IP Library › Granted Patent US 12,411,125
Granted Patent B2
US 12,411,125 · App. 18/016,012 · Granted Sep 9, 2025

Nanopore sensing device

Inventors: Ping Xie (Oxford, GB); Justin Millis (Oxford, GB); Rhodri Davies (Oxford, GB)
Assignee: Oxford Nanopore Technologies PLC
G01N33/48721
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Quick Facts
Patent No.
US 12,411,125
App. No.
18/016,012
Granted
Sep 9, 2025
Kind
B2
Abstract

A nanopore sensing device comprises a planar structure provided with plural fluidic passages extending between the first and second chambers. The planar structure supports nanopores in membranes across respective passages and sensor electrodes are arranged to sense a fluidic electrical potential in respective passages between the nanopores and the second chamber. The passages comprise planar fluidic resistor portions between the sensor electrode and the second chamber, the planar fluidic resistor portions extending in a planar direction of the planar structure and being configured to form a fluidic resistor.

Claims (47)

1. A nanopore sensing device comprising:

first and second chambers;

a planar structure provided with plural fluidic passages extending between the first and second chambers, the planar structure being configured to support nanopores in membranes across respective passages; and

sensor electrodes arranged to sense a fluidic electrical potential in respective passages between the nanopores and the second chamber,

wherein the passages comprise planar fluidic resistor portions between the sensor electrode and the second chamber, the planar fluidic resistor portions extending in a planar direction of the planar structure and being configured to form a fluidic resistor; and

wherein the resistance of each nanopore is greater than 50% of the total resistance of the corresponding passage.

2. A nanopore sensing device according to claim 1 , wherein the planar structure comprises:

a nanopore support layer that is configured to support the nanopores in the membranes extending across the passages; and

a further layer, the planar fluidic resistor portions being formed in the further layer.

3. A nanopore sensing device according to claim 2 , wherein the nanopore support layer is provided with wells opening into the first chamber, the wells forming part of the passages and being configured to support said nanopores in said membranes extending across the wells.

4. A nanopore sensing device according to claim 2 , wherein the further layer is a dielectric layer.

5. A nanopore sensing device according to claim 2 , wherein the planar structure further comprises a substrate, the further layer being supported by the substrate.

6. A nanopore sensing device according to claim 5 , wherein the first and second chambers are on opposite sides of the planar structure, the passages extend through the planar structure and the substrate is provided with access holes which extend therethrough and form part of the passages.

7. A nanopore sensing device according to claim 1 , wherein

the first and second chambers are on opposite sides of the planar structure, the passages extending through the planar structure, and

the planar structure comprises:

a substrate; and

a further layer, the further layer being supported by the substrate,

wherein the planar fluidic resistor portions are formed in the further layer, and the substrate is provided with access holes extending therethrough, the access holes forming part of the passages.

8. A nanopore sensing device according to claim 7 , wherein the planar structure further comprises a nanopore support layer that is configured to support the nanopores in the membranes extending across the passages.

9. A nanopore sensing device according to claim 8 , wherein the nanopore support layer is provided with wells opening into the first chamber, the wells forming part of the passages and being configured to support the nanopores in the membranes extending across the wells.

10. A nanopore sensing device according to claim 7 , wherein the further layer is a dielectric layer.

11. A nanopore sensing device according to claim 6 , wherein the further layer is between the first chamber and the substrate.

12. A nanopore sensing device according to claim 6 , wherein each access hole is shared by plural passages by being fluidically connected in common to plural planar fluidic resistor portions.

13. A nanopore sensing device according to claim 5 , wherein the substrate is a semiconductor wafer.

14. A nanopore sensing device according to claim 13 , wherein the planar structure further comprises a circuit layer supported by the semiconductor wafer, the circuit layer comprising circuit components connected to the sensor electrode.

15. A nanopore sensing device according to claim 14 , wherein the circuit layer is formed on the semiconductor wafer and the dielectric layer is formed on the circuit layer.

16. A nanopore sensing device according to claim 6 , wherein

the planar structure further comprises a semiconductor wafer having a circuit layer supported thereby, the circuit layer comprising circuit components connected to the sensor electrode, the semiconductor wafer and the circuit layer is provided with access holes which extend therethrough and form part of the passages, and

the substrate is bonded to the semiconductor wafer between the semiconductor wafer and the second chamber.

17. A nanopore sensing device according to claim 1 , wherein the planar structure comprises:

a substrate;

a circuit layer supported by the substrate, the circuit layer comprising circuit components connected to the sensor electrode; and

a nanopore support layer that is configured to support the nanopores in the membranes extending across the passages, the planar fluidic resistor portions being formed in the nanopore support layer.

18. A nanopore sensing device according to claim 17 , wherein the nanopore support layer is provided with wells opening into the first chamber, the wells forming part of the passages and being configured to support said nanopores in said membranes extending across the wells.

19. A nanopore sensing device according to claim 17 , wherein the first and second chambers are on opposite sides of the planar structure, the passages extend through the planar structure and the substrate is provided with access holes which extend therethrough and form part of the passages.

20. A nanopore sensing device according to claim 19 , wherein each access hole is shared by plural passages by being fluidically connected in common to plural planar fluidic resistor portions.

21. A nanopore sensing device according to claim 17 , wherein the substrate is a semiconductor wafer.

22. A nanopore sensing device according to claim 1 , wherein the planar fluidic resistor portion extends along a tortuous path.

23. A nanopore sensing device according to claim 1 , wherein the nanopores are biological nanopores and the membranes are capable of having the biological nanopores inserted therein.

24. A nanopore sensing device according to claim 23 , wherein the planar structure further comprises the membranes extending across the respective passages and optionally also the biological nanopores inserted in the membranes.

25. A nanopore sensing device according to claim 1 , wherein the membranes are solid state membranes, the planar structure further comprises the solid-state membranes and the nanopores are formed therein.

26. A nanopore sensing device according to claim 1 , wherein the planar fluidic resistor portion comprises sections each extending in the planar direction of the planar structure but at different depths within the planar structure.

27. A nanopore sensing device according to claim 1 , wherein the passages comprise wells opening into the first chamber, the planar structure being configured to support the nanopores in membranes extending across the wells.

28. A nanopore sensing device according to claim 1 , wherein the first and second chambers are on opposite sides of the planar structure and the passages extend through the planar structure.

29. A nanopore sensing device according to claim 1 , further comprising drive electrodes in the first and second chambers.

30. A nanopore sensing device according to claim 1 , wherein the resistance of each nanopore is 90% of the total resistance of the corresponding passage.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2023
From: DAVIES, RHODRI RHYS
To: OXFORD NANOPORE TECHNOLOGIES PLC
Reel/Frame 064116/0259 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2023
From: XIE, PING; MILLIS, JUSTIN
To: OXFORD NANOPORE TECHNOLOGIES INC.
Reel/Frame 064116/0293 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2023
From: OXFORD NANOPORE TECHNOLOGIES INC.
To: OXFORD NANOPORE TECHNOLOGIES PLC
Reel/Frame 064116/0302 →
Continuity (2)
Provisional Application 63053122 · Jul 17, 2020
Related Publication 20230349882A1 · Nov 2, 2023
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