IP Library › Granted Patent US 7,897,061
Granted Patent B2
US 7,897,061 · App. 11/699,129 · Granted Mar 1, 2011

Compositions and methods for CMP of phase change alloys

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Quick Facts
Patent No.
US 7,897,061
App. No.
11/699,129
Granted
Mar 1, 2011
Kind
B2
Abstract

The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing a substrate comprising a phase change alloy (PCA), such as a germanium-antimony-tellurium (GST) alloy. The composition comprises not more than about 6 percent by weight of a particulate abrasive material in combination with an optional oxidizing agent, at least one chelating agent, and an aqueous carrier therefor. The chelating agent comprises a compound or combination of compounds capable of chelating a phase change alloy or component thereof (e.g., germanium, indium, antimony and/or tellurium species) that is present in the substrate, or chelating a substance that is formed from the PCA during polishing of the substrate with the CMP composition. A CMP method for polishing a phase change alloy-containing substrate utilizing the composition is also disclosed.

Claims (10)

1. A chemical-mechanical polishing (CMP) composition for polishing a phase change alloy-containing substrate, the composition consisting essentially of:

(a) a particulate abrasive material in an amount in the range of about 0.01 to about 5 percent by weight and a mean particle size in the range of about 70 nm to about 110 nm;

(b) at least one chelating agent selected from the group consisting of oxalic acid, malonic acid, succinic acid, citric acid, and a salt thereof;

(c) an oxidizing agent; and

(d) an aqueous carrier therefore, wherein the composition has pH of about 2 to about 4.

2. The CMP composition of claim 1 wherein the particulate abrasive material is present in an amount in the range of about 0.1 to about 1 percent by weight.

3. The CMP composition of claim 1 wherein the particulate abrasive material is selected from the group consisting of colloidal silica, fumed silica, and alpha-alumina.

4. The CMP composition of claim 1 wherein the oxidizing agent comprises at least one oxidizing agent selected from the group consisting of a hydrogen peroxide, a persulfate salt, a periodate salt, and a salt thereof.

5. The CMP composition of claim 1 wherein the oxidizing agent comprises hydrogen peroxide.

6. The CMP composition of claim 1 wherein the oxidizing agent is present in an amount in the range of about 0.1 to about 6 percent by weight.

Assignments (10)
CHANGE OF NAME Recorded Nov 22, 2023
From: CMC MATERIALS, INC.
To: CMC MATERIALS LLC
Reel/Frame 065663/0466 →
CHANGE OF NAME Recorded Nov 8, 2023
From: CMC MATERIALS, INC.
To: CMC MATERIALS LLC
Reel/Frame 065517/0783 →
SECURITY INTEREST Recorded Jul 8, 2022
From: ENTEGRIS, INC.; ENTEGRIS GP, INC.; POCO GRAPHITE, INC.; CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: TRUIST BANK, AS NOTES COLLATERAL AGENT
Reel/Frame 060613/0072 →
SECURITY INTEREST Recorded Jul 8, 2022
From: CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 060615/0001 →
RELEASE OF SECURITY INTEREST Recorded Jul 6, 2022
From: JPMORGAN CHASE BANK, N.A.
To: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.; FLOWCHEM LLC; KMG ELECTRONIC CHEMICALS, INC.; KMG-BERNUTH, INC.; MPOWER SPECIALTY CHEMICALS LLC; SEALWELD (USA), INC.; INTERNATIONAL TEST SOLUTIONS, LLC; CMC MATERIALS, INC.
Reel/Frame 060592/0260 →
CHANGE OF NAME Recorded Jan 13, 2021
From: CABOT MICROELECTRONICS CORPORATION
To: CMC MATERIALS, INC.
Reel/Frame 054980/0681 →
SECURITY AGREEMENT Recorded Nov 16, 2018
From: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.; FLOWCHEM LLC; KMG ELECTRONIC CHEMICALS, INC.; MPOWER SPECIALTY CHEMICALS LLC
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 047588/0263 →
RELEASE OF SECURITY INTEREST Recorded Nov 16, 2018
From: BANK OF AMERICA, N.A.
To: CABOT MICROELECTRONICS CORPORATION
Reel/Frame 047587/0119 →
NOTICE OF SECURITY INTEREST IN PATENTS Recorded Feb 16, 2012
From: CABOT MICROELECTRONICS CORPORATION
To: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 027727/0275 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2007
From: DYSARD, JEFFREY; FEENEY, PAUL; ANJUR, SRIRAM
To: CABOT MICROELECTRONICS CORPORATION
Reel/Frame 019218/0142 →