Patent Assignment
Reel/Frame 028503/0742
Assignment of Assignor's Interest
Recorded: 2012-07-06
Received: 2012-07-06
Pages: 5
Assignors
CANTORNA, NESTOR C.
Executed: 2012-01-30
LEGUIDLEGUID, ROY
Executed: 2012-01-30
LEGUIDLEGUID, RONALD
Executed: 2012-02-01
WALLACE, MICHAEL P.
Executed: 2012-02-04
Assignee
BAXANO, INC.
655 RIVER OAKS PARKWAY, SAN JOSE, CA, 95134, UNITED STATES
Covered Properties
(23)
Surgical Tools for Treatment of Spinal Stenosis
Application:
13/338,134 →
Protective Metal-Clad Structures
Application:
13/184,665 →
Production of Molybdenum Metal Powder
Application:
13/124,814 →
Methods of Joining Protective Metal-Clad Structures
Application:
13/026,370 →
Molybdenum Containing Targets
Application:
12/827,562 →
Molybdenum-Containing Targets Comprising Three Metal Elements
Application:
12/827,550 →
Process for Preparing Metal Powders Having Low Oxygen Content, Powders So-Produced and Uses Thereof
Application:
12/444,263 →
Niobium Based Alloy That Is Resistant to Aqueous Corrosion
Application:
12/498,770 →
Tin Oxide-Based Sputtering Target, Transparent Conductive Films, Method for Producing Such Films and Composition for Use Therein
Application:
12/268,713 →
Refractory Metal-Doped Sputtering Targets, Thin Films Prepared Therewith and Electronic Device Elements Containing Such Films
Application:
12/256,609 →
Low-Energy Method of Manufacturing Bulk Metallic Structures with Submicron Grain Sizes
Application:
12/245,840 →
Dynamic Dehydriding of Refractory Metal Powders
Application:
12/206,944 →
Methods and Apparatus for Controlling Texture of Plates and Sheets by Tilt Rolling
Application:
12/221,759 →
Refractory metal plates with improved uniformity of texture
Application:
12/221,646 →
Methods of Making Molybdenium Titanium Sputtering Plates and Targets
Application:
12/090,919 →
Tantalum Based Alloy That Is Resistant to Aqueous Corrosion
Application:
12/109,765 →
Pre-Plating Surface Treatments for Enhanced Galvanic-Corrosion Resistance
Application:
12/056,798 →
Methods Of Forming Alpha And Beta Tantalum Films With Controlled And New Microstructures
Application:
10/593,809 →
High density refractory metals & alloys sputtering targets
Application:
11/653,816 →
Method of joining tantalum clad steel structures
Application:
11/638,625 →
Tin Oxide-Based Sputtering Target, Low Resistivity, Transparent Conductive Film, Method for Producing Such Film and Composition for Use Therein
Application:
11/590,179 →
Tantalum-Silicon and Niobium-Silicon Substrates for Capacitor Anodes
Application:
10/074,073 →
Production of Pure Molybdenum Oxide from Low Grade Molybdeniteconcentrates
Application:
09/852,207 →