor die; and
a first stepped interconnect structure disposed over the encapsulant, wherein the first stepped interconnect structure includes,
(a) an insulating layer, and
(b) a conductive via formed through the insulating layer with an opening formed in the insulating layer of the first stepped interconnect structure, wherein the opening extends through the insulating layer over the first semiconductor die.
11. The semiconductor device of claim 10 , further including a conductive pillar formed through the encapsulant.
12. The semiconductor device of claim 10 , further including a second stepped interconnect structure disposed over the first stepped interconnect structure.
13. The semiconductor device of claim 10 , further including a second semiconductor die disposed in the opening of the insulating layer of the first stepped interconnect structure.
14. The semiconductor device of claim 13 , further including a third semiconductor die disposed over the first stepped interconnect structure and second semiconductor die.
15. The semiconductor device of claim 10 , wherein the first stepped interconnect structure includes a pre-formed interconnect substrate disposed over the encapsulant.
16. The semiconductor device of claim 6 , wherein the first stepped electrical interconnect structure includes a pre-formed interconnect substrate disposed over the encapsulant.
17. The semiconductor device of claim 7 , further including a third semiconductor die disposed over the first stepped electrical interconnect structure and second semiconductor die.
18. A semiconductor device, comprising:
a first semiconductor die;
an encapsulant deposited around the first semiconductor die; and
a first interconnect structure formed over a surface of the encapsulant, wherein the first interconnect structure includes,
(a) an insulating layer, and
(b) a conductive via formed through the insulating layer with an opening in the insulating layer of the first interconnect structure, wherein the opening extends through the insulating layer to the surface of the encapsulant.
19. The semiconductor device of claim 18 , further including a second semiconductor die disposed in the opening of the first interconnect structure.
20. The semiconductor device of claim 19 , further including a third semiconductor die disposed over the first interconnect structure and second semiconductor die.
21. The semiconductor device of claim 18 , further including a second interconnect structure disposed over the first interconnect structure.
22. The semiconductor device of claim 18 , further including a conductive pillar formed through the encapsulant.
23. The semiconductor device of claim 18 , wherein the first interconnect structure includes a pre-formed interconnect substrate disposed over the surface of the encapsulant.