IP Library Assignment 045963/0870
Patent Assignment
Reel/Frame 045963/0870

Change of Name

Recorded: 2018-04-13 Pages: 3
Assignor
EUGENE TECHNOLOGY, INC.
Executed: 2017-11-16
Assignee
EUGENUS, INC.
677 RIVER OAKS PKWY, SAN JOSE, CALIFORNIA, 95134
Covered Properties (15)
Method and Apparatus for Providing Uniform Gas Delivery to Substrates in Cvd and Pecvd Processes
Patent: 6,206,972 →
Application: 09/350,417 →
Apparatus and Method to Achieve Continuous Interface and Ultrathin Film During Atomic Layer Deposition
Patent: 6,503,330 →
Application: 09/470,279 →
Apparatus and Concept for Minimizing Parasitic Chemical Vapor Deposition During Atomic Layer Deposition
Patent: 6,451,119 →
Application: 09/727,978 →
Publication: US 2001/0000866
Methods and Procedures for Engineering of Composite Conductive Films by Atomic Layer Deposition
Patent: 7,183,649 →
Application: 10/122,643 →
Method and Apparatus for Flexible Atomic Layer Deposition
Patent: 6,905,547 →
Application: 10/175,556 →
Apparatus and Concept for Minimizing Parasitic Chemical Vapor Deposition During Atomic Layer Deposition
Patent: 6,540,838 →
Application: 10/186,071 →
Publication: US 2002/0162506
Apparatus and Method to Achieve Continuous Interface and Ultrathin Film During Atomic Layer Deposition
Patent: 6,638,859 →
Application: 10/256,899 →
Publication: US 2003/0027431
Massively Parallel Atomic Layer Deposition/Chemical Vapor Deposition System
Patent: 6,902,624 →
Application: 10/282,609 →
Publication: US 2003/0109094
Method and Apparatus for Providing and Integrating a General Metal Delivery Source (Gmds) with Atomic Layer Deposition (Ald)
Patent: 6,863,021 →
Application: 10/295,614 →
Publication: US 2004/0094093
Method and Apparatus for Providing Uniform Gas Delivery to Substrates in Cvd and Pecvd Processes
Patent: 7,018,940 →
Application: 10/655,682 →
Publication: US 2004/0127067
Apparatus and Method to Achieve Continuous Interface and Ultrathin Film During Atomic Layer Deposition
Patent: 6,897,119 →
Application: 10/666,694 →
Purged Heater-Susceptor for an Ald/Cvd Reactor
Patent: 7,015,426 →
Application: 10/777,349 →
Publication: US 2004/0211764
Transient Enhanced Atomic Layer Deposition
Patent: 7,981,473 →
Application: 10/791,334 →
Publication: US 2008/0131601
Methods and Procedures for Engineering of Composite Conductive by Atomic Layer Deposition
Patent: 7,164,203 →
Application: 11/216,750 →
Apparatus and Method for High-Throughput Chemical Vapor Deposition
Patent: 8,906,456 →
Application: 14/038,669 →
Publication: US 2014/0030434
Related Assignments (4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 6, 2014
From: STRZYZEWSKI, PIOTR; BAUMANN, PETER; SCHUMACHER, MARCUS; LINDNER, JOHANNES
To: AIXTRON, INC.
Reel/Frame 034122/0195 →
Change of Name May 22, 2017
From: GENUS, INC.
To: AIXTRON, INC.
Reel/Frame 042524/0283 →
Assignment of Assignor's Interest Jan 30, 2018
From: AIXTRON, INC.
To: EUGENE TECHNOLOGY, INC.
Reel/Frame 044767/0357 →
Change of Name Jan 30, 2018
From: EUGENE TECHNOLOGY, INC.
To: EUGENUS, INC.
Reel/Frame 045444/0996 →