IP Library Assignment 047688/0061
Patent Assignment
Reel/Frame 047688/0061

Security Interest

Recorded: 2018-11-30 Pages: 12
Assignors
RAJE TECHNOLOGY GROUP, LLC
Executed: 2018-11-21
PLASMA-THERM, LLC
Executed: 2018-11-21
PLASMA-THERM NES, LLC
Executed: 2018-11-21
Assignee
HSBC BANK USA, N.A.
2929 WALDEN AVE, LOCATION C-112, DEPEW, NEW YORK, 14043
Covered Properties (47)
Etching Process for Producing Substantially Undercut Free Silicon on Insulator Structures
Patent: 6,071,822 →
Application: 09/127,762 →
Morphed Processing of Semiconductor Devices
Patent: 6,417,013 →
Application: 09/239,723 →
Magnetic Pole Fabrication Process and Device
Patent: 6,540,928 →
Application: 09/658,023 →
Magnetic Pole Fabrication Process and Device
Patent: 6,547,975 →
Application: 09/696,739 →
Method for Thin Film Lift-Off Processes Using Lateral Extended Etching Masks and Device
Patent: 6,605,519 →
Application: 09/846,214 →
Publication: US 2002/0164884
Embedded Attenuated Phase Shift Mask and Method of Making Embedded Attenuated Phase Shift Mask
Patent: 6,544,696 →
Application: 09/996,748 →
Publication: US 2002/0068229
Perimeter Seal for Backside Cooling of Substrates
Patent: 6,771,482 →
Application: 10/163,567 →
Publication: US 2003/0021077
Method for Etching Vias
Patent: 6,846,747 →
Application: 10/407,831 →
Publication: US 2003/0216034
Notch-Free Etching of High Aspect Soi Structures Using Alternating Deposition and Etching and Pulsed Plasma
Patent: 6,905,626 →
Application: 10/601,076 →
Publication: US 2004/0055995
Sidewall Smoothing in High Aspect Ratio/Deep Etching Using a Discrete Gas Switching Method
Patent: 6,924,235 →
Application: 10/640,469 →
Publication: US 2004/0092118
End Point Detection in Time Division Multiplexed Etch Processes
Patent: 6,982,175 →
Application: 10/770,839 →
Publication: US 2004/0175913
Method and Apparatus for Process Control in Time Division Multiplexed (Tdm) Etch Process
Patent: 7,115,520 →
Application: 10/815,965 →
Publication: US 2004/0235307
Etching of Chromium Layers on Photomasks Utilizing High Density Plasma and Low Frequency Rf Bias
Patent: 7,008,877 →
Application: 10/839,809 →
Publication: US 2004/0259367
Envelope Follower End Point Detection in Time Division Multiplexed Processes
Patent: 7,101,805 →
Application: 10/841,818 →
Publication: US 2004/0238489
Method and Apparatus for Process Control in Time Division Multiplexed (Tdm) Etch Processes
Patent: 7,381,650 →
Application: 11/155,904 →
Publication: US 2005/0263485
Method and Apparatus for Reducing Aspect Ratio Dependent Etching in Time Division Multiplexed Etch Processes
Patent: 7,959,819 →
Application: 11/159,415 →
Publication: US 2005/0287815
Method & Apparatus to Improve Plasma Etch Uniformity
Patent: 7,713,432 →
Application: 11/229,319 →
Publication: US 2006/0070703
Process Change Detection Through the Use of Evolutionary Algorithms
Patent: 7,625,824 →
Application: 11/441,811 →
Publication: US 2006/0287753
Optical Emission Interferometry for Pecvd Using a Gas Injection Hole
Patent: 7,833,381 →
Application: 11/502,585 →
Publication: US 2007/0039548
Method for Etching Photolithographic Substrates
Patent: 7,749,400 →
Application: 11/634,377 →
Publication: US 2007/0138136
Temperature Control Method for Photolithographic Substrate
Patent: 7,867,403 →
Application: 11/756,074 →
Publication: US 2008/0149597
Method for Plasma Etching of Positively Sloped Structures
Patent: 7,829,465 →
Application: 11/834,127 →
Publication: US 2008/0061029
Method to Minimize Cd Etch Bias
Patent: 8,187,483 →
Application: 11/834,299 →
Publication: US 2008/0035606
Grid Assemblies for Use in Ion Beam Etching Systems and Methods of Utilizing the Grid Assemblies
Patent: 8,703,001 →
Application: 12/244,681 →
Conductive Seal Ring Electrostatic Chuck
Patent: 8,139,340 →
Application: 12/689,784 →
Publication: US 2011/0026187
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 8,802,545 →
Application: 13/412,119 →
Publication: US 2013/0065378
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 8,778,806 →
Application: 13/448,769 →
Publication: US 2012/0238073
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 8,796,154 →
Application: 13/764,110 →
Publication: US 2013/0230972
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 8,785,332 →
Application: 13/764,142 →
Publication: US 2013/0230968
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 8,980,764 →
Application: 13/764,160 →
Publication: US 2013/0230969
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,202,720 →
Application: 13/764,177 →
Publication: US 2013/0230970
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 8,946,058 →
Application: 13/767,459 →
Publication: US 2013/0230973
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,070,760 →
Application: 13/787,032 →
Publication: US 2013/0230974
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,105,705 →
Application: 13/787,153 →
Publication: US 2014/0235034
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 8,691,702 →
Application: 13/829,324 →
Publication: US 2013/0230971
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,343,365 →
Application: 14/014,040 →
Publication: US 2013/0344683
Method for Dicing a Substrate with Back Metal
Patent: 9,368,404 →
Application: 14/034,164 →
Publication: US 2014/0094018
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,202,721 →
Application: 14/176,747 →
Publication: US 2014/0154869
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 9,082,839 →
Application: 14/201,409 →
Publication: US 2014/0242780
Wafer Stage for Symmetric Wafer Processing
Patent: 9,863,036 →
Application: 14/697,441 →
Publication: US 2015/0307986
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,496,177 →
Application: 14/721,443 →
Publication: US 2015/0255347
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,202,737 →
Application: 14/728,517 →
Publication: US 2015/0270154
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 46,339 →
Application: 14/854,127 →
Method and Apparatus for Plasma Dicing a Semi-Conductor Wafer
Patent: 9,564,366 →
Application: 14/974,840 →
Publication: US 2016/0111332
Powered Anode for Ion Source for Dlc and Reactive Processes
Patent: 9,865,436 →
Application: 15/206,300 →
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,911,654 →
Application: 15/287,412 →
Publication: US 2017/0025311
Method and Apparatus for Plasma Dicing a Semi-conductor Wafer
Patent: 9,711,406 →
Application: 15/287,501 →
Publication: US 2017/0033008
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 20, 1998
From: DONOHUE, JOHN F.; JOHNSON, DAVID J.; DEVRE, MICHAEL W.
To: PLASMA-THERM, INC.
Reel/Frame 009527/0937 →
Assignment of Assignor's Interest Apr 12, 1999
From: TEIXEIRA, MICHAEL J.; DEVRE, MIKE; DAWSON, WADE; JOHNSON, DAVE
To: PLASMA-THERM, INC.
Reel/Frame 009881/0423 →
Assignment of Assignor's Interest Jan 18, 2001
From: KOBRIN, BORIS; OSTAN, EDWARD
To: UNAXIS USA INC.
Reel/Frame 011451/0844 →
Assignment of Assignor's Interest Feb 20, 2001
From: KOBRIN, BORIS
To: UNAXIS USA INC.
Reel/Frame 011544/0260 →
Assignment of Assignor's Interest May 2, 2001
From: LISHAN, DAVID G.
To: UNAXIS USA
Reel/Frame 011780/0322 →
Assignment of Assignor's Interest Nov 30, 2001
From: WESTERMAN, RUSSELL; CONSTANTINE, CHRISTOPHER
To: UNAXIS USA INC.
Reel/Frame 012339/0494 →
Assignment of Assignor's Interest Jun 6, 2002
From: KENNEY, MARK D.
To: UNAXIS USA, INC.
Reel/Frame 012978/0139 →
Assignment of Assignor's Interest Jun 24, 2004
From: WESTERMAN, RUSSELL; JOHNSON, DAVID J.
To: UNAXIS USA INC.
Reel/Frame 015498/0852 →
Assignment of Assignor's Interest Jul 22, 2004
From: LAI, SHOULIANG; WESTERMAN, RUSSELL; JOHNSON, DAVID J.
To: UNAXIS USA INC.
Reel/Frame 015595/0802 →
Assignment of Assignor's Interest Jul 28, 2004
From: WESTERMAN, RUSSELL; JOHNSON, DAVID J.
To: UNAXIS USA INC.
Reel/Frame 015626/0938 →
Assignment of Assignor's Interest Aug 17, 2004
From: CONSTANTINE, CHRISTOPHER; PLUMHOFF, JASON; WESTERMAN, RUSSELL; JOHNSON, DAVID J.
To: UNAXIS USA INC.
Reel/Frame 015691/0069 →
Assignment of Assignor's Interest Aug 16, 2005
From: JOHNSON, DAVID; WESTERMAN, RUSSELL; TEIXEIRA, MICHAEL J.; LAI, SHOULIANG
To: UNAXIS USA INC.
Reel/Frame 016405/0085 →
Assignment of Assignor's Interest Sep 21, 2005
From: JOHNSON, DAVID; WESTERMAN, RUSSELL; LAI, SHOULIANG
To: UNAXIS USA INC.
Reel/Frame 016566/0040 →
Assignment of Assignor's Interest Jan 26, 2006
From: JOHNSON, DAVID; WESTERMAN, RUSSELL
To: UNAXIS USA INC.
Reel/Frame 017068/0902 →
Assignment of Assignor's Interest Jul 12, 2006
From: PLUMHOFF, JASON
To: UNAXIS USA INC.
Reel/Frame 017920/0419 →
Assignment of Assignor's Interest Sep 6, 2006
From: PLUMHOFF, JASON
To: UNAXIS USA INC.
Reel/Frame 018210/0643 →
Assignment of Assignor's Interest Feb 5, 2009
From: OERLIKON USA, INC.
To: PLASMA-THERM, LLC
Reel/Frame 022203/0740 →
Assignment of Assignor's Interest Apr 2, 2013
From: OERLIKON USA INC.
To: PLASMA-THERM, LLC
Reel/Frame 030134/0245 →
Security Agreement Apr 5, 2013
From: PLASMA-THERM, LLC
To: TD BANK, N.A.
Reel/Frame 030157/0772 →
Security Interest Apr 28, 2015
From: RAJE TECHNOLOGY GROUP, LLC; PLASMA-THERM, LLC; REV-TECH MANUFACTURING SOLUTIONS, LLC; LOGIX TECHNOLOGY HOLDINGS, LLC
To: SUNTRUST BANK
Reel/Frame 035509/0738 →
Release of Security Interest Jul 30, 2015
From: TD BANK, N.A.
To: PLASMA-THERM, LLC
Reel/Frame 036221/0402 →
Security Interest Sep 13, 2016
From: RAJE TECHNOLOGY GROUP, LLC; PLASMA-THERM, LLC; REV-TECH MANUFACTURING SOLUTIONS, LLC; LOGIX TECHNOLOGY HOLDINGS, LLC
To: SUNTRUST BANK
Reel/Frame 039706/0927 →
Release of Security Interest Nov 28, 2018
From: SUNTRUST BANK
To: RAJE TECHNOLOGY GROUP, LLC; PLASMA-THERM, LLC; REV-TECH MANUFACTURING SOLUTIONS, LLC; LOGIX TECHNOLOGY HOLDINGS, LLC
Reel/Frame 047608/0189 →
Security Interest Nov 29, 2018
From: HINE AUTOMATION, LLC; PLASMA-THERM, LLC
To: HSBC BANK USA, N.A.
Reel/Frame 047687/0357 →
Security Interest Nov 29, 2018
From: DRYTEK, LLC; LOGIX TECHNOLOGY HOLDINGS, LLC; PLASMA-THERM, LLC
To: HSBC BANK USA, N.A.
Reel/Frame 048174/0001 →