IP Library › Granted Patent US 12,506,462
Granted Patent B2
US 12,506,462 · App. 17/093,239 · Granted Dec 23, 2025

Transversely-excited film bulk acoustic resonator with multi-pitch interdigital transducer

Inventor: Bryant Garcia (Burlingame, CA)
Assignee: MURATA MANUFACTURING CO., LTD.
H03H9/132H03H9/02228H03H9/174H03H9/564H03H9/568
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Quick Facts
Patent No.
US 12,506,462
App. No.
17/093,239
Granted
Dec 23, 2025
Kind
B2
Abstract

There are disclosed acoustic resonators. An acoustic resonator includes a single-crystal piezoelectric plate having front and back surfaces, the back surface attached to a surface of a substrate except for a portion of the piezoelectric plate forming a diaphragm spanning a cavity in the substrate. A conductor pattern on the front surface includes a multi-pitch interdigital transducer (IDT) with interleaved fingers of the IDT disposed on the diaphragm.

Claims (50)

1 . A filter device comprising:

a plurality of bulk acoustic wave resonators that each comprise:

a piezoelectric layer having front and back surfaces, the back surface attached to a surface of a substrate either directly or via one or more intermediate layers, the piezoelectric layer having a portion that forms a diaphragm over a cavity of the bulk acoustic wave resonator; and

a conductor pattern on the piezoelectric layer and comprising an interdigital transducer (IDT) having interleaved fingers on the diaphragm,

wherein each IDT of all of the plurality of bulk acoustic wave resonators is a multi-pitch IDT, wherein pitch is a center-to-center spacing between any adjacent interleaved fingers extending from opposing busbars of the respective IDT,

wherein each of a first IDT of a first bulk acoustic wave resonator of the plurality of bulk acoustic wave resonators and a second IDT of a second bulk acoustic wave resonator of the plurality of bulk acoustic wave resonators is divided along a length of the respective IDT into at least three sections, with each of a first section, a second section, and a third section of the first IDT and the second IDT having multiple pairs of interleaved fingers, wherein the multiple pairs of interleaved fingers from each section each have a pitch that is different from respective pitches of the other sections of the at least three sections,

wherein the first, second and third sections of each of the first IDT and the second IDT have essentially an equal number of interleaved fingers as each other, and a mark of the interleaved fingers in each of the first, second and third sections is constant in each section and across each of the first, second and third sections,

wherein the respective pitch of the multiple pairs of interleaved fingers in each of the first, second and third sections is constant,

wherein the filter device is a ladder circuit with the first IDT forming a series resonator of the ladder circuit and the second IDT forming a shunt resonator of the ladder circuit, and

wherein a change in the pitch between the at least three sections of each of the plurality of bulk acoustic wave resonators has a smaller effect on a primary shear acoustic mode of all of the at least three sections of each bulk acoustic wave resonator in comparison to an effect that the change in pitch has on a spurious acoustic mode other than the primary shear acoustic mode of all of the at least three sections of each of the first IDT and the second IDT.

2 . The filter device of claim 1 , wherein the piezoelectric layer and IDTs of the plurality of bulk acoustic wave resonators are configured such that a radio frequency signal applied to each IDT excites the primary shear acoustic mode in the diaphragm, the primary shear acoustic mode being a bulk shear mode where acoustic energy propagates along a direction substantially orthogonal to the front and back surfaces of the piezoelectric layer that is lateral to a direction of an electric field generated by the IDT, and wherein atomic motions excited by the electric field are predominantly parallel to the front and back surfaces of the respective piezoelectric layer.

3 . The filter device of claim 1 , wherein a number of the at least three sections of the first IDT is different than a number of the at least three sections of the second IDT.

4 . The filter device of claim 1 , wherein, for at least one of the first IDT and the second IDT, a variance in the pitch of the at least three sections is between 7.5 times a thickness of the piezoelectric layer and 15 times a thickness of the piezoelectric layer.

5 . The filter device of claim 1 , wherein the respective IDTs of the plurality of bulk acoustic wave resonators are configured to have admittance characteristics such that the spurious acoustic mode would at least partially be canceled out if the first bulk acoustic wave resonator were placed in parallel with the second bulk acoustic wave resonator.

6 . The filter device of claim 1 , wherein the first, second and third sections of each of the first IDT and the second IDT have essentially an equal number of interleaved fingers as each other.

7 . The filter device of claim 1 , wherein a mark of each of the interleaved fingers is a width of each of the interleaved fingers within each of the first, second, and third sections of each of the first IDT and the second IDT, respectively, and wherein the mark of the interleaved fingers in each of the first, second and third sections of the second IDT is constant in each section and across each of the first, second and third sections.

8 . The filter device of claim 1 , wherein, for each of the first IDT and the second IDT, the second section is between the first and third sections along the length of the IDT, and a pitch of the first section is p(1+δ), a pitch of the second section is p, and a pitch of the third section is p(1−δ), and δ of the second IDT of the shunt resonator is greater than δ of the first IDT of the series resonator.

9 . The filter device of claim 1 , wherein the smaller effect is a smaller change in primary shear acoustic mode amplitude than a change in spurious acoustic mode amplitude.

10 . A filter device comprising:

a plurality of bulk acoustic wave resonators that each comprise:

a piezoelectric layer having front and back surfaces, the back surface attached to a surface of a substrate either directly or via one or more intermediate layers, the piezoelectric layer having a portion that forms a diaphragm over a cavity of the bulk acoustic wave resonator; and

a conductor pattern on the piezoelectric layer and comprising an interdigital transducer (IDT) having interleaved fingers on the diaphragm, wherein the interleaved fingers extend from opposing busbars,

wherein a first IDT of a first bulk acoustic wave resonator of the plurality of bulk acoustic wave resonators is a multi-pitch IDT that is divided along a length of the multi-pitch IDT into at least three sections, with each of a first section, a second section and a third section of the first IDT having at least one pair of interleaved fingers that each has a pitch that has a variation from respective pitches of the other sections, and wherein pitch is center-to-center spacing between the at least one pair of interleaved fingers, wherein the at least one pair interleaved fingers are adjacent interleaved fingers extending from opposing busbars of the first IDT,

wherein a second IDT of a second bulk acoustic wave resonator of the plurality of bulk acoustic wave resonators is a multi-pitch IDT that is divided along a length of the multi-pitch IDT into at least three sections, with each of a first section, a second section and a third section of the second IDT having at least one pair of interleaved fingers that each has a pitch that has a variation from respective pitches of the other sections, and wherein pitch is center-to-center spacing between the at least one pair of interleaved fingers, wherein the at least one pair interleaved fingers are adjacent interleaved fingers extending from opposing busbars of the second IDT,

wherein the filter device is a ladder circuit with the first IDT forming a series resonator of the ladder circuit and the second IDT forming a shunt resonator of the ladder circuit,

wherein the respective pitch in each of the first, second and third sections of each of the first IDT and the second IDT is constant, and

wherein the variation of the pitch between the at least three sections of each of the plurality of bulk acoustic wave resonators has a smaller effect on a primary shear acoustic mode of each respective bulk acoustic wave resonator in comparison to an effect that the variation of pitch has on a spurious acoustic mode in the filter device other than the primary shear acoustic mode.

11 . The filter device of claim 10 , wherein:

for each of the first IDT and the second IDT, the second section is between the first and third sections along the length of the IDT, and a pitch of the first section is p(1+δ), a pitch of the second section is p, and a pitch of the third section is p(1−δ), where p is a nominal pitch, and

δ of the second IDT forming the shunt resonator is greater than δ of the first IDT forming the series resonator.

12 . The filter device of claim 10 , wherein, for at least one of the first IDT and the second IDT, the variation in the pitch of the at least three sections is between 7.5 times a thickness of the piezoelectric layer and 15 times a thickness of the piezoelectric layer.

13 . The filter device of claim 10 , wherein:

the piezoelectric layer and the IDTs of the plurality of bulk acoustic wave resonators are configured such that a radio frequency signal applied to each IDT excites the primary shear acoustic mode in the diaphragm, the primary shear acoustic mode being a bulk shear mode where acoustic energy propagates along a direction substantially orthogonal to the front and back surfaces of the piezoelectric layer that is lateral to a direction of electric field generated by the IDT, and

for each of the plurality of bulk acoustic wave resonators, the primary shear acoustic mode is excited by the electric field such that atomic motions are predominantly parallel to the front and back surfaces of the piezoelectric layer to introduce shear deformation within the piezoelectric layer.

14 . The filter device of claim 13 , wherein the variation of the pitch of the second IDT is greater than the variation of the pitch of the first IDT.

15 . A filter device comprising:

a plurality of bulk acoustic wave resonators that each comprise:

a piezoelectric layer; and

a conductor pattern on the piezoelectric layer and comprising an interdigital transducer (IDT) having interleaved fingers,

wherein each of a first IDT of a first bulk acoustic wave resonator of the plurality of bulk acoustic wave resonators and a second IDT of a second bulk acoustic wave resonator of the plurality of bulk acoustic wave resonators is divided along a length of the respective IDT into at least three sections, with each of a first section, a second section, and third section of the first IDT and the second IDT having multiple interleaved fingers, wherein the multiple interleaved fingers from each section each have a center-to-center distance between adjacent interleaved fingers of the multiple interleaved fingers that is different from respective center-to-center distances between adjacent interleaved fingers of the multiple interleaved fingers of the other sections,

wherein the respective center-to-center distance between adjacent interleaved fingers of the multiple interleaved fingers in each of the first, second and third sections of each of the first IDT and second IDT is constant, and

wherein a change in the center-to-center distance between adjacent interleaved fingers between the at least three sections of each of the plurality of bulk acoustic wave resonators is configured to reduce an amplitude of a spurious acoustic mode of all of the at least three sections more than a reduction in amplitude of a primary shear acoustic mode of all of the at least three sections of each respective bulk acoustic wave resonator.

16 . The filter device of claim 15 , wherein:

the piezoelectric layer of each of the plurality of bulk acoustic wave resonators has front and back surfaces, the back surface attached to a surface of a substrate either directly or via one or more intermediate layers,

the piezoelectric layer of each of the plurality of bulk acoustic wave resonators has a portion that forms a diaphragm over a cavity of the bulk acoustic wave resonator, and

the interleaved fingers of the IDT of each of the plurality of bulk acoustic wave resonators is on the diaphragm.

17 . The filter device of claim 15 , wherein the first, second and third sections of each of the first IDT and the second IDT have essentially an equal number of interleaved fingers as each other.

18 . The filter device of claim 15 , wherein a mark of the interleaved fingers in each of the first, second and third sections is constant in each section and across each of the first, second and third sections.

19 . The filter device of claim 15 , wherein the piezoelectric layer and the IDTs of each of the plurality of bulk acoustic wave resonators are configured such that a radio frequency signal applied to each IDT excites the primary shear acoustic mode in the piezoelectric layer, the primary shear acoustic mode being a bulk shear mode where acoustic energy propagates along a direction substantially orthogonal to a surface of the piezoelectric layer that is lateral to a direction of electric field generated by the IDT.

20 . The filter device of claim 15 , wherein the spurious acoustic mode is between a resonance frequency and an antiresonance frequency of the primary shear acoustic mode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 18, 2022
From: RESONANT INC.
To: MURATA MANUFACTURING CO., LTD
Reel/Frame 061966/0748 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 17, 2020
From: GARCIA, BRYANT
To: RESONANT INC.
Reel/Frame 054396/0456 →
Continuity (2)
Provisional Application 62983400 · Feb 28, 2020
Related Publication 20210273629A1 · Sep 2, 2021
References Cited (131)
US 5631515A · Mineyoshi et al. · 1997 [cited by applicant]
US 6540827B1 · Evy et al. · 2003 [cited by applicant]
US 6570470B2 · Maehara et al. · 2003 [cited by applicant]
US 6946932B2 · Takagi · 2005 [cited by examiner]
US 7042132B2 · Bauer · 2006 [cited by examiner]
US 7463118B2 · Jacobsen · 2008 [cited by applicant]
US 7535152B2 · Ogami et al. · 2009 [cited by applicant]
US 7679474B2 · Igaki · 2010 [cited by examiner]
US 7684109B2 · Godshalk et al. · 2010 [cited by applicant]
US 7868519B2 · Umeda · 2011 [cited by applicant]
US 7965015B2 · Tai · 2011 [cited by examiner]
US 8278802B1 · Lee et al. · 2012 [cited by applicant]
US 8829766B2 · Milyutin et al. · 2014 [cited by applicant]
US 8932686B2 · Hayakawa et al. · 2015 [cited by applicant]
US 9219466B2 · Meltaus et al. · 2015 [cited by applicant]
US 9240768B2 · Nishihara et al. · 2016 [cited by applicant]
US 9276557B1 · Nordquist et al. · 2016 [cited by applicant]
US 9369105B1 · Li · 2016 [cited by applicant]
US 9425765B2 · Rinaldi · 2016 [cited by applicant]
US 9525398B1 · Olsson · 2016 [cited by applicant]
US 9564873B2 · Kadota · 2017 [cited by examiner]
US 9780759B2 · Kimura et al. · 2017 [cited by applicant]
US 10389391B2 · Ito · 2019 [cited by examiner]
US 10491192B1 · Piesski · 2019 [cited by applicant]
US 10601392B2 · Plesski et al. · 2020 [cited by applicant]
US 10637438B2 · Garcia et al. · 2020 [cited by applicant]
US 10756697B2 · Plesski et al. · 2020 [cited by applicant]
US 10790802B2 · Yantchev et al. · 2020 [cited by applicant]
US 10797675B2 · Plesski · 2020 [cited by applicant]
US 10819319B1 · Hyde · 2020 [cited by applicant]
US 10868510B2 · Yantchev · 2020 [cited by applicant]
US 10958247B2 · Kanazawa · 2021 [cited by examiner]
US 11206009B2 · Yantchev · 2021 [cited by examiner]
US 11323089B2 · Turner · 2022 [cited by applicant]
US 11418167B2 · Garcia · 2022 [cited by examiner]
US 11437976B2 · Kaneda · 2022 [cited by examiner]
US 12088281B2 · Dyer · 2024 [cited by examiner]
US 20020158714A1 · Kaitila et al. · 2002 [cited by applicant]
US 20040041496A1 · Imai et al. · 2004 [cited by applicant]
US 20040207033A1 · Koshido · 2004 [cited by applicant]
US 20040207485A1 · Kawachi et al. · 2004 [cited by applicant]
US 20040261250A1 · Kadota et al. · 2004 [cited by applicant]
US 20050099091A1 · Mishima · 2005 [cited by applicant]
US 20060131731A1 · Sato · 2006 [cited by applicant]
US 20060152107A1 · Tanaka · 2006 [cited by applicant]
US 20070188047A1 · Tanaka · 2007 [cited by applicant]
US 20090108960A1 · Igaki · 2009 [cited by examiner]
US 20090315640A1 · Umeda · 2009 [cited by applicant]
US 20100064492A1 · Tanaka · 2010 [cited by applicant]
US 20100223999A1 · Onoe · 2010 [cited by applicant]
US 20100301703A1 · Chen et al. · 2010 [cited by applicant]
US 20110109196A1 · Goto · 2011 [cited by applicant]
US 20110199163A1 · Yamanaka · 2011 [cited by applicant]
US 20130057360A1 · Meltaus et al. · 2013 [cited by applicant]
US 20130234805A1 · Takahashi · 2013 [cited by applicant]
US 20140009247A1 · Moriya · 2014 [cited by applicant]
US 20140145556A1 · Kadota · 2014 [cited by applicant]
US 20140151151A1 · Reinhardt · 2014 [cited by applicant]
US 20140152145A1 · Kando · 2014 [cited by applicant]
US 20150319537A1 · Perois et al. · 2015 [cited by applicant]
US 20150333730A1 · Meltaus · 2015 [cited by applicant]
US 20160049920A1 · Kishino · 2016 [cited by applicant]
US 20160149554A1 · Nakagawa · 2016 [cited by applicant]
US 20160182009A1 · Bhattacharjee · 2016 [cited by applicant]
US 20170063332A1 · Gilbert et al. · 2017 [cited by applicant]
US 20170104470A1 · Koelle et al. · 2017 [cited by applicant]
US 20170179928A1 · Raihn et al. · 2017 [cited by applicant]
US 20170187352A1 · Omura · 2017 [cited by applicant]
US 20170214387A1 · Burak et al. · 2017 [cited by applicant]
US 20170222622A1 · Solal et al. · 2017 [cited by applicant]
US 20170264266A1 · Kishimoto · 2017 [cited by applicant]
US 20170290160A1 · Takano et al. · 2017 [cited by applicant]
US 20180123016A1 · Gong et al. · 2018 [cited by applicant]
US 20180316333A1 · Nakamura et al. · 2018 [cited by applicant]
US 20190068155A1 · Kimura · 2019 [cited by applicant]
US 20190068164A1 · Houlden et al. · 2019 [cited by applicant]
US 20190131953A1 · Gong · 2019 [cited by applicant]
US 20190181825A1 · Schmalzl et al. · 2019 [cited by applicant]
US 20190207583A1 · Miura et al. · 2019 [cited by applicant]
US 20190273480A1 · Lin · 2019 [cited by applicant]
US 20190305746A1 · Ota · 2019 [cited by applicant]
US 20190386633A1 · Plesski · 2019 [cited by applicant]
US 20190386635A1 · Plesseki · 2019 [cited by applicant]
US 20200007110A1 · Konaka et al. · 2020 [cited by applicant]
US 20200244247A1 · Maeda · 2020 [cited by applicant]
US 20200304091A1 · Yantchev · 2020 [cited by applicant]
US 20220103160A1 · Jachowski et al. · 2022 [cited by applicant]
US 20220200567A1 · Garcia · 2022 [cited by applicant]
CN 106788318A · 2017 [cited by applicant]
CN 110417373A · 2019 [cited by applicant]
CN 210431367U · 2020 [cited by applicant]
JP H10209804A · 1998 [cited by applicant]
JP 2001244785A · 2001 [cited by applicant]
JP 2003078389A · 2003 [cited by applicant]
JP 2004096677A · 2004 [cited by applicant]
JP 2004129222A · 2004 [cited by applicant]
JP 2004304622A · 2004 [cited by applicant]
JP 2006173557A · 2006 [cited by applicant]
JP 2007251910A · 2007 [cited by applicant]
JP 2010103803A · 2010 [cited by applicant]
JP 2010233210A · 2010 [cited by applicant]
JP 2013528996A · 2013 [cited by applicant]
JP 2015054986A · 2015 [cited by applicant]
JP 2016001923A · 2016 [cited by applicant]
JP 2018166259A · 2018 [cited by applicant]
JP 2018207144A · 2018 [cited by applicant]
JP 2020113939A · 2020 [cited by applicant]
WO 2010047114A1 · 2010 [cited by applicant]
WO 2015098694A1 · 2015 [cited by applicant]
WO 2016017104 · 2016 [cited by applicant]
WO 2016052129A1 · 2016 [cited by applicant]
WO 2016147687A1 · 2016 [cited by applicant]
WO 2018003273A1 · 2018 [cited by applicant]
WO 2018163860A1 · 2018 [cited by applicant]
WO 2019111664A1 · 2019 [cited by applicant]
WO 2020092414A2 · 2020 [cited by applicant]
T. Takai, H. Iwamoto, et al., “I.H.P.Saw Technology and its Application to Microacoustic Components (Invited).” 2017 IEEE International Ultrasonics Symposium, Sep. 6-9, 2017. pp. 1-8. [cited by applicant]
R. Olsson III, K. Hattar et al. “A high electromechanical coupling coefficient SH0 Lamb wave lithiumniobate micromechanical resonator and a method for fabrication” Sensors and Actuators A: Physical, vol. 209, Mar. 1, 20… [cited by applicant]
M. Kadota, S. Tanaka, “Wideband acoustic wave resonators composed of hetero acoustic layer structure,” Japanese Journal of Applied Physics, vol. 57, No. 7S1. Published Jun. 5, 2018. 5 pages. [cited by applicant]
Y. Yang, R. Lu et al. “Towards Ka Band Acoustics: Lithium Niobat Asymmetrical Mode Piezoelectric MEMS Resonators”, Department of Electrical and Computer Engineering University of Illinois at Urbana-Champaign, May 2018. … [cited by applicant]
Y. Yang, A. Gao et al. “5 GHZ Lithium Niobate MEMS Resonators With High FOM of 153”, 2017 IEEE 30th International Conference in Micro Electro Mechanical Systems (MEMS). Jan. 22-26, 2017. pp. 942-945. [cited by applicant]
USPTO/ISA, International Search Report and Written Opinion for PCT Application No. PCT/US2019/036433 dated Aug. 29, 2019. [cited by applicant]
USPTO/ISA, International Search Report and Written Opinion for PCT Application No. PCT/US2019/058632 dated Jan. 17, 2020. [cited by applicant]
G. Manohar, “Investigation of Various Surface Acoustic Wave Design Configurations for Improved Sensitivity.” Doctoral dissertation, University of South Florida, USA, Jan. 2012, 7 pages. [cited by applicant]
Ekeom, D. & Dubus, Bertrand & Volatier, A.. (2006). Solidly mounted resonator (SMR) FEM-BEM simulation. 1474-1477. 10.1109/ULTSYM.2006.371. [cited by applicant]
Mizutaui, K. and Toda, K., “Analysis of lamb wave propagation characteristics in rotated Y-cut X-propagation LiNbO3 plates.” Electron. Comm. Jpn. Pt. I, 69, No. 4 (1986): 47-55. doi:10.1002/ecja.4410690406. [cited by applicant]
Naumenko et al., “Optimal orientations of Lithium Niobate for resonator SAW filters”, 2003 IEEE Ultrasonics Symposium—pp. 2110-2113. (Year: 2003). [cited by applicant]
USPTO/ISA, International Search Report and Written Opinion for PCT Application No. PCT/US2020/45654 dated Oct. 29, 2020. [cited by applicant]
Gorisse et al., “Lateral Field Excitation of membrane-based Aluminum Nitride resonators,” Joint Conference of the IEEE International Frequency Control and the European Frequency and Time Forum (FCS), May 2011, 5 pages. [cited by applicant]
Pang et al., “Self-Aligned Lateral Field Excitation Film Acoustic Resonator with Very Large Electromechanical Coupling,” IEEE International Ultrasonics, Ferroelectrics, and Frequency Control Joint 50th Anniversary Confe… [cited by applicant]
Yandrapalli et al., “Toward Band n78 Shear Bulk Acoustic Resonators Using Crystalline Y-Cut Lithium Niobate Films With Spurious Suppression,” Journal of Microelectromechanical System, Aug. 2023, vol. 32, No. 4, pp. 327-… [cited by applicant]