Transistor cell with self-aligned gate contact
Disclosed are apparatuses including a transistor cell and methods of fabricating the transistor cell. The transistor cell may include a substrate, an active region and a gate having a gate contact in the active region. The transistor cell may further include a first portion of a spacer of the gate contact formed from a first material, and a second portion of the spacer of the gate contact formed from a second material.
1. An apparatus comprising a transistor cell, the transistor cell comprising:
a substrate;
an active region;
a gate having a gate contact in the active region;
a first portion of a spacer of the gate contact formed from a first material;
a second portion of the spacer of the gate contact formed from a second material,
a source region having a source contact;
a drain region having a drain contact, wherein the source contact and the drain contact are adjacent the gate contact and on opposite sides of the gate contact; and
an insulation layer disposed on the substrate, between the spacer of the gate contact and the source contact, and between the spacer of the gate contact and the drain contact,
wherein top surfaces of the gate contact and the first portion are coplanar, and
wherein the source region and the drain region are formed at least partially in the substrate and at least partially in the insulation layer, and the source region and the drain region do not extend entirely up to the top surfaces of the gate contact and the first portion within the insulation layer.
2. The apparatus of claim 1 , wherein the first material comprises at least one of Aluminum Oxide (AlOx), Aluminum Nitride (AlN), Titanium Oxide (TiOx), Titanium Nitride (TiN), or Silicon Carbide (SiC).
3. The apparatus of claim 1 , wherein the second material comprises Silicon Oxycarbide (SiOC) or Silicon Boron Carbon Nitride (SiBCN).
4. The apparatus of claim 1 , wherein a thickness of the first material is substantially equal to a thickness of the second material.
5. The apparatus of claim 4 , wherein the thickness of the first material is in a range of 5 nanometers (nm) to 15 nm.
6. The apparatus of claim 1 , wherein a height of the first portion of the spacer of the gate contact is smaller than a height of the second portion of the spacer of the gate contact.
7. The apparatus of claim 6 , wherein the height of the first portion of the spacer of the gate contact is in a range of 10 nm to 20 nm.
8. The apparatus of claim 1 , wherein the insulation layer comprises Silicon Dioxide (SiO 2 ) and the gate contact, the source contact, and the drain contact comprise at least one of Cobalt (Co) or Tungsten (W).
9. The apparatus of claim 1 , wherein the spacer of the gate contact comprises a first sidewall and a second sidewall disposed on opposite sides of the gate and wherein each sidewall has a first portion formed from the first material and a second portion formed from the second material.
10. The apparatus of claim 1 , wherein the transistor cell further comprises:
a second gate having a second gate contact;
a second spacer of the second gate contact comprising a first sidewall and a second sidewall disposed on opposite sides of the second gate, wherein each sidewall of the second spacer has a first portion formed from the first material and a second portion formed from the second material;
a third gate having a third gate contact, wherein the second gate and the third gate are on opposite sides of the gate; and
a third spacer of the third gate contact comprising a first sidewall and a second sidewall disposed on opposite sides of the third gate, wherein each sidewall of the third spacer has a first portion formed from the first material and a second portion formed from the second material.
11. The apparatus of claim 1 , wherein the transistor cell further comprises:
a second gate having a second gate contact;
a second spacer of the second gate contact comprising a first sidewall and a second sidewall disposed on opposite sides of the second gate, wherein the first sidewall faces the gate and has a first portion formed from the first material and a second portion formed from the second material and wherein the second sidewall is formed from the second material;
a third gate having a third gate contact, wherein the second gate and the third gate are on opposite sides of the gate; and
a third spacer of the third gate contact comprising a first sidewall and a second sidewall disposed on opposite sides of the third gate, wherein the first sidewall faces the gate and has a first portion formed from the first material and a second portion formed from the second material and wherein the second sidewall is formed from the second material.
12. The apparatus of claim 1 , wherein the apparatus is selected from the group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.
13. The apparatus of claim 1 , wherein top surfaces of the gate contact, the first portion, and the insulation layer are coplanar.