Semiconductor manufacturing process modules
View Patent ↗A method is provided where the method includes configuring a plurality of robots so that a wafer can be handed off between neighboring robots, and disposing a plurality of sensors so that a robotic arm-relative position of a wafer that is transported by a robot is determined from sensor outputs by moving the wafer through a retract, rotate, and extend path.
1. A method comprising:
configuring a plurality of robots so that a wafer can be handed off between neighboring robots, where each of the robots is disposed in a respective one of a plurality of robotic handling facilities, each robotic handling facility having at least one entrance; and
disposing a plurality of sensors so that a robotic arm-relative position of a wafer that is transported by a robot is determined from sensor outputs by moving the wafer through a retract, rotate, and extend path, wherein the plurality of sensors are disposed so that at least one sensor of the plurality of sensors having a vertical optical beam with a corresponding emitter and detector is located adjacent each entrance and edges of the wafer are detected by the corresponding emitter and detector of the at least one sensor adjacent each entrance of the plurality of sensors during travel of the wafer proximate a respective entrance along at least both of the retract and rotate paths.
2. The method of claim 1 , further including adding at least one of a semiconductor processing module and a wafer handling robotic facility to the semiconductor handling system without reconfiguring the plurality of robotic handling facilities.
3. The method of claim 1 , further including configuring the plurality of robotic handling facilities to facilitate sequential processing of a workpiece by a first robot handing off the workpiece to a second robot between two sequential processes.
4. The method of claim 1 , wherein the plurality of robotic handling facilities forms a vacuum environment and at least one of the robotic handling facilities includes a plurality of modular interfaces that each supports connection to compatible modules to extend the vacuum environment.
5. The method of claim 1 , further including detecting an orientation of the workpiece to ensure a placement of the workpiece complies with an alignment requirement.
6. The method of claim 1 , further including moving the robotic arm over at least one of the plurality of sensors to detect a sensor-relative position of an end effector assembled to the robotic arm.
7. The method of claim 1 , further including providing a module connected to the semiconductor handling system that includes wafer storage features that are accessible by at least one robotic handling facility.
8. The method of claim 1 , further providing at least two wafer handling robots in at least two wafer processing planes, the robots capable of handing workpieces between the at least two planes.
9. The method of claim 1 , wherein the semiconductor handling system includes at least two different wafer processing modules selected from a list consisting of standard width, double width, stretch width, sub chamber divided, batch process, double sided entry, and scanning electron microscope.
10. A system comprising:
a plurality of robotic handling facilities configured to form a semiconductor handling system, wherein each of the plurality of robotic handling facilities includes at least one robot for handling a wafer and at least one entrance, the plurality of robotic handling facilities being configured to handoff the wafer between neighboring robots; and
a plurality of sensors that are disposed so that a robotic arm-relative position of a wafer that is transported by the robotic arm is determined from sensor outputs by moving the wafer through a retract, rotate, and extend path, wherein the plurality of sensors are disposed so that at least one sensor of the plurality of sensors having a vertical optical beam with a corresponding emitter and detector is located adjacent each entrance and edges of the wafer are detected by the corresponding emitter and detector of the at least one sensor adjacent each entrance of the plurality of sensors during travel of the wafer proximate a respective entrance along at least both of the retract and rotate paths.
11. The system of claim 10 , wherein at least one of a semiconductor processing module and a wafer handling robotic facility can be added to the semiconductor handling system without reconfiguring the plurality of robotic handling facilities.
12. The system of claim 10 , wherein the plurality of robotic handling facilities is configured to facilitate sequential processing of a workpiece by a first robot handing off the workpiece to a second robot between two sequential processes.
13. The system of claim 10 , wherein the plurality of robotic handling facilities forms a vacuum environment and at least one of the robotic handling facilities includes a plurality of modular interfaces that each supports connection to compatible modules to extend the vacuum environment.
14. The system of claim 10 , wherein an orientation of the workpiece is detected and the detected orientation is used to ensure a placement of the workpiece complies with an alignment requirement.
15. The system of claim 10 , wherein at least one of the plurality of sensors detects a position of an end effector that is assembled to the robotic arm.
16. The system of claim 10 , further including a module connected to the semiconductor handling system that includes wafer storage features that are accessible by at least one robotic handling facility.
17. The system of claim 10 , wherein the semiconductor handling system further includes at least two wafer handling robots in at least two wafer processing planes, the robots capable of handing workpieces between the at least two planes.
18. The system of claim 11 , wherein the semiconductor handling system includes at least two different wafer processing modules selected from a list consisting of standard width, double width, stretch width, sub chamber divided, batch process, double sided entry, and scanning electron microscope.
19. A system comprising:
a robotic arm wafer handling facility including an interior and plurality of entrances; and
a plurality of sensors disposed in the interior so that a robotic arm-relative position of a wafer that is transported by the robotic arm is determined from sensor outputs by moving the wafer through a retract, rotate, and extend path, wherein two sensors are disposed for each one of the plurality of entrances at least one sensor of the two sensors having a vertical optical beam with a corresponding emitter and detector is located adjacent each entrance, where the at least one each sensor of the two sensors being capable of detecting, with the corresponding emitter and detector, a presence of the wafer at a predetermined location within the interior during travel of the wafer proximate a respective entrance along at least both of the retract and rotate paths, and
wherein the plurality of sensors are arranged so that at least two of the plurality of sensors detect the wafer for every position of the wafer entirely within the interior.
20. The system of claim 19 , wherein the robotic handling facility includes a plurality of modular interfaces that each supports connection to compatible modules to extend the vacuum environment.