IP Library Granted Patent US 9,153,516
Granted Patent B2
US 9,153,516 · App. 14/258,775 · Granted Oct 6, 2015

Voidlessly encapsulated semiconductor die package

Inventor: Cecil Kent Walters (Scottsdale, AZ)
Assignee: Microsemi Corporation
H01L23/3107H01L23/051H01L23/488H01L24/33H01L29/1608H01L2224/33051H01L2924/00H01L2924/0002H01L2924/01042H01L2924/01074H01L2924/01079H01L2924/12032
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Quick Facts
Patent No.
US 9,153,516
App. No.
14/258,775
Granted
Oct 6, 2015
Kind
B2
Abstract

A system can include a semiconductor die having a first side and a second side opposite the first side. The system can also include a first slug coupled to a portion of the first side of the die. The system can further include a second slug coupled to a portion of the second side of the die. The system can additionally include an insulating material voidlessly encapsulating the die. The first slug can include a first portion having a first width in proximity to the die and a second portion having a second width. The first portion can be closer than the second portion to the die and the first width can be smaller than the second width.

Claims (75)

1. A system, comprising:

a semiconductor die having a first side and a second side opposite the first side;

a first slug coupled to a portion of the first side of the die;

a second slug coupled to a portion of the second side of the die; and

an insulating material voidlessly encapsulating the die,

wherein the first slug includes a first portion having a first width in proximity to the die and a second portion having a second width, wherein the first portion is closer than the second portion to the die and the first width is smaller than the second width, and

wherein the semiconductor die comprises a silicon carbide die.

2. The system of claim 1 , wherein the first portion comprises a truncated cone.

3. The system of claim 2 , wherein the slope of the cone is approximately N degrees off an axis of the cone and N comprises a value between 10 degrees and 80 degrees.

4. The system of claim 3 , wherein the slope of the cone is approximately 45 degrees off the axis of the cone.

5. The system of claim 1 , wherein the first portion comprises a cylinder having a smaller width than the second portion.

6. The system of claim 1 , wherein the first portion varies from the first width to the second width to form one of a convex surface, a concave-convex surface, and a concave surface.

7. The system of claim 1 , wherein the semiconductor die comprises a planar die.

8. The system of claim 1 , wherein the first slug comprises one of molybdenum and tungsten.

9. The system of claim 1 , wherein the shape and size of the second slug is substantially identical to the shape and size of the first slug.

10. The system of claim 1 , wherein the semiconductor die has a width approximately equal to the second width.

11. The system of claim 10 , wherein, when the semiconductor die includes a cross section that is one of a square or a hexagon, the semiconductor die has a major diagonal approximately equal to the second width.

12. The system of claim 10 , wherein, when the first slug is cylindrical, the first width corresponds to a first diameter of the slug and the second width corresponds to a second diameter of the slug.

13. The system of claim 1 , wherein the semiconductor die includes a passivation layer in an area corresponding to a difference between the second width and the first width.

14. The system of claim 1 , wherein the insulating material comprises a high dielectric strength glass.

15. The system of claim 1 , wherein the first width corresponds to a metallization area on a surface of the semiconductor die.

16. The system of claim 1 , wherein the first slug is provided with one of a lead or a surface mount connector.

17. A system, comprising:

a semiconductor die having a first side and a second side opposite the first side;

a first slug coupled to a portion of the first side of the die;

a second slug coupled to a portion of the second side of the die;

a second semiconductor die located adjacent to the semiconductor die; and

an insulating material voidlessly encapsulating the die,

wherein the first slug includes a first portion having a first width in proximity to the die and a second portion having a second width, wherein the first portion is closer than the second portion to the die and the first width is smaller than the second width.

18. The system of claim 17 , wherein the second semiconductor die is arranged between the semiconductor die and the second slug.

19. The system of claim 17 , wherein the second semiconductor die is arranged back-to-back with the semiconductor die and wherein both the first slug and the second slug are tapered.

20. A system, comprising:

a semiconductor die having a first side and a second side opposite the first side;

a first slug coupled to a portion of the first side of the die;

a second slug coupled to a portion of the second side of the die;

a second semiconductor die located between the second slug and a third slug; and

an insulating material voidlessly encapsulating the die,

wherein the first slug includes a first portion having a first width in proximity to the die and a second portion having a second width, wherein the first portion is closer than the second portion to the die and the first width is smaller than the second width.

21. The system of claim 20 , further comprising a third semiconductor die located between the third slug and a fourth slug.

22. A printed circuit board comprising the system of claim claim 1 .

23. A power supply comprising the system of claim 1 .

24. A satellite system comprising the system of claim 1 .

25. A method of manufacture, comprising:

coupling a first slug to a portion of a first side of a semiconductor die having the first side and a second side opposite the first side;

coupling a second slug to a portion of the second side; and

voidlessly encapsulating the die with an insulating material;

wherein the first slug includes a first portion having a first width in proximity to the die and a second portion having a second width, wherein the first portion is closer than the second portion to the die and the first width is smaller than the second width, and

wherein the semiconductor die comprises a silicon carbide die.

26. The method of claim 25 , wherein the first portion comprises a truncated cone.

27. The method of claim 25 , wherein the semiconductor die comprises a planar die.

28. The method of claim 25 , wherein the first slug comprises one of molybdenum and tungsten.

29. The method of claim 25 , wherein the shape and size of the second slug is substantially identical to the shape and size of the first slug.

30. The method of claim 25 , wherein the semiconductor die has a width approximately equal to the second width.

31. The method of claim 25 , wherein the semiconductor die includes a passivation layer in an area corresponding to a difference between the second width and the first width.

32. The method of claim 25 , wherein the insulating material comprises a high dielectric strength glass.

33. The method of claim 25 , wherein the first width corresponds to a metallization area on a surface of the semiconductor die.

34. The method of claim 25 , wherein the first slug is provided with one of a lead or a surface mount connector.

35. The method of claim 25 , further comprising installing the semiconductor die, the first slug, and the second slug on a printed circuit board.

36. The method of claim 25 , further comprising installing the semiconductor die, the first slug, and the second slug in a power supply.

37. The method of claim 25 , further comprising installing the semiconductor die, the first slug, and the second slug in a satellite system.

38. A method of manufacture, comprising:

coupling a first slug to a portion of a first side of a semiconductor die having the first side and a second side opposite the first side;

coupling a second slug to a portion of the second side;

coupling a second semiconductor die between the second slug and a third slug; and

voidlessly encapsulating the die with an insulating material;

wherein the first slug includes a first portion having a first width in proximity to the die and a second portion having a second width, wherein the first portion is closer than the second portion to the die and the first width is smaller than the second width.

39. A method of manufacture, comprising:

coupling a first slug to a portion of a first side of a semiconductor die having the first side and a second side opposite the first side;

coupling a second slug to a portion of the second side;

coupling a second semiconductor die adjacent to the semiconductor die; and

voidlessly encapsulating the die with an insulating material;

wherein the first slug includes a first portion having a first width in proximity to the die and a second portion having a second width, wherein the first portion is closer than the second portion to the die and the first width is smaller than the second width.

40. The method of claim 39 , wherein the second semiconductor die is arranged between the semiconductor die and the second slug.

41. The method of claim 39 , wherein the second semiconductor die is arranged back-to-back with the semiconductor die and wherein both the first slug and the second slug are tapered.

42. The method of claim 38 , further comprising coupling a third semiconductor die between the third slug and a fourth slug.

Assignments (17)
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0001 →
RELEASE OF SECURITY INTEREST Recorded Feb 25, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059333/0222 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
SECURITY INTEREST Recorded Sep 18, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 047103/0206 →
SECURITY INTEREST Recorded Jun 25, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 046426/0001 →
RELEASE OF SECURITY INTEREST Recorded May 29, 2018
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: MICROSEMI CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.), INC.; MICROSEMI FREQUENCY AND TIME CORPORATION; MICROSEMI COMMUNICATIONS, INC.; MICROSEMI SOC CORP.; MICROSEMI CORP. - POWER PRODUCTS GROUP; MICROSEMI CORP. - RF INTEGRATED SOLUTIONS
Reel/Frame 046251/0391 →
PATENT SECURITY AGREEMENT Recorded Feb 3, 2016
From: MICROSEMI CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.) INC. (F/K/A LEGERITY, INC., ZARLINK SEMICONDUCTOR (V.N.) INC., CENTELLAX, INC., AND ZARLINK SEMICONDUCTOR (U.S.) INC.); MICROSEMI FREQUENCY AND TIME CORPORATION (F/K/A SYMMETRICON, INC.); MICROSEMI COMMUNICATIONS, INC. (F/K/A VITESSE SEMICONDUCTOR CORPORATION); MICROSEMI SOC CORP. (F/K/A ACTEL CORPORATION); MICROSEMI CORP. - POWER PRODUCTS GROUP (F/K/A ADVANCED POWER TECHNOLOGY INC.); MICROSEMI CORP. - RF INTEGRATED SOLUTIONS (F/K/A AML COMMUNICATIONS, INC.)
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037691/0697 →
RELEASE OF SECURITY INTEREST Recorded Jan 19, 2016
From: BANK OF AMERICA, N.A.
To: MICROSEMI CORPORATION; MICROSEMI CORP.-ANALOG MIXED SIGNAL GROUP, A DELAWARE CORPORATION; MICROSEMI SOC CORP., A CALIFORNIA CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.) INC., A DELAWARE CORPORATION; MICROSEMI FREQUENCY AND TIME CORPORATION, A DELAWARE CORPORATION; MICROSEMI COMMUNICATIONS, INC. (F/K/A VITESSE SEMICONDUCTOR CORPORATION), A DELAWARE CORPORATION; MICROSEMI CORP.-MEMORY AND STORAGE SOLUTIONS (F/K/A WHITE ELECTRONIC DESIGNS CORPORATION), AN INDIANA CORPORATION
Reel/Frame 037558/0711 →
SECURITY AGREEMENT Recorded Apr 22, 2015
From: MICROSEMI CORPORATION; MICROSEMI CORP.-ANALOG MIXED SIGNAL GROUP; MICROSEMI SEMICONDUCTOR (U.S.) INC.; MICROSEMI SOC CORP.; MICROSEMI FREQUENCY AND TIME CORPORATION
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 035477/0057 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 22, 2014
From: WALTERS, CECIL KENT
To: MICROSEMI CORPORATION
Reel/Frame 032730/0065 →
Continuity (2)
Provisional Application 61817770 · Apr 30, 2013
Related Publication 20140319541A1 · Oct 30, 2014