Method for plasma etching of positively sloped structures
View Patent ↗The present invention provides a method of etching features in a substrate. The method comprising the steps of placing the substrate on a substrate support in a vacuum chamber. An alternatingly and repeating process is performed on the substrate until a predetermined trench depth and a predetermined sidewall angle are achieved. One part of the process is a deposition step which is carried out by introducing at least one polymer containing gas into the vacuum chamber. A plasma is ignited from the polymer containing gas which is then used to deposit a polymer on the substrate. The other part of the alternatingly and repeating process is an etching step which is carried out by introducing an etchant containing gas, a polymer containing gas and a scavenger containing gas into the vacuum chamber. A plasma is ignited from the etchant containing gas, the polymer containing gas and the scavenger containing gas which is then used to etch the substrate.
1. A method of etching features in a substrate comprising:
placing said substrate on a support member in a vacuum chamber;
introducing at least one polymer containing gas into said vacuum chamber;
igniting a plasma from said polymer containing gas;
depositing a polymer on said substrate using said plasma of said polymer containing gas;
pulsing said depositing of said polymer, said pulsing having a process on-time of less than about two seconds;
repeating said pulsing of said depositing of said polymer;
introducing an etchant containing gas, a polymer containing gas and a scavenger containing gas into said vacuum chamber;
igniting a plasma from said etchant containing gas, said polymer containing gas and said scavenger containing gas;
etching said substrate using said plasma of said etchant containing gas, said polymer containing gas and said scavenger containing gas; and
adjusting parameters of the deposition step and adjusting parameters of the etching step until a predetermined trench depth and a predetermined sidewall angle are achieved.
2. The method according to claim 1 wherein said substrate is silicon.
3. The method according to claim 1 wherein said substrate is germanium.
4. The method according to claim 1 wherein said polymer containing gas is selected from the group consisting of fluorocarbon containing gases, hydrocarbon containing gases and combinations thereof.
5. The method according to claim 1 wherein said polymer containing gas is selected from the group consisting of C 4 F 8 , CH 2 F 2 , CHF 3 and combinations thereof.
6. The method according to claim 1 wherein said etchant containing gas is selected from the group consisting of SF 6 , CF 4 , NF 3 and combinations thereof.
7. The method according to claim 1 wherein said scavenger containing gas is an oxygen containing gas.
8. The method according to claim 7 wherein said oxygen containing gas is selected from the group consisting of O 2 , CO 2 and combinations thereof.
9. The method according to claim 1 wherein said support member is maintained at temperatures ranging from about minus 40 degrees C. to about 20 degrees C. during the etch step.
10. A method of etching features in a substrate comprising:
placing said substrate on a support member in a vacuum chamber;
introducing at least one polymer containing gas into a vacuum chamber;
igniting a plasma from said polymer containing gas;
depositing a polymer on said substrate using said plasma of said polymer containing gas;
pulsing said depositing of said polymer, said pulsing having a process on-time of less than about two seconds;
repeating said pulsing of said depositing of said polymer;
introducing an etchant containing gas and a polymer containing gas into said vacuum chamber;
igniting a plasma from said etchant containing gas and said polymer containing gas;
etching said substrate using said plasma of said etchant containing gas and said polymer containing gas; and
adjusting parameters of the deposition step and adjusting parameters of the etching step until a predetermined trench depth and a predetermined sidewall angle are achieved.
11. The method according to claim 10 wherein said substrate is silicon.
12. The method according to claim 10 wherein said substrate is germanium.
13. The method according to claim 10 wherein said polymer containing gas is selected from the group consisting of fluorocarbon containing gases, hydrocarbon containing gases and combinations thereof.
14. The method according to claim 10 wherein said polymer containing gas is selected from the group consisting of C 4 F 8 , CH 2 F 2 , CHF 3 and combinations thereof.
15. The method according to claim 10 wherein said etchant containing gas is selected from the group consisting of SF 6 , CF 4 , NF 3 and combinations thereof.
16. The method according to claim 10 wherein said support member is maintained at temperatures ranging from about minus 40 degrees C. to about 20 degrees C. during the etch step.
17. A method of etching features in a substrate comprising:
placing said substrate on a support member in a vacuum chamber;
introducing at least one polymer containing gas into a vacuum chamber;
igniting a plasma from said polymer containing gas;
depositing a polymer on said substrate using said plasma of said polymer containing gas;
pulsing said depositing of said polymer, said pulsing having a process on-time of less than about two seconds;
repeating said pulsing of said depositing of said polymer;
introducing an etchant containing gas into said vacuum chamber;
igniting a plasma from said etchant containing gas;
etching said substrate using said plasma of said etchant containing gas; and
adjusting parameters of the deposition step and adjusting parameters of the etching step until a predetermined trench depth and a predetermined sidewall angle are achieved.
18. The method according to claim 17 wherein said substrate is silicon.
19. The method according to claim 17 wherein said substrate is germanium.
20. The method according to claim 17 wherein said polymer containing gas is selected from the group consisting of fluorocarbon containing gases, hydrocarbon containing gases and combinations thereof.
21. The method according to claim 17 wherein said polymer containing gas is selected from the group consisting of C 4 F 8 , CH 2 F 2 , CHF 3 and combinations thereof.
22. The method according to claim 17 wherein said etchant containing gas is selected from the group consisting of SF 6 , CF 4 , NF 3 and combinations thereof.
23. The method according to claim 17 wherein said support member is maintained at temperatures ranging from about minus 40 degrees C. to about 20 degrees C. during the etch step.
24. The method according to claim 17 further comprising:
introducing a scavenger containing gas into said vacuum chamber;
igniting a plasma from said scavenger containing gas; and
etching said substrate using said plasma of said scavenger containing gas.
25. The method according to claim 24 wherein said scavenger containing gas is an oxygen containing gas.
26. The method according to claim 25 wherein said oxygen containing gas is selected from the group consisting of O 2 , CO 2 and combinations thereof.