Patent Assignment
Reel/Frame 013417/0945
Merger
Recorded: 2002-10-29
Received: 2002-11-05
Pages: 5
Assignor
MATSUSHITA ELECTRONICS CORPORATION
Executed: 2002-04-04
Assignee
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
1006, OAZA KADOMA, KADOMA-SHI, OSAKA, JPX, JAPAN
Covered Properties
(47)
Method for Fabricating Semiconductor Device
Application:
10/206,053 →
Capacitor and method for fabricating the same
Application:
10/194,323 →
Optical Electronic Apparatus and Method for Producing the Same
Application:
10/193,173 →
Apparatus and Method for Introducing Impurity
Application:
10/184,939 →
Semiconductor Storage Device and Method of Manufacturing the Same
Application:
10/166,683 →
Semiconductor Device and Method of Fabricating the Same
Application:
10/164,409 →
Terminal Land Frame and Method for Manufacturing the Same
Application:
10/164,616 →
Method of Fabricating Semiconductor Device
Application:
10/150,326 →
Method for fabricating semiconductor device having group III nitride
Application:
09/986,997 →
Bipolar transistor and method for fabricating the same
Application:
09/984,422 →
Apparatus and Method for Feeding Slurry
Application:
09/982,064 →
Semiconductor Device and Method of Fabricating the Same
Application:
09/968,940 →
Method for Fabricating Semiconductor Light-Emitting Unit
Application:
09/947,405 →
Semiconductor device and method for manufacturing the same
Application:
09/933,836 →
Resin-molded semiconductor device and method for manufacturing the same
Application:
09/908,810 →
Semiconductor Device and Method for Manufacturing the Same
Application:
09/886,971 →
Semiconductor Device Having a Cooper Interconnect Layer
Application:
09/884,135 →
Semiconductor device and method of fabricating the same
Application:
09/882,020 →
Semiconductor Device and Method for Fabricating the Same
Application:
09/855,773 →
Semiconductor Device and Method for Fabricating the Device
Application:
09/818,550 →
Semiconductor Integrated Circuit Device and Exposure Method
Application:
09/812,947 →
Method for Fabricating a Nonvolatile Semiconductor Device
Application:
09/813,305 →
Semiconductor Device Having an Active Region Formed from Group Iii Nitride
Application:
09/813,304 →
Method of Monitoring Manufacturing Apparatus
Application:
09/809,085 →
Method and Apparatus for Evaluating Insulating Film
Application:
09/808,100 →
Semiconductor Device and Method for Fabricating the Same
Application:
09/804,311 →
Methods of Reading and Writing Data from/ on Semiconductor Memory Device, and Method for Driving the Device
Application:
09/800,478 →
Method for Etching Organic Film, Method for Fabricating Semiconductor Device and Pattern Formation Method
Application:
09/798,913 →
Pattern Formation Material and Method
Application:
09/799,068 →
Method for Etching Organic Film, Method for Fabricating Semiconductor Device and Pattern Formation Method
Application:
09/798,912 →
Method and Apparatus for Controlling Progress of Product Processing
Application:
09/799,067 →
Pattern Formation Material and Method
Application:
09/799,017 →
Semiconductor Laser Diode Array and Method of Fabricating the Same
Application:
09/794,085 →
Semiconductor device and method for fabricating the same
Application:
09/790,518 →
Semiconductor Memory Device
Application:
09/785,502 →
Semiconductor Laser Device and Method for Fabricating the Same
Application:
09/784,016 →
Method for Predicting Lifetime of Insulating Film and Method for Reliability Testing of Semiconductor Device
Application:
09/762,951 →
Semiconductor Memory Device, Method for Driving the Same and Method for Fabricating the Same
Application:
09/782,300 →
Semiconductor Device and Method and System for Fabricating the Same
Application:
09/779,662 →
A Semiconductor Device Having Self-Aligned Structure
Application:
09/778,099 →
A Semiconductor Device Having Self-Aligned Structure
Application:
09/774,638 →
Method of Predicting Lifetime of Semiconductor Integrated Circuit and Method for Reliability Testing of the Circuit
Application:
09/744,260 →
Optical Electronic Apparatus and Method for Producing the Same
Application:
09/772,861 →
Semiconductor Laser Device
Application:
09/764,273 →
Semiconductor Misfet
Application:
09/759,300 →
Semiconductor Device and Method for Fabricating the Same
Application:
09/759,451 →
Method of Forming Interconnect
Application:
09/753,675 →