IP Library › Granted Patent US 12,616,045
Granted Patent B2
US 12,616,045 · App. 17/814,828 · Granted Apr 28, 2026

Semiconductor package and method of fabricating the same

Inventors: Jong Ho Park (Cheonan-si, KR); Gyu Ho Kang (Cheonan-si, KR); Seong-Hoon Bae (Cheonan-si, KR); Jeong Gi Jin (Seoul, KR); Ju-Il Choi (Seongnam-si, KR); Atsushi Fujisaki (Seongnam-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01L23/13H01L21/563H01L21/565H01L23/3128H01L23/49816H01L23/49822H01L23/49833H01L23/49838H01L25/162H01L25/165H01L21/4857H01L21/486H01L24/16H01L2224/16227H01L2924/1431H01L2924/1436H01L2924/1438H01L2924/19041H01L2924/3511
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Quick Facts
Patent No.
US 12,616,045
App. No.
17/814,828
Granted
Apr 28, 2026
Kind
B2
Abstract

A semiconductor package includes a wiring structure that includes a first insulating layer and a first conductive pattern inside the first insulating layer, a first semiconductor chip disposed on the wiring structure, an interposer that includes a second insulating layer, a second conductive pattern inside the second insulating layer, and a recess that includes a first sidewall formed on a first surface of the interposer that faces the first semiconductor chip and a first bottom surface connected with the first sidewall, where the recess exposes at least a portion of the second insulating layer, a first element bonded to the interposer and that faces the first semiconductor chip inside the recess, and a mold layer that covers the first semiconductor chip and the first element.

Claims (49)

1 . A semiconductor package, comprising:

a wiring structure that includes a first insulating layer and a first conductive pattern inside the first insulating layer;

a first semiconductor chip disposed on the wiring structure;

an interposer disposed on the first semiconductor chip, wherein the interposer includes a second insulating layer, a second conductive pattern inside the second insulating layer, and a recess that includes a first sidewall formed on a first surface of the interposer that faces the first semiconductor chip and a first bottom surface connected with the first sidewall, wherein the recess exposes at least a portion of the second insulating layer;

a first element bonded to the interposer and that faces the first semiconductor chip inside the recess; and

a mold layer that covers the first semiconductor chip and the first element,

wherein the interposer further includes a protrusion on the first surface that protrudes toward the first semiconductor chip.

2 . The semiconductor package of claim 1 , wherein the mold layer is filled in the recess and integrally covers a side and a lower surface of the first semiconductor chip and a side of the first element.

3 . The semiconductor package of claim 1 , wherein the first surface includes a connection surface that connects the recess with the protrusion.

4 . The semiconductor package of claim 3 , wherein a shortest distance between an edge of the first element and an edge that connects the first sidewall of the recess with the first bottom surface is a first distance,

a shortest distance between a side of the first element and the connection surface is a second distance,

a shortest distance from the protrusion to an upper surface of the first semiconductor chip is a third distance, and

the third distance is equal to or less than the first distance and equal to or less than the second distance.

5 . The semiconductor package of claim 4 , wherein the second distance is greater than the first distance.

6 . The semiconductor package of claim 4 , wherein the third distance is less than or equal to a distance from the first element to the upper surface of the first semiconductor chip.

7 . The semiconductor package of claim 1 , wherein a thickness of the protrusion is less than that of the first element.

8 . The semiconductor package of claim 1 , wherein a thickness of the protrusion decreases as the protrusion becomes closer to the recess.

9 . The semiconductor package of claim 1 , wherein the protrusion includes a plurality of protrusions, and the mold layer fills a space between the plurality of protrusions.

10 . The semiconductor package of claim 1 , wherein the interposer further includes a second surface that faces the first surface, and a width of the recess decreases as the recess becomes closer to the second surface.

11 . The semiconductor package of claim 1 , wherein the interposer includes a substrate and a passivation layer disposed on both sides of the substrate, and the recess includes a first portion that penetrates through the passivation layer and a second portion in the substrate.

12 . The semiconductor package of claim 1 , wherein the mold layer includes a filler, and a distance from a bottom surface of the recess to the first element is ½ times or more than an average diameter of the filler.

13 . A semiconductor package, comprising:

a wiring structure that includes a first insulating layer and a first conductive pattern inside the first insulating layer;

a first semiconductor chip disposed on the wiring structure;

an interposer disposed on the first semiconductor chip, wherein the interposer includes a second insulating layer, a second conductive pattern inside the second insulating layer, and a multi-stage recess formed on a first surface of the interposer, wherein the multi-stage recess includes a first stage recess that has a first width, and a second stage recess that is connected to the first stage recess and that has a second width greater than the first width;

a first element bonded to the interposer inside the multi-stage recess and that faces the first semiconductor chip; and

a first bump connected to the first element positioned in the first stage recess,

wherein a shortest distance from an upper surface of the second stage recess to an upper surface of the first semiconductor chip is less than or equal to a distance from the first element to the upper surface of the first semiconductor chip, and

wherein the interposer further includes a protrusion that protrudes from the first surface toward the first semiconductor chip.

14 . The semiconductor package of claim 13 , wherein a slope of a second sidewall of the second stage recess is greater than that of a first sidewall of the first stage recess.

15 . The semiconductor package of claim 13 , wherein the first surface includes a connection surface that connects the first stage recess with the second stage recess,

a shortest distance between an edge of the first element and an edge that connects a first sidewall of the first stage recess with a first bottom surface of the first stage recess is a first distance,

a shortest distance between a side of the first element and the connection surface is a second distance,

the shortest distance from the second stage recess to the upper surface of the first semiconductor chip is a third distance, and

the third distance is equal to or less than the first distance and is equal to or less than the second distance.

16 . The semiconductor package of claim 13 , wherein the interposer further includes a second surface that faces the first surface, and

a width of the first stage recess decreases as the first stage recess becomes closer to the second surface.

17 . The semiconductor package of claim 13 , further comprising a mold layer that fills in the first stage recess and covers the first semiconductor chip and the first element.

18 . The semiconductor package of claim 13 , wherein an upper surface of the first element is positioned in the second stage recess.

19 . A semiconductor package, comprising:

a wiring structure that includes a first insulating layer and a first conductive pattern inside the first insulating layer;

a first semiconductor chip disposed on the wiring structure;

an interposer disposed on the first semiconductor chip, wherein the interposer includes a second insulating layer, a second conductive pattern inside the second insulating layer, and a first recess formed on a first surface of the interposer that faces the first semiconductor chip;

a first element disposed inside the first recess and bonded to the interposer, wherein the first element faces the first semiconductor chip; and

a mold layer that fills the first recess and integrally covers a side of the first element,

wherein the interposer further includes a second recess formed along a surface of a protrusion that protrudes from the first surface of the interposer.

20 . The semiconductor package of claim 19 , wherein

the second recess has a sidewall that protrudes from the first surface, and a bottom surface connected with the sidewall, and

the mold layer is filled between the sidewall and the bottom surface.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE CORRECT SPELLING OF THE FIRST INVENTOR'S NAME TO READ JONG HO PARK PREVIOUSLY RECORDED AT REEL: 060615 FRAME: 0059. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Nov 23, 2022
From: PARK, JONG HO; KANG, GYU HO; BAE, SEONG-HOON; JIN, JEONG GI; CHOI, JU-IL; FUJISAKI, ATSUSHI
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 062037/0874 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2022
From: PARK, JUNG HO; KANG, GYU HO; BAE, SEONG-HOON; JIN, JEONG GI; CHOI, JU-IL; FUJISAKI, ATSUSHI
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 060615/0059 →
Priority Claims (1)
KR 10-2021-0097554 · Jul 26, 2021 · national
Continuity (1)
Related Publication 20230026211A1 · Jan 26, 2023
References Cited (23)
US 8409917B2 · Yoon et al. · 2013 [cited by applicant]
US 9379090B1 · Syed et al. · 2016 [cited by applicant]
US 9478500B2 · Chen et al. · 2016 [cited by applicant]
US 10396037B2 · Hwang et al. · 2019 [cited by applicant]
US 10510731B2 · Yu et al. · 2019 [cited by applicant]
US 10607971B2 · Im et al. · 2020 [cited by applicant]
US 20120104623A1 · Pagaila · 2012 [cited by examiner]
US 20120322202A1 · Nishimura et al. · 2012 [cited by applicant]
US 20160056087A1 · Wu · 2016 [cited by examiner]
US 20170141087A1 · Vincent et al. · 2017 [cited by applicant]
US 20170170154A1 · Ryu · 2017 [cited by examiner]
US 20200219860A1 · Im et al. · 2020 [cited by applicant]
US 20210074600A1 · Jeng et al. · 2021 [cited by applicant]
US 20220304147A1 · Kim · 2022 [cited by examiner]
JP 2002158326 · 2002 [cited by applicant]
KR 1020090077580 · 2009 [cited by applicant]
KR 1020090129318A · 2009 [cited by applicant]
KR 101364020B1 · 2014 [cited by applicant]
KR 101902137B1 · 2018 [cited by applicant]
KR 1020190042975A · 2019 [cited by applicant]
WO WO2004073064A1 · 2004 [cited by examiner]
Liu et al., “Underfill For Ultra-Low Bumped (10μ) 3D Package”. International Symposium on Microelectronics. 2010. 000786-000791. 10.4071/isom-2010-THA2-Paper1 (Year: 2010). [cited by examiner]
Office Action dated Jul. 9, 2025 issued in Korean Patent Application No. 10-2021-0097554. [cited by applicant]