Interconnect structure, electronic device including the same, and method of manufacturing interconnect structure
Disclosed are an interconnect structure, an electronic device including the same, and a method of manufacturing the interconnect structure. The interconnect structure includes a dielectric layer; a conductive interconnect on the dielectric layer; and a graphene cap layer on the conductive interconnect. The graphene cap layer contains graphene quantum dots, has a carbon content of 80 at % or more, and has an oxygen content of 15 at % or less.
1. An interconnect structure comprising:
a dielectric layer;
a conductive interconnect on the dielectric layer; and
a graphene cap layer on the conductive interconnect,
wherein the graphene cap layer contains graphene quantum dots including spherical grains, and
the graphene cap layer has a carbon content of 80 at % to 95 at % and an oxygen content of 5 at % to 15 at %, wherein
the dielectric layer surrounds a side surface of the conductive interconnect,
the graphene cap layer is exposed on an upper surface of the conductive interconnect, and covers an entirety of an upper surface of the dielectric layer.
2. The interconnect structure of claim 1 , wherein
wherein the graphene quantum dots have a ratio of carbon having an sp 2 bond to carbon having an sp 3 bond of 1 or more.
3. The interconnect structure of claim 1 ,
wherein the graphene quantum dots have an average grain size of about 1 nm to about 10 nm.
4. The interconnect structure of claim 1 ,
wherein the graphene cap layer has a thickness of about 1 nm to about 20 nm.
5. The interconnect structure of claim 1 ,
wherein the graphene cap layer, when measuring Raman spectra, has an intensity ratio of a D band peak to a G band peak of 2 or less.
6. The interconnect structure of claim 1 ,
wherein the graphene cap layer, when measuring Raman spectra has an intensity ratio of a 2D band peak to a G band peak of 0.01 or more.
7. The interconnect structure of claim 1 ,
wherein the conductive interconnect includes at least one metal selected from Cu, Ru, Rh, Ir, Mo, W, Pd, Pt, Co, Ta, and Ti, or an alloy thereof.
8. The interconnect structure of claim 1 , wherein
a lower surface of the graphene cap layer is coplanar with the upper surface of the conductive interconnect and the upper surface of the dielectric layer.
9. The interconnect structure of claim 1 , wherein
the graphene cap layer, when measuring Raman spectra, has an intensity ratio of a D band peak to a G band peak of less than 1.
10. The interconnect structure of claim 1 , further comprising:
a barrier layer between the dielectric layer and the conductive interconnect.
11. The interconnect structure of claim 10 , further comprising:
a liner layer between the conductive interconnect and the barrier layer.
12. The interconnect structure of claim 11 , wherein
the dielectric layer surrounds side surfaces of the conductive interconnect, the liner layer, and the barrier layer, and
wherein the graphene cap layer is exposed on an upper surface of the conductive interconnect.
13. The interconnect structure of claim 1 , wherein
the dielectric layer includes at least one trench formed therein
the conductive interconnect fills the at least one trench, and
the graphene cap layer is on at least part of an upper surface of the conductive interconnect.
14. The interconnect structure of claim 13 ,
wherein the graphene cap layer covers the upper surface of the conductive interconnect.
15. The interconnect structure of claim 1 ,
wherein the graphene cap layer, when measuring Raman spectra has an intensity ratio of a 2D band peak to a G band peak of 0.01 to 0.2.
16. The interconnect structure of claim 13 , further comprising:
a barrier layer surrounding the conductive interconnect inside the at least one trench.
17. The interconnect structure of claim 16 , further comprising:
a liner layer between the conductive interconnect and the barrier layer, wherein
the liner layer surrounds the conductive interconnect inside the at least one trench.
18. The interconnect structure of claim 17 ,
wherein the graphene cap layer covers the upper surface of the conductive interconnect.
19. The interconnect structure of claim 17 ,
wherein the graphene cap layer covers upper surfaces of the liner layer and the barrier layer around the conductive interconnect.
20. The interconnect structure of claim 13 ,
wherein the graphene cap layer directly contacts the upper surface of the conductive interconnect.
21. An electronic device comprising:
a substrate; and
the interconnect structure of claim 1 on the substrate.
22. The electronic device of claim 21 ,
wherein the graphene cap layer has a ratio of carbon having an sp 2 bond to carbon having an sp 3 bond of 1 or more.
23. The electronic device of claim 21 , wherein
the dielectric layer includes at least one trench,
the conductive interconnect fills the at least one trench, and
the graphene cap layer is on at least part of an upper surface of the conductive interconnect.
24. The interconnect structure of claim 1 ,
wherein the graphene cap layer, when measuring Raman spectra has an intensity ratio of a D band peak to a G band peak of about 0.7.
25. A method of manufacturing an interconnect structure, the method comprising:
preparing a dielectric layer;
placing a conductive interconnect on the dielectric layer;
applying a graphene-containing composition onto the conductive interconnect; and
drying the graphene-containing composition to form a graphene cap layer on the conductive interconnect,
wherein the graphene cap layer contains graphene quantum dots including spherical grains, and
the graphene cap layer has a carbon content of 80 at % to 95 at % and an oxygen content of 5 at % to 15 at %, wherein
the dielectric layer surrounds a side surface of the conductive interconnect,
the graphene cap layer is exposed on an upper surface of the conductive interconnect, and covers an entirety of an upper surface of the dielectric layer.
26. The method of claim 25 ,
wherein the graphene-containing composition includes graphene quantum dots,
each of graphene quantum dots at an end thereof has at least one functional group selected from a hydroxyl group, an epoxy group, a carboxyl group, an amine group, and an amide group.
27. The method of claim 26 ,
wherein the graphene quantum dots are dispersed in water, an organic polar solvent, or a combination thereof.
28. The method of claim 25 further comprising:
performing a heat treatment at a temperature of 400° C. or less in the applying the graphene-containing composition or the drying the graphene-containing composition to form the graphene cap layer.
29. An interconnect structure comprising:
a dielectric layer;
a conductive interconnect on the dielectric layer; and
a graphene cap layer on the conductive interconnect,
wherein the graphene cap layer contains graphene quantum dots including spherical grains, and
the graphene cap layer has a carbon content of 80 at % to 95 at % and an oxygen content of 5 at % to 15 at %, wherein
the dielectric layer surrounds a side surface of the conductive interconnect,
the graphene cap layer is exposed on an upper surface of the conductive interconnect, and covers an upper surface of the dielectric layer.
30. The interconnect structure of claim 29 , wherein
a lower surface of the graphene cap layer is coplanar with the upper surface of the conductive interconnect and the upper surface of the dielectric layer.
31. The interconnect structure of claim 29 , wherein
the graphene cap layer, when measuring Raman spectra, has an intensity ratio of a D band peak to a G band peak of less than 1.
32. The interconnect structure of claim 29 ,
wherein the graphene cap layer, when measuring Raman spectra has an intensity ratio of a D band peak to a G band peak of about 0.7.