IP Library Granted Patent US 8,936,969
Granted Patent B2
US 8,936,969 · App. 13/426,416 · Granted Jan 20, 2015

Semiconductor device and method of singulating semiconductor wafer along modified region within non-active region formed by irradiating energy through mounting tape

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Quick Facts
Patent No.
US 8,936,969
App. No.
13/426,416
Granted
Jan 20, 2015
Kind
B2
Abstract

A semiconductor device has a semiconductor wafer with a plurality of semiconductor die separated by a non-active region. The semiconductor die can be circular or polygonal with three or more sides. A plurality of bumps is formed over the semiconductor die. A portion of semiconductor wafer is removed to thin the semiconductor wafer. A wafer ring is mounted to mounting tape. The semiconductor wafer is mounted to the mounting tape within the wafer ring. The mounting tape includes translucent or transparent material. A penetrable layer is applied over the bumps formed over the semiconductor wafer. An irradiated energy from a laser is applied through the mounting tape to the non-active region to form a modified region within the non-active region. The semiconductor wafer is singulated along the modified region to separate the semiconductor die.

Claims (67)

1. A method of making a semiconductor device, comprising:

providing a semiconductor wafer having a plurality of semiconductor die separated by a non-active region;

forming a plurality of bumps over the semiconductor die;

providing a mounting tape;

disposing the semiconductor wafer over the mounting tape;

disposing a penetrable layer over the bumps formed over the semiconductor wafer;

applying irradiated energy to the non-active region through the mounting tape for form a modified region within the non-active region; and

singulating the semiconductor wafer along the modified region to separate the semiconductor die.

2. The method of claim 1 , further including:

providing a wafer ring;

mounting the wafer ring to the mounting tape; and

mounting the semiconductor wafer to the mounting tape within the wafer ring.

3. The method of claim 1 , further including:

providing a laser; and

applying the irradiated energy from the laser through the mounting tape to form the modified region within the non-active region.

4. The method of claim 1 , wherein the mounting tape includes translucent or transparent material.

5. The method of claim 1 , wherein the semiconductor die have a polygon shape with three or more sides.

6. The method of claim 1 , further including removing a portion of semiconductor wafer to thin the semiconductor wafer.

7. A method of making a semiconductor device, comprising:

providing a semiconductor wafer;

providing a mounting tape;

disposing the semiconductor wafer over the mounting tape;

providing a laser;

forming a modified region within a non-active region of the semiconductor wafer by applying irradiated energy from the laser through the mounting tape; and

singulating the semiconductor wafer along the modified region.

8. The method of claim 7 , further including:

providing a wafer ring;

mounting the wafer ring to the mounting tape; and

mounting the semiconductor wafer to the mounting tape within the wafer ring.

9. The method of claim 7 , further including applying a force to the mounting tape to expand the mounting tape and exert stress along the modified region to singulate the semiconductor wafer.

10. The method of claim 7 , wherein the mounting tape includes translucent or transparent material.

11. The method of claim 7 , further including forming the modified region as a plurality of vertically stacked modified regions.

12. The method of claim 7 , further including:

forming a plurality of bumps over the semiconductor wafer; and

applying a penetrable layer over the bumps formed over the semiconductor wafer.

13. The method of claim 12 , further including:

singulating the semiconductor wafer along the modified region to separate the semiconductor wafer into a plurality of semiconductor die; and

forming an encapsulant over the semiconductor die and bumps.

14. A method of making a semiconductor device, comprising:

providing a semiconductor wafer;

providing a mounting tape;

disposing the semiconductor wafer over the mounting tape;

applying energy to a non-active region of the semiconductor wafer through the mounting tape to form a modified region within the non-active region; and

singulating the semiconductor wafer along the modified region.

15. The method of claim 14 , further including:

providing a wafer ring;

mounting the wafer ring to the mounting tape; and

mounting the semiconductor wafer to the mounting tape within the wafer ring.

16. The method of claim 14 , further including:

providing a laser; and

applying irradiated energy from the laser through the mounting tape to form the modified region within the non-active region.

17. The method of claim 14 , wherein the mounting tape includes translucent or transparent material.

18. The method of claim 14 , further including applying a force to the mounting tape to expand the mounting tape and exert stress along the modified region to singulate the semiconductor wafer.

19. The method of claim 14 , further including:

forming a plurality of bumps over the semiconductor wafer; and

applying a penetrable layer over the bumps formed over the semiconductor wafer.

20. The method of claim 19 , further including:

singulating the semiconductor wafer along the modified region to separate the semiconductor wafer into a plurality of semiconductor die; and

forming an encapsulant over the semiconductor die and bumps.

21. A method of making a semiconductor device, comprising:

forming a modified region of a semiconductor wafer by application of energy through a mounting tape disposed over the semiconductor wafer; and

singulating the semiconductor wafer along the modified region.

22. The method of claim 21 , wherein singulating the semiconductor wafer further includes applying a force to the mounting tape to expand the mounting tape and exert stress along the modified region.

23. The method of claim 21 , further including:

forming a bump over the semiconductor wafer; and

applying a penetrable layer over the bump.

24. The method of claim 21 , further including forming the modified region as a plurality of vertically stacked modified regions.

Assignments (9)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 3, 2025
From: STATS CHIPPAC PTE. LTD.
To: STATS CHIPPAC MANAGEMENT PTE. LTD.
Reel/Frame 072788/0917 →
CORRECTIVE ASSIGNMENT TO CORRECT THE CORRECT THE SPELLING OF ASSIGNEE'S NAME FROM "STATS CHIPPAC PTE. LTE. " TO STATS CHIPPAC PTE. LTD." PREVIOUSLY RECORDED AT REEL: 038378 FRAME: 0391. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 5, 2023
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTD.
Reel/Frame 064809/0877 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SPELLING OF THE ASSIGNEE'S NAME ON THE COVER SHEET PREVIOUSLY RECORDED AT REEL: 038378 FRAME: 0161. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 5, 2023
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTD.
Reel/Frame 064805/0735 →
RELEASE OF SECURITY INTEREST Recorded Jun 16, 2020
From: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
To: STATS CHIPPAC, INC.; STATS CHIPPAC PTE. LTD. FORMERLY KNOWN AS STATS CHIPPAC LTD.
Reel/Frame 052963/0546 →
RELEASE OF SECURITY INTEREST Recorded Jun 4, 2020
From: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
To: STATS CHIPPAC, INC.; STATS CHIPPAC PTE. LTD. FORMERLY KNOWN AS STATS CHIPPAC LTD.
Reel/Frame 052844/0491 →
CHANGE OF NAME Recorded Apr 7, 2016
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTE.
Reel/Frame 038378/0391 →
CHANGE OF NAME Recorded Apr 7, 2016
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTE.
Reel/Frame 038378/0161 →
SECURITY INTEREST Recorded Aug 6, 2015
From: STATS CHIPPAC, INC.; STATS CHIPPAC LTD.
To: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
Reel/Frame 036288/0748 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2012
From: LEE, HUNTEAK; YANG, DAEWOOK; KO, YANGBEOM
To: STATS CHIPPAC, LTD.
Reel/Frame 027906/0166 →