Granted Patent B2

US 12,457,752 · App. 17/820,865 · Granted Oct 28, 2025

Inventors: Sasikanth Manipatruni (Portland, OR); Rajeev Kumar Dokania (Beaverton, OR); Ramamoorthy Ramesh (Moraga, CA)

Assignee: Kepler Computing Inc.

H10B53/30G11C11/221G11C11/2255G11C11/2257H01L21/02197H10B12/36H10B53/20H10D1/682H10D1/684H10D1/694H10D1/696H10D1/716H10D30/6211

Abstract

Claims (41)

1. An apparatus comprising:

a transistor having a source, a drain, and a gate;

a word-line coupled to the gate;

a bit-line coupled to one of the source or drain of the transistor;

a plate-line; and

a capacitive structure coupled to one of the source or drain of the transistor through one or more vias, and to the plate-line, wherein the capacitive structure comprises:

a first ferroelectric material having a first inverted u-shape;

a second ferroelectric material having a second inverted u-shape;

a first conductive oxide inside a first gap area of the first inverted u-shape, wherein the first conductive oxide abuts inner sidewalls of the first ferroelectric material, wherein the first conductive oxide fully fills the first gap area;

a second conductive oxide inside a second gap area of the second inverted u-shape, wherein the second conductive oxide abuts inner sidewalls of the second ferroelectric material, and wherein the second conductive oxide fully fills the second gap area;

a third conductive oxide between a first outer sidewall of the first ferroelectric material and a first outer sidewall of the second ferroelectric material;

an electrode that abuts the first ferroelectric material and the second ferroelectric material such that the electrode abuts bottom surfaces of the first inverted u-shape of the first ferroelectric material and of the second inverted u-shape of the second ferroelectric material, wherein the electrode couples to the source or the drain of the transistor;

a fourth conductive oxide that abuts a second outer sidewall of the first ferroelectric material;

a fifth conductive oxide that abuts a second outer sidewall of the second ferroelectric material; and

a sixth conductive oxide that abuts upper surfaces of the first inverted u-shape of the first ferroelectric material and of the second inverted u-shape of the second ferroelectric material, wherein the sixth conductive oxide abuts portions of the third conductive oxide, the fourth conductive oxide, and the fifth conductive oxide.

2. The apparatus of claim 1 , wherein the electrode comprises a refractive inter-metallic material.

3. The apparatus of claim 1 , wherein the electrode comprises metal.

4. The apparatus of claim 1 , wherein the electrode is a first electrode, wherein the apparatus comprises a second electrode, and wherein the second electrode abuts the sixth conductive oxide.

5. The apparatus of claim 4 , wherein the plate-line abuts the second electrode.

6. The apparatus of claim 1 , wherein the capacitive structure comprises an insulative material that abuts outer sidewall of the fourth conductive oxide and the outer sidewall of the fifth conductive oxide.

7. The apparatus of claim 6 , wherein the insulative material comprises an oxide of Al.

8. The apparatus of claim 7 , wherein the insulative material further comprises Ti.

9. A method comprising:

forming a transistor having a source, a drain, and a gate;

forming a word-line coupled to the gate;

forming a bit-line coupled to one of the source or drain of the transistor;

forming a plate-line; and

forming a capacitive structure coupled to one of the source or drain of the transistor through one or more vias, and to the plate-line, wherein forming the capacitive structure comprises:

forming a first ferroelectric material having a first inverted u-shape;

forming a second ferroelectric material having a second inverted u-shape;

forming a first conductive oxide inside a first gap area of the first inverted u-shape, wherein the first conductive oxide abuts inner sidewalls of the first ferroelectric material, and wherein the first conductive oxide fully fills the first gap area;

forming a second conductive oxide inside a second gap area of the second inverted u-shape, wherein the second conductive oxide abuts inner sidewalls of the second ferroelectric material, and wherein the second conductive oxide fully fills the second gap area;

forming a third conductive oxide between a first outer sidewall of the first ferroelectric material and a first outer sidewall of the second ferroelectric material;

forming an electrode that abuts the first ferroelectric material and the second ferroelectric material such that the electrode abuts bottom surfaces of the first inverted u-shape of the first ferroelectric material and of the second inverted u-shape of the second ferroelectric material, wherein the electrode is coupled to the source or the drain of the transistor;

forming a fourth conductive oxide that abuts a second outer sidewall of the first ferroelectric material;

forming a fifth conductive oxide that abuts a second outer sidewall of the second ferroelectric material; and

forming a sixth conductive oxide that abuts upper surfaces of the first inverted u-shape of the first ferroelectric material and of the second inverted u-shape of the second ferroelectric material, and wherein the sixth conductive oxide abuts portions of the third conductive oxide, the fourth conductive oxide, and the fifth conductive oxide.

10. The method of claim 9 , wherein forming the electrode comprises forming a refractive inter-metallic material.

11. The method of claim 9 , wherein the electrode is a first electrode, wherein the method comprises forming a second electrode, and wherein the second electrode abuts the sixth conductive oxide.

12. The method of claim 11 , wherein forming the plate-line comprises abutting the plate-line to the second electrode.

13. The method of claim 9 , wherein forming the capacitive structure comprises forming an insulative material that abuts outer sidewall of the fourth conductive oxide and the outer sidewall of the fifth conductive oxide.

Continuity (2)

References Cited (250)