IP Library Granted Patent US 12,293,950
Granted Patent B2
US 12,293,950 · App. 17/843,789 · Granted May 6, 2025

Semiconductor devices and methods of manufacturing semiconductor devices

Inventors: Shojiro Hanada (Kanagawa, JP); Shingo Nakamura (Kanagawa, JP)
Assignee: Amkor Technology Japan, Inc.
H01L23/10H01L21/54H01L23/13H01L23/20F16K99/0005F16K99/0023F16K99/0032F16K99/0036H01L23/49827H01L23/49838H01L24/48H01L2224/48091H01L2224/48106H01L2224/48229
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,293,950
App. No.
17/843,789
Granted
May 6, 2025
Kind
B2
Abstract

In one example, a semiconductor device comprises a cavity substrate comprising a base and a sidewall to define a cavity, an electronic component on a top side of the base in the cavity, a lid over the cavity and over the sidewall, and a valve to provide access to the cavity, wherein the valve has a plug to provide a seal between a cavity environment and an exterior environment outside the cavity. Other examples and related methods are also disclosed herein.

Claims (44)

1. A semiconductor device, comprising:

a cavity substrate comprising a base and a sidewall to define a cavity;

an electronic component on a top side of the base in the cavity;

a lid over the cavity and over the sidewall; and

a valve to provide access to the cavity, wherein the valve has a plug to provide a seal between a cavity environment and an exterior environment outside the cavity;

wherein the valve comprises a through-hole in the lid between the lid and the sidewall of the cavity substrate.

2. The semiconductor device of claim 1 , further comprising a seal base in the sidewall and a seal between the seal base and the lid.

3. The semiconductor device of claim 1 , wherein the cavity environment comprises a vacuum.

4. The semiconductor device of claim 1 , wherein the plug is between the sidewall and the lid.

5. The semiconductor device of claim 1 , wherein the valve is between the sidewall of the cavity substrate and a top side of the lid.

6. The semiconductor device of claim 1 , wherein the plug is exposed at a lateral side of the sidewall.

7. The semiconductor device of claim 1 , wherein the plug comprises a resin.

8. The semiconductor device of claim 1 , wherein the valve comprises a valve base on an inner wall of the lid at the through-hole.

9. The semiconductor device of claim 1 , further comprising a conductive structure in the base electrically coupled with the electronic component.

10. A semiconductor device, comprising:

a substrate comprising a base and a sidewall extending vertically from the base;

a lid over the sidewall to define a cavity between the base, the sidewall, and the lid;

an electronic component in the cavity;

a valve between the cavity and an exterior environment outside the cavity;

a seal between the lid and the sidewall; and

a plug in the valve;

wherein the seal and the plug hermetically seal the cavity from the exterior environment; and

wherein the valve comprises a through-hole in the lid between the lid and the sidewall of the substrate.

11. The semiconductor device of claim 10 , wherein:

wherein the plug is in the through-hole.

12. The semiconductor device of claim 10 , wherein:

wherein the plug is between the lid and the sidewall of the substrate.

13. The semiconductor device of claim 10 , comprising:

a seal base in the sidewall and a seal between the seal base and the lid.

14. The semiconductor device of claim 10 , comprising:

a seal base in the sidewall and contacting the plug.

15. The semiconductor device of claim 10 , wherein:

the valve is between a top side of the lid and a bottom side the lid.

16. A method to manufacture a semiconductor device, comprising:

providing a cavity substrate comprising a base and a sidewall to define a cavity;

providing an electronic component on a top side of the base in the cavity;

providing a lid over the cavity and over the sidewall, wherein:

the lid comprises a valve to provide access to the cavity; and

the valve comprises a through-hole in the lid between the lid and the sidewall of the cavity substrate; and

providing a plug in the valve to provide a seal between a cavity environment and an exterior environment outside the cavity.

17. The method of claim 16 , comprising:

providing a seal between the sidewall and the lid.

18. The method of claim 16 , comprising:

sealing the plug in the valve using a laser.

Assignments (2)
CHANGE OF NAME Recorded Nov 14, 2023
From: J-DEVICES CORPORATION
To: AMKOR TECHNOLOGY JAPAN, INC.
Reel/Frame 065565/0458 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 23, 2022
From: HANADA, SHOJIRO; NAKAMURA, SHINGO
To: J-DEVICES CORPORATION
Reel/Frame 060874/0542 →
Continuity (2)
Continuation 16720603 · Dec 19, 2019
Related Publication 20220384284A1 · Dec 1, 2022
References Cited (37)
US 6403881B1 · Hughes · 2002 [cited by examiner]
US 8236617B2 · Pagaila · 2012 [cited by examiner]
US 8258614B2 · Camacho · 2012 [cited by examiner]
US 8810018B2 · Ha · 2014 [cited by examiner]
US 8921995B1 · Railkar · 2014 [cited by examiner]
US 9346668B1 · Dreiza · 2016 [cited by examiner]
US 9837380B2 · Tan · 2017 [cited by examiner]
US 10153175B2 · Lin · 2018 [cited by examiner]
US 10475779B2 · Lin · 2019 [cited by examiner]
US 10672715B2 · Kweon · 2020 [cited by examiner]
US 20040065946A1 · Hung · 2004 [cited by examiner]
US 20040082089A1 · Cheng et al. · 2004 [cited by applicant]
US 20050184382A1 · Chen et al. · 2005 [cited by applicant]
US 20050189140A1 · Tseng · 2005 [cited by examiner]
US 20080283992A1 · Palaniappan · 2008 [cited by examiner]
US 20080315406A1 · Chung · 2008 [cited by examiner]
US 20090140146A1 · Sogawa et al. · 2009 [cited by applicant]
US 20110024899A1 · Masumoto · 2011 [cited by examiner]
US 20120106085A1 · Yamazaki et al. · 2012 [cited by applicant]
US 20130099364A1 · Liu · 2013 [cited by examiner]
US 20130249067A1 · Ng · 2013 [cited by examiner]
US 20140008738A1 · Morris, III et al. · 2014 [cited by applicant]
US 20140022718A1 · Yamazaki et al. · 2014 [cited by applicant]
US 20140232015A1 · Otremba · 2014 [cited by examiner]
US 20160262292A1 · Kuk · 2016 [cited by examiner]
US 20160304338A1 · Saint-Patrice · 2016 [cited by examiner]
US 20190051585A1 · Dimaano, Jr. · 2019 [cited by examiner]
US 20190164859A1 · Chen · 2019 [cited by examiner]
US 20190371739A1 · Kim · 2019 [cited by examiner]
US 20210193539A1 · Hanada et al. · 2021 [cited by applicant]
CN 108735890A · 2018 [cited by applicant]
JP 2008235502A · 2008 [cited by applicant]
TW 201515121A · 2015 [cited by applicant]
TW 201533855A · 2015 [cited by applicant]
TW 201731136A · 2017 [cited by applicant]
Office Action for Taiwan Application No. 109142052 mailed Aug. 15, 2024. [cited by applicant]
Office Action for Taiwan Application No. 109142052 mailed 111/22/2024. [cited by applicant]