Method for forming semiconductor redistribution structures
An embodiment is a method including forming a first interconnect structure over a first substrate, forming a redistribution via over the first interconnect structure, the redistribution via being electrically coupled to at least one of the metallization patterns of the first interconnect structure, forming a redistribution pad over the redistribution via, the redistribution pad being electrically coupled to the redistribution via, forming a first dielectric layer over the redistribution pad, and forming a second dielectric layer over the first dielectric layer. The method also includes patterning the first and second dielectric layers, forming a bond via over the redistribution pad and in the first dielectric layer, the bonding via being electrically coupled to the redistribution pad, the bond via overlapping the redistribution via, and forming a first bond pad over the bonding via and in the second dielectric layer, the first bond pad being electrically coupled to the bond via.
1 . A method comprising:
forming a first interconnect structure over a first substrate, the first interconnect structure comprising dielectric layers and metallization patterns therein;
forming a redistribution via over the first interconnect structure, the redistribution via being electrically coupled to at least one of the metallization patterns of the first interconnect structure;
forming a redistribution pad over the redistribution via, the redistribution pad being electrically coupled to the redistribution via, wherein forming the redistribution pad over the redistribution via further comprises:
depositing a first conductive material; and
performing a planarization process on a top surface of the first conductive material to form the redistribution pad with a flat top surface;
forming a first dielectric layer over the redistribution pad;
forming a second dielectric layer over the first dielectric layer;
patterning the first and second dielectric layers;
forming a bond via over the redistribution pad and in the first dielectric layer, the bonding via being electrically coupled to the redistribution pad, the bond via overlapping the redistribution via; and
forming a first bond pad over the bonding via and in the second dielectric layer, the first bond pad being electrically coupled to the bond via.
2 . The method of claim 1 , wherein the redistribution via and the redistribution pad are each formed in a damascene process.
3 . The method of claim 1 , wherein the redistribution via and the redistribution pad are formed by a single deposition process.
4 . The method of claim 1 , wherein the flat top surface of the redistribution pad is flat across an entirety of the top surface.
5 . The method of claim 1 , wherein the first bond pad overlaps the redistribution via.
6 . The method of claim 1 further comprising
patterning the first interconnect structure to form a first opening exposing a portion of the first substrate;
depositing a liner in the first opening;
filling the first opening with a second conductive material; and
thinning the first substrate to expose a portion of the second conductive material in the first opening, the second conductive material extending through the first interconnect structure and the first substrate forming a through substrate via.
7 . The method of claim 6 further comprising:
hybrid bonding the second dielectric layer and the first bond pad to a third dielectric layer and a second bond pad of a package structure, the package structure comprising a second substrate and a second interconnect structure over the second substrate, the third dielectric layer and the second bond pad being part of the second interconnect structure.
8 . The method of claim 7 further comprising after hybrid bonding the second dielectric layer and the first bond pad to the third dielectric layer and the second bond pad of the package structure, forming a first redistribution structure over the first substrate, the first redistribution structure comprising dielectric layers and metallization patterns therein, the metallization patterns of the first redistribution structure being electrically coupled to the through substrate via; and
forming a first set of conductive bumps over and electrically coupled to the first redistribution structure.
9 . The method of claim 8 further comprising:
before forming the first redistribution structure, encapsulating the first substrate, the first interconnect structure, the first dielectric layer, and the second dielectric layer with an encapsulant, the first redistribution structure being formed over the encapsulant.
10 . The method of claim 1 , wherein the redistribution via and the redistribution pad are a continuous conductive structure.
11 . The method of claim 1 , wherein the bond via has a width smaller than a width of the redistribution pad, and the first bond pad has a width smaller than the width of the redistribution pad.
12 . The method of claim 1 , wherein adjacent bond pads have a pitch in a range from 3.0 μm to 5.4 μm.
13 . The method of claim 1 , further comprising forming a barrier layer in the first dielectric layer before forming the bond via, wherein the barrier layer comprises titanium, titanium nitride, or a combination thereof.
14 . A method comprising:
forming a first dielectric layer over a first substrate, the first dielectric layer having a first metallization pattern therein;
forming a first via in a second dielectric layer over the first dielectric layer, the first via being electrically coupled to the first metallization pattern;
forming a conductive pad over the first via and the second dielectric layer, the conductive pad being electrically coupled to the first via, wherein the first via and the conductive pad are formed by a single deposition process;
forming a bond via in a third dielectric layer over the conductive pad and the second dielectric layer, the bond via being electrically coupled to the conductive pad, the bond via overlapping the first via; and
forming a first bond pad in a fourth dielectric layer over the bond via and the third dielectric layer, the first bond pad being electrically coupled to the bond via, the first bond pad overlapping the first via.
15 . The method of claim 14 further comprising:
after the single deposition process, performing a planarization process on the conductive pad to form a conductive pad with a planar top surface, wherein before the planarization process, the conductive pad has a non-planar top surface.
16 . The method of claim 14 further comprising:
forming a first patterned mask over the first dielectric layer;
performing an etch process using the first patterned mask as a mask, the etch process forming a first opening through the first dielectric layer and partially through the first substrate;
forming a liner in the first opening;
filling the first opening with a conductive material; and
thinning the first substrate to expose a portion of the conductive material in the first opening, the conductive material extending through the first dielectric layer and the first substrate forming a through substrate via.
17 . The method of claim 14 further comprising:
hybrid bonding the fourth dielectric layer and the first bond pad to a fifth dielectric layer and a second bond pad of a package structure, the package structure comprising a second substrate.
18 . A method comprising:
forming a first interconnect structure over a first substrate, the first interconnect structure comprising dielectric layers and metallization patterns therein, a through substrate via extending through the first interconnect structure and at least partially through the first substrate;
forming a redistribution via over the first interconnect structure, the redistribution via being electrically coupled to at least one of the metallization patterns of the first interconnect structure, the redistribution via being electrically coupled to the through substrate via;
forming a redistribution pad over the redistribution via, the redistribution pad being electrically coupled to the redistribution via;
forming a bond via over the redistribution pad, the bonding via being electrically coupled to the redistribution pad, the bond via overlapping the redistribution via; and
forming a first bond pad over the bonding via, the first bond pad being electrically coupled to the bond via, the first bond pad overlapping the redistribution via.
19 . The method of claim 18 , wherein a top surface of the redistribution pad is flat across an entirety of the top surface.
20 . The method of claim 18 , wherein the redistribution via and the redistribution pad are a continuous conductive structure.