Cleaning composition and method for cleaning semiconductor wafers after CMP
The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.
1. A composition comprising:
(a) one or more quaternary ammonium hydroxides in an amount effective to regulate the pH of the composition to a pH of from about 10 to about 14,
(b) one or more organic amines,
(c) one or more metal inhibitors selected from purines, azoles, pyrimidines, thiazoles, thiazolinones, and combinations thereof, and
(d) water,
wherein the composition further comprises one or more dialkylhydroxylamines or inorganic or organic acid salts thereof,
wherein the composition is suited for removing contaminants from semiconductor wafers following chemical-mechanical polishing.
2. The composition of claim 1 , wherein the quaternary ammonium hydroxide is ethyltrimethylammonium hydroxide (ETMAH), diethyldimethylammonium hydroxide (DEDMAH), tetraethylammonium hydroxide (TEAM), tetrapropylammonium hydroxide (TPAH), tetrabutylammonium hydroxide (TBAH), tributylmethylammonium hydroxide, tripropylmethylammonium hydroxide, benzyltrimethylammonium hydroxide (BTMAH), trihydroxyethylmethylammonium hydroxide (THEMAH), or any combination thereof.
3. The composition of claim 2 , wherein the quaternary ammonium hydroxide is trihydroxyethylmethylammonium hydroxide (THEMAH).
4. The composition of claim 1 , wherein the quaternary ammonium hydroxide is present in an amount of about 0.05% to about 40% by weight based on the total weight of the composition.
5. The composition of claim 1 , wherein the one or more organic amine is diethanolamine (DEA), triethanolamine (TEA), methyl diethanolamine (MDEA), aminoethylethanolamine (aminoethylaminoethanol, AEAE), 2-amino-2-methyl-1-propanol, 3-amino-1-propanol, 2-dimethylamino-2-methylpropanol, 2methylamino ethanol, 1-amino-2-propanol, 2(2-dimethylamino)ethyl)methylamino)ethanol, N,N′-bis(2-hydroxyethyl)ethylenediamine), 2(tert-butylamino)ethanol, 2-dimethylaminoethanol, 2-aminophenol, 1-amino-2-propanol, cysteamine, glycine, diethylenetriamine, pentaethylenehexamine, N,N′-di-tert-butylethylenediamine, N,N′-diethylethylenediamine, ethylenediamine (En), 1,2-diaminopropane (Pn), N-ethylethylenediamine, monoethanolamine (MEA), diglycolamine (DGA), or a combination thereof.
6. The composition of claim 5 , wherein the organic amine is ethylenediamine (En).
7. The composition of claim 5 , wherein the organic amine is 1,2-diaminopropane (Pn).
8. The composition of claim 5 , wherein the organic amine is monoethanolamine (MEA).
9. The composition of claim 5 , wherein the organic amine is in an amount of from about 0.002% to about 20% by weight based on the total weight of the composition.
10. The composition of claim 1 , wherein the metal inhibitor is a purine selected from guanine, xanthine, hypoxanthine, theophylline, paraxanthine, theobromine, caffeine, uric acid, adenosine, guanosine, or any combination thereof.
11. The composition of claim 1 , wherein the metal inhibitor is an azole selected from 3-amino-5-methylpyrazole (3-AMP), 3-amino-1,2,4-triazole (3-ATA), 5-aminotetrazole (5-ATA), 3,5-diamino-1,2,4-triazole (3,5-ATA or guanazole), 1,2,4-triazole (TAZ), 1-amino-1,2,4-triazole, 1,2,3-triazole, 1-amino-1,2,3-triazole, 1-amino-5-methyl-1,2,3-triazole, 2,4,6-triamino-1,3,5-triazine (melamine), 1,2,4-triazole-3-carboxamide, ribavirin, 5-mercapto-1-phenyltetrazole, or any combination thereof.
12. The composition of claim 1 , wherein the metal inhibitor is a pyrimidine selected from cytosine, isocytosine, folic acid, triamterene, 2-amino-4,6-dihydroxypyrimidine, 2,4-diamino-6-hydroxypyrimidine, 6-aminouracil, or any combination thereof.
13. The composition of claim 1 , wherein the metal inhibitor is a thiazole or thiazolinone selected from 2-methyl-4-isothiazolin-3-one (MIT), 2-aminothiazole, 2-amino-1,3,4-thiadiazole, 1,2-benzisothiazolin-3-one (BIT), 6-acetyl-2(3H)-benzothiazolone, or any combination thereof.
14. The composition of claim 1 , wherein the metal inhibitor is in an amount from about 0.001% to about 10% by weight based on the total weight of the composition.
15. The composition of claim 1 , wherein the dialkylhydroxylamine is diethylhydroxylamine (DEHA).
16. The composition of claim 1 , wherein:
(a) the quaternary ammonium hydroxide is present in an amount of from about 0.05% to about 40% by weight based on the total weight of the composition,
(b) the organic amine is present in an amount of from about 0.002% to about 20% by weight based on the total weight of the composition,
(c) the metal inhibitor is present in an amount of from about 0.001% to about 10% by weight based on the total weight of the composition,
(d) water is present in an amount of from about 30% to about 99.9% by weight based on the total weight of the composition; and
(e) the pH of the composition is from about 10 to about 14.
17. A cleaning method comprising (a) providing a semiconductor wafer having contaminants resulting from chemical-mechanical polishing of the semiconductor wafer and (b) contacting the surface of the semiconductor wafer with the composition of claim 1 to remove at least some of the contaminants from the surface of the semiconductor wafer.
18. The method of claim 17 , wherein the contaminants include abrasive particles, organic residue, metal ions, pad debris and CMP-byproducts, or any combination thereof.
19. The method of claim 17 , wherein the wafer is a semiconducting wafer comprising metal conductors.