Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium
There is provided a technique that includes: (a) supplying a silicon- and ligand-containing gas to a substrate having a surface on a first base and second base are exposed to adsorb silicon contained in the silicon- and ligand-containing gas on a surface of one of the first and second base; (b) supplying a fluorine-containing gas to the substrate after the silicon is absorbed, to cause the silicon to react with the fluorine-containing gas to modify the surface to be F-terminated; and (c) supplying a film-forming gas to the substrate after the surface is modified, to thereby form a film on a surface of the other of the first base and the second base, which is different from the one of the first base and the second base.
1 . A method of processing a substrate, comprising:
(a) supplying a silicon- and ligand-containing gas to the substrate having a first surface and a second surface to adsorb silicon contained in the silicon- and ligand-containing gas on the first surface;
(b) supplying a fluorine-containing gas to the substrate after the silicon is adsorbed on the first surface to cause the silicon adsorbed on the first surface to react with the fluorine-containing gas to modify the first surface to be F-terminated; and
(c) supplying a film-forming gas to the substrate after the first surface is modified to form a film on the second surface.
2 . The method of claim 1 , wherein (a) is performed under a condition in which the adsorption of the silicon on the first surface is self-limited.
3 . The method of claim 1 , wherein (a) is performed under a condition that the silicon- and ligand-containing gas does not undergo gas phase decomposition.
4 . The method of claim 1 , wherein (a) is performed under a condition that the silicon contained in the silicon- and ligand-containing gas is chemically adsorbed on the first surface.
5 . The method of claim 1 , wherein in (a), the silicon contained in the silicon- and ligand-containing gas is adsorbed on the first surface while suppressing adsorption of the silicon on the second surface.
6 . The method of claim 1 , wherein the first surface before supplying the silicon- and ligand-containing gas has a hydroxyl group-terminated surface, and the second surface before supplying the silicon- and ligand-containing gas has a non-hydroxyl group-terminated surface.
7 . The method of claim 1 , wherein ligand in the silicon- and ligand-containing gas is an amino group.
8 . The method of claim 1 , wherein the silicon- and ligand-containing gas is an aminosilane-based gas.
9 . The method of claim 1 , wherein the silicon- and ligand-containing gas is an aminosilane-based gas containing one amino group in one molecule.
10 . The method of claim 1 , wherein the silicon- and ligand-containing gas is a monoaminosilane gas.
11 . The method of claim 1 , wherein in (b), the first surface is modified without being etched.
12 . The method of claim 1 , wherein in (b), the first surface is modified while suppressing the second surface from being modified.
13 . The method of claim 1 , wherein in (c), the film is formed on the second surface without forming the film on the first surface.
14 . The method of claim 1 , wherein the first surface includes an oxygen-containing film, and the second surface includes an oxygen-free film.
15 . The method of claim 1 , wherein the first surface includes an oxide film, and the second surface includes a nitride film.
16 . The method of claim 1 , wherein the first surface includes a film containing silicon and oxygen, and the second surface includes a film containing silicon and nitrogen.
17 . The method of claim 1 , wherein at least one selected from the group of (a), (b) and (c) is performed in a non-plasma atmosphere.
18 . The method of claim 1 , wherein after performing (c), the F-termination is removed from the first surface.
19 . A method of manufacturing a semiconductor device, comprising the method of claim 1 .
20 . A substrate processing apparatus comprising:
a silicon- and ligand-containing gas supply system configured to supply a silicon- and ligand-containing gas to a substrate;
a fluorine-containing gas supply system configured to supply a fluorine-containing gas to the substrate;
a film-forming gas supply system configured to supply a film-forming gas to the substrate; and
a controller configured to be capable of controlling the silicon- and ligand-containing gas supply system, the fluorine-containing gas supply system, and the film-forming gas supply system to perform a process including:
(a) supplying the silicon- and ligand-containing gas to the substrate having a first surface and a second surface to adsorb silicon contained in the silicon- and ligand-containing gas on the first surface;
(b) supplying the fluorine-containing gas to the substrate after the silicon is adsorbed on the first surface to cause the silicon adsorbed on the first surface to react with the fluorine-containing gas to modify the first surface to be F-terminated; and
(c) supplying the film-forming gas to the substrate after the first surface is modified to form a film on the second surface.
21 . A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process comprising:
(a) supplying a silicon- and ligand-containing gas to a substrate having a first surface and a second surface to adsorb silicon contained in the silicon- and ligand-containing gas on the first surface;
(b) supplying a fluorine-containing gas to the substrate after the silicon is adsorbed on the first surface to cause the silicon adsorbed on the first surface to react with the fluorine-containing gas to modify the first surface to be F-terminated; and
(c) supplying a film-forming gas to the substrate after the first surface is modified to form a film on the second surface.