Semiconductor device comprising a deep trench isolation structure and a trap rich isolation structure in a substrate and a method of making the same
A method for fabricating semiconductor device comprising the steps of: forming a first trench and a second trench in a substrate; forming a liner in the first trench and the second trench; forming a first patterned mask on the substrate to cover the second trench; removing the liner in the first trench; removing the first patterned mask; and forming an insulating layer in the first trench and the second trench to form a trap rich isolation structure in the first trench and a deep trench isolation structure in the second trench.
1. A semiconductor device, comprising:
a metal-oxide semiconductor (MOS) transistor on a substrate;
a deep trench isolation structure in the substrate and around the MOS transistor, wherein the deep trench isolation structure comprises a liner in the substrate and an insulating layer on the liner, wherein the liner comprises silicon oxide and the insulating layer comprises undoped polysilicon or silicon nitride; and
a trap rich isolation structure in the substrate and surrounding the deep trench isolation structure, wherein the deep trench isolation structure and the trap rich isolation structure comprise different materials and a number of layers in the trap rich isolation structure is less than a number of layers in the deep trench isolation structure, wherein the trap rich isolation structure comprises undoped polysilicon and the undoped polysilicon of the trap rich isolation structure is in direct contact with the substrate.
2. The semiconductor device of claim 1 ,
wherein top surfaces of the liner and the insulating layer are coplanar.
3. The semiconductor device of claim 2 , wherein the liner is U-shaped.
4. The semiconductor device of claim 2 , the insulating layer comprises silicon nitride.
5. The semiconductor device of claim 1 , wherein the insulating layer comprises undoped polysilicon.
6. The semiconductor device of claim 1 , further comprising a first air gap in the trap rich isolation structure and a second air gap in the deep trench isolation structure.
7. The semiconductor device of claim 1 , wherein the trap rich isolation structure and the deep trench isolation structure comprise same depth.
8. The semiconductor device of claim 1 , wherein the trap rich isolation structure and the deep trench isolation structure comprise different depths.