Display device and manufacturing method thereof
It is an object of the present invention to form a pixel electrode and a metal film using one resist mask in manufacturing a stacked structure by forming the metal film over the pixel electrode. A conductive film to be a pixel electrode and a metal film are stacked. A resist pattern having a thick region and a region thinner than the thick region is formed over the metal film using an exposure mask having a semi light-transmitting portion. The pixel electrode, and the metal film formed over part of the pixel electrode to be in contact therewith are formed using the resist pattern. Accordingly, a pixel electrode and a metal film can be formed using one resist mask.
1. A display device comprising:
a first substrate;
a second substrate facing the first substrate;
a semiconductor film over the first substrate;
a gate wiring overlapping with the semiconductor film with a gate insulating film interposed therebetween;
a wiring over and electrically connected to the semiconductor film, the wiring comprising metal;
an organic resin layer over the wiring;
a transparent conductive film over the organic resin layer;
a metal film over and in direct contact with a top surface of the transparent conductive film;
a liquid crystal layer over the metal film; and
a light-shielding film over the liquid crystal layer,
wherein an upper surface of the organic resin layer is a flat surface,
wherein the metal film comprises an opening,
wherein the transparent conductive film comprises a first region, a second region, and a third region,
wherein the first region of the transparent conductive film is in direct contact with the metal film,
wherein neither the second region nor the third region is in direct contact with the metal film,
wherein the first region is provided so as to surround the second region when seen from a direction perpendicular to a top surface of the first substrate,
wherein the first region is not a display region,
wherein the third region is outside the second region when seen from the direction perpendicular to the top surface of the first substrate, and
wherein at least part of the first region is between the second region and the third region when seen from the direction perpendicular to the top surface of the first substrate.
2. The display device according to claim 1 ,
wherein the metal film has a stacked structure of a first layer and a second layer, and
wherein a side at an end of the first layer and a side at an end of the second layer are each inclined with respect to the first substrate.
3. The display device according to claim 1 ,
wherein the light-shielding film and the first region of the transparent conductive film overlap with each other.
4. The display device according to claim 1 ,
wherein the first region of the transparent conductive film comprises a fourth region which extends along the gate wiring, and
wherein the fourth region does not overlap with the gate wiring when seen from the direction perpendicular to the top surface of the first substrate.
5. A display device comprising:
a first substrate;
a second substrate facing the first substrate;
a liquid crystal layer between the first substrate and the second substrate;
a light-shielding film between the liquid crystal layer and the second substrate,
wherein a pixel over the first substrate comprising:
a semiconductor film over the first substrate;
a gate wiring overlapping with the semiconductor film with a gate insulating film interposed therebetween;
a wiring over and electrically connected to the semiconductor film, the wiring comprising metal;
an organic resin layer over the wiring;
a transparent conductive film over the organic resin layer; and
a metal film over and in direct contact with a top surface of the transparent conductive film;
wherein an upper surface of the organic resin layer is a flat surface,
wherein the metal film comprises an opening,
wherein the transparent conductive film comprises a first region, a second region, and a third region,
wherein the first region of the transparent conductive film is in direct contact with the metal film,
wherein neither the second region nor the third region is in direct contact with the metal film,
wherein the first region is provided so as to surround the second region when seen from a direction perpendicular to a top surface of the first substrate,
wherein the first region is not a display region,
wherein the third region is outside the second region when seen from the direction perpendicular to the top surface of the first substrate, and
wherein at least part of the first region is between the second region and the third region when seen from the direction perpendicular to the top surface of the first substrate.
6. The display device according to claim 5 ,
wherein the metal film has a stacked structure of a first layer and a second layer, and
wherein a side at an end of the first layer and a side at an end of the second layer are each inclined with respect to the first substrate.
7. The display device according to claim 5 ,
wherein the light-shielding film and the first region of the transparent conductive film overlap with each other.
8. The display device according to claim 5 ,
wherein a side at an end of the metal film is inclined with respect to the top surface of the first substrate, and
wherein the inclined side at the end of the metal film is covered by an insulating film.
9. The display device according to claim 5 ,
wherein the first region of the transparent conductive film comprises a fourth region which extends along the gate wiring, and
wherein the fourth region does not overlap with the gate wiring when seen from the direction perpendicular to the top surface of the first substrate.