Polishing composition containing polyether amine
View Patent ↗The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.
1. A chemical-mechanical polishing composition comprising:
(a) an abrasive,
(b) a liquid carrier, and
(c) a compound selected from the group consisting of
(1) a compound of the Formula (I)
wherein x=2-6,
(2) a compound of the Formula (II)
wherein x+z=2-4 and y=1-50, and
(3) combinations thereof, wherein the concentration of the compound is about 50 ppm to about 1200 ppm.
2. The polishing composition of claim 1 , wherein the polishing composition further comprises a compound selected from the group 4,7,10-trioxatridecane-1,13-diamine, piperazine, and combinations thereof.
3. The polishing composition of claim 1 , wherein the polishing composition comprises a compound of the Formula (I) wherein x is 2-3 or x=5-6.
4. The polishing composition of claim 1 , wherein the polishing composition comprises a compound of Formula (II) wherein either (1) x+z=3-4 and y=8-9, (2) x+z=2-3 and y=15-16, or (3) x+z=2-3 and y=40-41.
5. The polishing composition of claim 1 , wherein the polishing composition further comprises a component different from the compound and selected from the group consisting of primary amines, secondary amines, tertiary amines, aminoalcohols, quaternary amines, and combinations thereof.
6. The polishing composition of claim 5 , wherein the component is tetramethylammonium hydroxide.
7. The polishing composition of claim 1 , wherein the polishing composition further comprises a compound selected from the group consisting of EDTA, oxalic acid, polyphosphonates, and combinations thereof.