IP Library › Granted Patent US 12,591,179
Granted Patent B2
US 12,591,179 · App. 18/441,772 · Granted Mar 31, 2026

Metrology apparatus

Inventors: Nitesh Pandey (Eindhoven, NL); Arie Jeffrey Den Boef (Waalre, NL); Duygu Akbulut (Eindhoven, NL); Marinus Johannes Maria Van Dam (Venlo, NL); Hans Butler (Best, NL); Hugo Augustinus Joseph Cramer (Eindhoven, NL); Engelbertus Antonius Fransiscus Van Der Pasch (Oirschot, NL); Ferry Zijp (Nuenen, NL); Jeroen Arnoldus Leonardus Johannes Raaymakers (Oirschot, NL); Marinus Petrus Reijnders (Eindhoven, NL)
Assignee: ASML Netherlands B.V.
G03F7/70625G01N21/956G03F7/7015G03F7/70633
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Quick Facts
Patent No.
US 12,591,179
App. No.
18/441,772
Granted
Mar 31, 2026
Kind
B2
Abstract

A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

Claims (40)

1 . A metrology tool for determining a parameter of interest of one or more structures fabricated on a substrate, the metrology tool comprising:

a broadband radiation source configured to generate source illumination having multiple wavelengths;

an illumination optical system configured to illuminate the one or more structures, the illumination optical system comprising:

tunable filters configured to select and filter one or more wavelengths of the multiple wavelengths to generate filtered outputs; and

optical paths configured to transmit the filtered outputs to the one or more structures; and

a detection optical system comprising detection optical sensors, wherein each of the detection optical sensors is configured to detect scattered illumination from the one or more structures provided by an associated one of the tunable filters.

2 . The metrology tool of claim 1 , wherein:

the tunable filters are arranged in series; and

at least one of the tunable filters are configured to separate a wavelength from the source illumination and to transmit remaining wavelengths of the source illumination to a next filter in the series.

3 . The metrology tool of claim 1 , further comprising a controller configured to control wavelength selection for each one of the tunable filters.

4 . The metrology tool of claim 3 , wherein the controller is configured to periodically adjust the wavelength selection to cycle through different wavelengths such that each of the optical detection sensors receives scattered illumination at each of the different wavelengths.

5 . The metrology tool of claim 4 , further comprising a signal generator, wherein periodic cycling of the wavelength selection is performed using signals from the signal generator.

6 . The metrology tool of claim 1 , wherein the optical paths each comprise an optical fibre configured to transmit the one or more wavelengths of radiation from a respective one of the tunable filters to the one or more structures.

7 . The metrology tool of claim 1 , the tunable filters are acousto-optic-tunable filters.

8 . The metrology tool of claim 1 , further comprising an array of detection optical systems, each of the detection optical systems comprising detection optical sensors and a lens configured to capture scattered illumination from a structure at a position corresponding to each detection optical system and to transmit the scattered illumination towards the detection optical sensors.

9 . A metrology tool comprising:

a broadband illumination source;

acousto-optic-tunable filters arranged in series and configured to select one or more wavelengths from the broadband illumination source; and

detection optical sensors, each of the detection optical sensors configured to detect illumination associated with a respective one of the acousto-optic-tunable filters.

10 . The metrology tool of claim 9 , wherein at least one of the acousto-optic-tunable filters is configured to separate a wavelength from the broadband illumination source and to transmit remaining wavelengths of the source illumination to a next acousto-optic-tunable filter in the series.

11 . The metrology tool of claim 9 , further comprising a controller configured to control the acousto-optic-tunable filters to control wavelength selection performed via the acousto-optic-tunable filters.

12 . The metrology tool of claim 11 , wherein the controller is configured to periodically adjust the wavelength selection to cycle through different wavelengths such that each of the optical detection sensors receives scattered illumination at each of the different wavelengths.

13 . The metrology tool of claim 12 , further comprising a signal generator, wherein periodic cycling of the wavelength selection is performed according to periodic signals from the signal generator.

14 . The metrology tool of claim 9 , further comprising optical fibres configured to direct filtered illumination from the acousto-optic-tunable filters to a target of inspection.

15 . A method for determining a parameter of interest of one or more structures fabricated on a substrate, the method comprising:

generating source illumination having multiple wavelengths;

generating filtered outputs of illumination by selecting and filtering one or more wavelengths of the multiple wavelengths using tunable filters;

transmitting the filtered outputs to the one or more structures along optical paths;

detecting scattered illumination from the one or more targets using detection optical sensors.

16 . The method of claim 15 , further comprising:

separating a wavelength from the source using the tunable filters arranged in series; and

transmitting remaining wavelengths of the source illumination to a next filter in the series.

17 . The method of claim 15 , wherein:

generating the filtered outputs comprises selecting one or more wavelengths from the multiple wavelengths of the source illumination using the tunable filters.

18 . The method of claim 17 , wherein:

the selecting comprises periodically adjusting wavelength selection to cycle through different wavelengths; and

receiving, at each of the optical detection sensors, scattered illumination at each of the different wavelengths.

19 . The method of claim 18 , wherein:

the tunable filters are acousto-optic-tunable filters; and

the selecting further comprises using acoustic signals to adjust the acousto-optic-tunable filters.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 12, 2025
From: PANDEY, NITESH; DEN BOEF, ARIE JEFFREY; AKBULUT, DUYGU; VAN DAM, MARINUS JOHANNES MARIA; BUTLER, HANS; CRAMER, HUGO AUGUSTINUS JOSEPH; VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS; ZIJP, FERRY; RAAYMAKERS, JEROEN ARNOLDUS LEONARDUS JOHANNES; REIJNDERS, MARINUS PETRUS
To: ASML NETHERLANDS B.V.
Reel/Frame 071991/0751 →
Priority Claims (3)
EP 18177431 · Jun 13, 2018 · regional
EP 18189926 · Aug 21, 2018 · regional
EP 18207812 · Nov 22, 2018 · regional
Continuity (3)
Continuation 17562446 · Dec 27, 2021
Continuation 16431833 · Jun 5, 2019
Related Publication 20240184218A1 · Jun 6, 2024
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