IP Library › Granted Patent US 12,474,629
Granted Patent B2
US 12,474,629 · App. 18/227,833 · Granted Nov 18, 2025

Membrane for EUV lithography

Inventors: Maxim Aleksandrovich Nasalevich (Eindhoven, NL); Erik Achilles Abegg (Eindhoven, NL); Nirupam Banerjee (Eindhoven, NL); Michiel Alexander Blauw (Breda, NL); Derk Servatius Gertruda Brouns (Herentals, BE); Paul Janssen (Eindhoven, NL); Matthias Kruizinga (Herten, NL); Egbert Lenderink (Waalre, NL); Nicolae Maxim (Eindhoven, NL); Andrey Nikipelov (Eindhoven, NL); Arnoud Willem Notenboom (Rosmalen, NL); Claudia Piliego (Eindhoven, NL); Mária Péter (Eindhoven, NL); Gijsbert Rispens (Eersel, NL); Nadja Schuh (Eindhoven, NL); Marcus Adrianus Van De Kerkhof (Helmond, NL); Willem Joan Van Der Zande (Bussum, NL); Pieter-Jan Van Zwol (Eindhoven, NL); Antonius Willem Verburg (Eindhoven, NL); Johannes Petrus Martinus Bernardus Vermeulen (Leende, NL); David Ferdinand Vles (Eindhoven, NL); Willem-Pieter Voorthuijzen ('s-Hertogenbosch, NL); Aleksandar Nikolov Zdravkov (Eindhoven, NL)
Assignee: ASML NETHERLANDS B.V.
G03F1/62G02B5/208G02B5/283G03F1/82G03F7/70191G03F7/70575G03F7/70916G03F7/70958G03F7/70983
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Quick Facts
Patent No.
US 12,474,629
App. No.
18/227,833
Granted
Nov 18, 2025
Kind
B2
Abstract

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Claims (36)

1 . A membrane at least partly transmissive of EUV radiation for EUV lithography, the membrane comprising:

a solid core layer comprising one or more selected from: YSi 2 , ZrSi 2 , LaSi 2 , NbSi 2 , MoSi 2 , RuSi 2 or any other stable stoichiometry of Mo and Si, of Ru and Si, of Zr and Si, of La and Si, of Y and Si, or of Nb and Si; and

a capping layer providing an outer surface of a first major side and/or second, opposite major side of the membrane, wherein the core layer is thicker than the capping layer.

2 . The membrane according to claim 1 , wherein the core layer comprises one or more selected from RuSi, LaSi, Mo 3 Si, Mo 3 Si 3 , ZrSi, Zr 2 Si, TiSi or Nb 5 Si 3 .

3 . The membrane according to claim 2 , wherein the core layer further comprises one or more selected from: YSi 2 , ZrSi 2 , LaSi 2 , NbSi 2 , MoSi 2 or RuSi 2 .

4 . The membrane according to claim 1 , wherein the core layer comprises a stable stoichiometry of Mo and Si.

5 . The membrane according to claim 2 , wherein the capping layer comprises SiN.

6 . A pellicle assembly comprising:

a frame; and

the membrane of claim 1 .

7 . A patterning device assembly comprising the pellicle assembly of claim 6 and a patterning device.

8 . A dynamic gas lock assembly comprising the membrane of claim 1 .

9 . A membrane at least partly transmissive of EUV radiation for EUV lithography, the membrane comprising:

a solid core layer comprising one or more selected from:

a stable stoichiometry of Y and Si other than YSi 2 ,

a stable stoichiometry of Zr and Si other than ZrSi 2 ,

a stable stoichiometry of La and Si other than LaSi 2 ,

a stable stoichiometry of Nb and Si other than NbSi 2 ,

a stable stoichiometry of Mo and Si other than MoSi 2 , or

a stable stoichiometry of Ru and Si other than RuSi 2 ; and

a capping layer providing an outer surface of a first major side and/or second, opposite major side of the membrane, wherein the core layer is thicker than the capping layer.

10 . The membrane according to claim 9 , wherein the core layer comprises one or more selected from: RuSi, LaSi, Mo 3 Si, Mo 5 Si 3 , ZrSi, Zr 2 Si, TiSi or Nb 5 Si 3 .

11 . The membrane according to claim 9 , wherein the core layer further comprises one or more selected from: YSi 2 , ZrSi 2 , LaSi 2 , NbSi 2 , MoSi 2 , or RuSi 2 .

12 . The membrane according to claim 9 , wherein the core layer comprises a stable stoichiometry of Mo and Si, and wherein the capping layer comprises SiN.

13 . The membrane according to claim 9 , wherein the capping layer comprises carbon having a proportion of sp 3 carbon of at least 20%.

14 . The membrane according to claim 9 , wherein the capping layer comprises a transition metal doped with an alkali metal or an alkaline earth metal.

15 . A pellicle assembly comprising:

the membrane of claim 9 ; and

a frame.

16 . A membrane at least partly transmissive of EUV radiation for EUV lithography, the membrane comprising a solid core layer comprising a compound comprising one or more selected from: a stable stoichiometry of Mo and Si, a stable stoichiometry of Ru and Si, a stable stoichiometry of Zr and Si, a stable stoichiometry of La and Si, a stable stoichiometry of Y and Si, or a stable stoichiometry of Nb and Si.

17 . The membrane according to claim 16 , further comprising a capping layer providing an outer surface of a first major side and/or second, opposite major side of the membrane, wherein the capping layer comprises carbon having a proportion of sp 3 carbon of at least 20%.

18 . The membrane according to claim 16 , further comprising a capping layer providing an outer surface of a first major side and/or second, opposite major side of the membrane, wherein the capping layer comprises a transition metal doped with an alkali metal or an alkaline earth metal.

19 . The membrane according to claim 16 , further comprising a capping layer providing an outer surface of a first major side and/or second, opposite major side of the membrane, wherein the capping layer comprises an alloy of Mo with at least one other metal.

20 . A pellicle assembly comprising:

the membrane of claim 16 ; and

a frame.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2024
From: NASALEVICH, MAXIM ALEKSANDROVICH; NIKIPELOV, ANDREY ALEXANDROVICH; PÉTER, MÁRIA; VAN DER ZANDE, WILLEM JOAN; VAN ZWOL, PIETER-JAN; ABEGG, ERIK ACHILLES; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS; VLES, DAVID FERDINAND; VOORTHUIJZEN, WILLEM-PIETER
To: ASML NETHERLANDS B.V.
Reel/Frame 066153/0214 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2024
From: NASALEVICH, MAXIM ALEKSANDROVICH; ABEGG, ERIK ACHILLES; PÉTER, MÁRIA; VAN DER ZANDE, WILLEM JOAN; VAN ZWOL, PIETER-JAN; VLES, DAVID FERDINAND; VOORTHUIJZEN, WILLEM-PIETER
To: ASML NETHERLANDS B.V.
Reel/Frame 066153/0328 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2024
From: NASALEVICH, MAXIM ALEKSANDROVICH; ABEGG, ERIK ACHILLES; BROUNS, DERK SERVATIUS GERTRUDA; VAN DE KERKHOF, MARCUS ADRIANUS; JANSSEN, PAUL; KRUIZINGA, MATTHIAS; NIKIPELOV, ANDREY ALEKSANDROVICH; PÉTER, MÁRIA; SCHUH, NADJA; VAN DER ZANDE, WILLEM JOAN; VAN ZWOL, PIETER-JAN; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS; VLES, DAVID FERDINAND; VERBURG, ANTONIUS WILLEM; VOORTHUIJZEN, WILLEM-PIETER
To: ASML NETHERLANDS B.V.
Reel/Frame 066153/0506 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2024
From: NASALEVICH, MAXIM ALEKSANDROVICH; ABEGG, ERIK ACHILLES; BANERJEE, NIRUPAM; BLAUW, MICHIEL ALEXANDER; BROUNS, DERK SERVATIUS GERTRUDA; JANSSEN, PAUL; PILIEGO, CLAUDIA; KRUIZINGA, MATTHIAS; LENDERINK, EGBERT; MAXIM, NICOLAE; NIKIPELOV, ANDREY; PÉTER, MÁRIA; NOTENBOOM, ARNOUD WILLEM; RISPENS, GIJSBERT; SCHUH, NADJA; VAN DE KERKHOF, MARCUS ADRIANUS; VAN DER ZANDE, WILLEM JOAN; VAN ZWOL, PIETER-JAN; VLES, DAVID FERDINAND; VOORTHUIJZEN, WILLEM-PIETER; VERBURG, ANTONIUS WILLEM; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS; ZDRAVKOV, ALEKSANDAR NIKOLOV
To: ASML NETHERLANDS B.V.
Reel/Frame 066153/0706 →
Priority Claims (3)
EP 16166775 · Apr 25, 2016 · regional
EP 16195123 · Oct 21, 2016 · regional
EP 16205298 · Dec 20, 2016 · regional
Continuity (3)
Continuation 17130537 · Dec 22, 2020
Continuation 16093537
Related Publication 20240004283A1 · Jan 4, 2024
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