IP Library › Granted Patent US 12,393,131
Granted Patent B2
US 12,393,131 · App. 17/655,127 · Granted Aug 19, 2025

Toner

Inventors: Takashi Kenmoku (Mishima, JP); Kenta Kamikura (Yokohama, JP); Yuzo Seino (Gotemba, JP)
Assignee: CANON KABUSHIKI KAISHA
G03G9/0823G03G9/0819G03G9/0825G03G9/0827G03G9/08711G03G9/08773G03G9/09708G03G15/0877G03G21/1814
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Quick Facts
Patent No.
US 12,393,131
App. No.
17/655,127
Granted
Aug 19, 2025
Kind
B2
Abstract

A toner containing a toner particle, wherein, when a dielectric loss tangent measured at a frequency of 10 kHz in an impedance measurement on the toner in an environment having a temperature of 50° C. and a relative humidity of 50% RH is designated by tan δ50° C.(1), and a dielectric loss tangent measured at a frequency of 10 kHz in an impedance measurement on the toner in an environment having a temperature of 30° C. and a relative humidity of 50% RH after the impedance measurement on the toner in an environment having a temperature of 50° C. and a relative humidity of 50% RH is designated by tan δ30° C.(2), tan δ50° C.(1) is from 0.015 to 0.050, the relationship tan δ50° C.(1)>tan δ30° C.(2) is satisfied, and tan δ30° C.(2)/tan δ50° C.(1) is from 0.25 to 0.66.

Claims (17)

1. A toner, comprising:

a toner particle comprising a binder resin, wherein

when measuring impedances in accordance with a series of impedance measurements including the steps of:

(i) preparing a first treated sample by leaving the toner under an environment of a temperature of 30° C. and relative humidity of 50% for 20 minutes;

(ii) measuring an impedance of the first treated sample under an environment of a temperature of 30° C. and relative humidity of 50% while varying a frequency from 100 kHz to 0.0215 Hz;

(iii) preparing a second treated sample by leaving the first treated sample for 20 minutes under an environment of a temperature of 50° C. and relative humidity of 50%;

(iv) measuring an impedance of the second treated sample under environment of a temperature of 50° C. and a relative humidity of 50% while varying a frequency from 100 kHz to 0.0215 Hz;

(v) preparing a third treated sample by leaving the second treated sample for 20 minutes under an environment of a temperature of 30° C. and relative humidity of 50%; and

(vi) measuring an impedance of the third treated sample under environment of a temperature of 30° C. and a relative humidity of 50% while varying a frequency from 100 kHz to 0.0215 Hz,

0.015≤tan δ50° C.(1)≤0.050 and 0.25≤tan δ30° C.(2)/tan δ50° C.(1)≤0.66

when tan δ50° C. (1) is a dielectric loss tangent at a frequency of 10 kHz calculated from the impedance measured in step (iv) and tan δ30° C. (2) is a dielectric loss tangent at a frequency of 10 kHz calculated from the impedance measured in step (vi).

2. The toner according to claim 1 , having Tg of 40 to 70° C., and Ta of 60 to 90° C., where Ta is a temperature at which G′ is 1.0×10 5 Pa in dynamic viscoelastic measurement of the toner and Tg is a glass transition temperature of the toner according to differential scanning calorimetric measurement.

3. The toner according to claim 2 , wherein Tg is 50 to 60° C., and Ta is 60 to 80° C.

4. The toner according to claim 1 , where 0.80≤tan δ30° C. (1)/tan δ30° C.(2)≤1.20 when tan δ30° C.(1) is a dielectric loss tangent at a frequency of 10 kHz calculated from the impedance measured in step (ii).

5. The toner according to claim 1 , having an average circularity of 0.950 to 0.990.

6. The toner according to claim 1 , wherein the toner comprises fine particles on a surface of the toner particle.

7. The toner according to claim 6 , wherein the fine particles comprise a metal element-containing compound.

Priority Claims (1)
JP 2019-137253 · Jul 25, 2019 · national
Continuity (2)
Continuation 16935254 · Jul 22, 2020
Related Publication 20220214629A1 · Jul 7, 2022
References Cited (80)
US 6777153B2 · Yano · 2004 [cited by applicant]
US 6808907B2 · Honma · 2004 [cited by applicant]
US 6908721B2 · Kenmoku · 2005 [cited by applicant]
US 6911520B2 · Fukui · 2005 [cited by applicant]
US 7045321B2 · Imamura · 2006 [cited by applicant]
US 7393912B2 · Mihara · 2008 [cited by applicant]
US 7399568B2 · Fukui · 2008 [cited by applicant]
US 7408017B2 · Imamura · 2008 [cited by applicant]
US 7452960B2 · Yano · 2008 [cited by applicant]
US 7510813B2 · Yano · 2009 [cited by applicant]
US 7638194B2 · Fukui · 2009 [cited by applicant]
US 7638590B2 · Fukui · 2009 [cited by applicant]
US 7682765B2 · Sugawa · 2010 [cited by applicant]
US 7795363B2 · Fukui · 2010 [cited by applicant]
US 7935771B2 · Fukui · 2011 [cited by applicant]
US 8067136B2 · Yano · 2011 [cited by applicant]
US 8093342B2 · Minami · 2012 [cited by applicant]
US 8110329B2 · Tominaga · 2012 [cited by applicant]
US 8178271B2 · Fukui · 2012 [cited by applicant]
US 8383312B2 · Fujimoto · 2013 [cited by applicant]
US 8574801B2 · Itabashi · 2013 [cited by applicant]
US 8609312B2 · Itabashi · 2013 [cited by applicant]
US 8828633B2 · Itabashi · 2014 [cited by applicant]
US 8828639B2 · Kamikura · 2014 [cited by applicant]
US 9029056B2 · Kenmoku · 2015 [cited by applicant]
US 9098002B2 · Kenmoku · 2015 [cited by applicant]
US 9098003B2 · Masumoto · 2015 [cited by applicant]
US 9423714B2 · Kenmoku · 2016 [cited by applicant]
US 9880478B2 · Shimano · 2018 [cited by applicant]
US 9933717B2 · Fujisaki · 2018 [cited by applicant]
US 9952523B2 · Shimano · 2018 [cited by applicant]
US 10114303B2 · Katsura · 2018 [cited by applicant]
US 10191400B2 · Fujisaki · 2019 [cited by applicant]
US 10303074B2 · Yamawaki · 2019 [cited by applicant]
US 10310396B2 · Kamikura · 2019 [cited by applicant]
US 10338487B2 · Kamikura · 2019 [cited by applicant]
US 10345726B2 · Nakamura · 2019 [cited by applicant]
US 10353308B2 · Hatakeyama · 2019 [cited by applicant]
US 10401750B2 · Nakamura · 2019 [cited by applicant]
US 10429757B2 · Yoshida · 2019 [cited by applicant]
US 10503090B2 · Tominaga · 2019 [cited by applicant]
US 10539893B2 · Tanaka · 2020 [cited by applicant]
US 10539899B2 · Nakamura · 2020 [cited by applicant]
US 10545422B2 · Yamawaki · 2020 [cited by applicant]
US 10551758B2 · Tanaka · 2020 [cited by applicant]
US 10635010B2 · Kamikura · 2020 [cited by applicant]
US 10732530B2 · Matsui · 2020 [cited by applicant]
US 10747136B2 · Kenmoku · 2020 [cited by applicant]
US 11169458B2 · Toyoizumi · 2021 [cited by applicant]
US 11175600B2 · Uchiyama · 2021 [cited by applicant]
US 11256187B2 · Ogaki · 2022 [cited by applicant]
US 20040058264A1 · Sugahara · 2004 [cited by applicant]
US 20050026065A1 · Onuma · 2005 [cited by examiner]
US 20050260514A1 · Mihara · 2005 [cited by applicant]
US 20060014095A1 · Sugahara · 2006 [cited by applicant]
US 20060121379A1 · Dojo · 2006 [cited by applicant]
US 20060194071A1 · Yano · 2006 [cited by applicant]
US 20070072102A1 · Dojo · 2007 [cited by applicant]
US 20100203443A1 · Okita · 2010 [cited by applicant]
US 20120172562A1 · Kenmoku · 2012 [cited by applicant]
US 20130065174A1 · Itabashi · 2013 [cited by applicant]
US 20170285502A1 · Fujisaki · 2017 [cited by examiner]
US 20170299972A1 · Tanaka · 2017 [cited by applicant]
US 20190271926A1 · Kamikura · 2019 [cited by applicant]
US 20190384197A1 · Aoki · 2019 [cited by applicant]
US 20190384200A1 · Kamikura · 2019 [cited by applicant]
US 20200356019A1 · Matsui · 2020 [cited by applicant]
US 20210026264A1 · Kamikura · 2021 [cited by applicant]
US 20210026265A1 · Kamikura · 2021 [cited by applicant]
CN 107305326A · 2017 [cited by applicant]
EP 2016466A1 · 2009 [cited by applicant]
EP 2767871A1 · 2014 [cited by applicant]
JP 20053726A · 2005 [cited by applicant]
JP 2005148409A · 2005 [cited by applicant]
JP 200953384A · 2009 [cited by applicant]
JP 2017181743A · 2017 [cited by applicant]
JP 2018124463A · 2018 [cited by applicant]
JP 201953248A · 2019 [cited by applicant]
WO 2005043251A1 · 2005 [cited by applicant]
Chemical Handbook, Fundamentals, Revised 5th edition, The Chemical Society of Japan (2004) (table on the back of the front cover). [cited by applicant]