Granted Patent B2

US 12,205,796 · App. 17/597,932 · Granted Jan 21, 2025

Inventor: Sunil Kapoor (Vancouver, WA)

Assignee: Lam Research Corporation

H01J37/32174H01J37/32899H01J37/32926H01L21/02274H03G3/3042

Abstract

Claims (33)

1. An apparatus for generating radio frequency power adapted for coupling to a multi-station integrated circuit fabrication chamber, comprising:

an oscillator configured to generate a periodic signal;

a plurality of variable-gain preamplifiers each having an input port to receive a signal from the oscillator and having an output port to provide a signal of a varying amplitude;

a plurality of constant-gain amplifiers each having an input port to receive a signal from one of the plurality of variable-gain preamplifiers and each having an output port configured for coupling an amplified signal to an electrode for generating plasma in an assigned station of the multi-station integrated circuit fabrication chamber; and

a plurality of sensors, each of the plurality of sensors coupled to a corresponding output port of the plurality of constant-gain amplifiers.

2. The apparatus of claim 1 , wherein the periodic signal generated by the oscillator comprises a frequency of between 300.0 kHz and 100.0 MHz.

3. The apparatus of claim 2 , wherein the periodic signal generated by the oscillator comprises a frequency selected from the group consisting of: 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

4. The apparatus of claim 1 , wherein an output port of each of the plurality of sensors is coupled to an input port of a control module, and wherein output signals from the control module are coupled to an input port for adjusting gain of a corresponding variable-gain preamplifier of the plurality of variable-gain preamplifiers.

5. The apparatus of claim 4 , wherein one or more of the plurality of sensors is configured to detect an out-of-range parameter selected from the group consisting of: power transmitted to the assigned station of the multi-station integrated circuit fabrication chamber that exceeds a threshold value, power reflected from the assigned station of the multi-station integrated circuit fabrication chamber that exceeds a threshold value, current coupled to the assigned station of the multi-station integrated circuit fabrication chamber that exceeds a threshold value, and voltage applied to the assigned station of the multi-station integrated circuit fabrication chamber that exceeds a threshold value.

6. The apparatus of claim 4 , wherein the control module implements circuitry to provide the output signals within 10.0 ns of receipt of a signal from one of the plurality of sensors.

7. The apparatus of claim 1 , wherein each of the plurality of constant-gain amplifiers provides an output power of at least about 1000 W.

8. An apparatus for generating radio frequency power for coupling to a multi-station integrated circuit fabrication chamber, comprising:

an oscillator configured to generate a periodic signal;

a preamplifier having an input port to receive a signal from the oscillator and having an output port to provide a signal having a constant gain with respect to the received signal;

a plurality of variable-gain amplifiers each having an input port to receive a signal from the preamplifier and each having an output port configured for coupling an amplified signal to an electrode for generating plasma in an assigned station of the multi-station integrated circuit fabrication chamber; and

a plurality of sensors, each of the plurality of sensors to provide a control signal to vary an output power of a corresponding one of the plurality of variable-gain amplifiers.

9. The apparatus of claim 8 , wherein the periodic signal generated by the oscillator comprises a frequency of between 300.0 kHz and 100.0 MHz.

10. The apparatus of claim 9 , wherein the periodic signal generated by the oscillator comprises a frequency selected from the group consisting of: 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

11. The apparatus of claim 8 , wherein each of the plurality of variable-gain amplifiers is capable of providing an output power of at least about 1000.0 W.

12. The apparatus of claim 8 , further comprising a control module having circuitry to provide the control signal within 10.0 ns of receipt of a signal from one of the plurality of sensors.

13. A method of generating radio frequency power adapted for coupling to an assigned station of a multi-station integrated circuit fabrication chamber, comprising:

generating a periodic signal;

coupling the periodic signal to a plurality of variable-gain preamplifiers;

coupling an output signal from each of the plurality of variable-gain preamplifiers to a corresponding one of a plurality of constant-gain amplifiers; and

coupling an output signal from each of the plurality of constant-gain amplifiers to the assigned station of the multi-station integrated circuit fabrication chamber.

14. The method of claim 13 , further comprising:

sensing an out-of-range parameter in an output signal from one of the plurality of constant-gain amplifiers; and

modifying a magnitude of the output signal from a variable-gain preamplifier, of the variable-gain preamplifiers, responsive to sensing the out-of-range parameter.

15. The method of claim 14 , wherein the out-of-range parameter corresponds to power reflected from the assigned station of the multi-station integrated circuit fabrication chamber.

16. The method of claim 14 , wherein the out-of-range parameter corresponds to the current conducted to the assigned station of the multi-station integrated circuit fabrication chamber.

17. The method of claim 14 , wherein the out-of-range parameter corresponds to a voltage applied to the assigned station of the multi-station integrated circuit fabrication chamber.

18. The method of claim 14 , wherein the magnitude of the output signal from the plurality of variable-gain preamplifiers is modified within 10.0 ns of sensing the out-of-range parameter.

19. The method of claim 13 , wherein generating the periodic signal comprises generating a signal having a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

Assignments (1)

Continuity (2)

References Cited (300)

Cited By (3)

US 12,394,601 US 12,424,412 US 12,626,895