Patent Assignment
Reel/Frame 014734/0443
Assignment of Assignor's Interest
Recorded: 2003-11-26
Pages: 2
Assignor
JAPAN ENERGY CORPORATION
Executed: 2003-11-04
Assignee
NIKKO MATERIALS COMPANY, LIMITED
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(8)
Sputtering Target and Method for Manufacturing Thereof
Patent:
6,153,315 →
Application:
09/060,209 →
Method of Manfacturing Member for Thin-Film Formation Apparatus and the Member for the Apparatus
Patent:
6,045,665 →
Application:
09/085,133 →
Ito Sputtering Target and Its Cleaning Method
Patent:
6,106,681 →
Application:
09/170,647 →
Ni-Fe Alloy Sputtering Target for Forming Magnetic Thin Films, Magnetic Thin Film, and Method of Manufacturing the Ni-Fe Alloy Sputtering Target
Patent:
6,267,827 →
Application:
09/266,259 →
Method of Pretreating Fluid for Electroless Nickel Plating
Patent:
6,156,218 →
Application:
09/355,651 →
Method of Manufacturing Member for Thin-Film Formation Apparatus and the Member for the Apparatus
Patent:
6,319,419 →
Application:
09/439,139 →
Method for Preparing High Purity Ruthenium Sputtering Target and High Purity Ruthenium Sputtering Target
Patent:
6,284,013 →
Application:
09/508,256 →
Ni-Fe Alloy Sputtering Target for Forming Magnetic Thin Films, Magnetic Thin Film, and Method of Manufacturing the Ni-Fe Alloy Sputtering Target
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name
Nov 16, 2006
From: NIKKO MATERIALS CO., LTD.
To: NIPPON MINING & METALS CO., LTD.
Reel/Frame 018524/0475 →
Change of Name
Nov 17, 2006
From: NIKKO MATERIALS CO., LTD.
To: NIPPON MINING & METALS CO., LTD.
Reel/Frame 018524/0974 →
Change of Name/Merger
Jun 9, 2011
From: NIPPON MINING & METALS CO., LTD.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 026417/0023 →
Change of Address
Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →