Linear vacuum robot with Z motion and articulated arm
View Patent ↗There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A linear transport chamber includes linear tracks and robot arms riding on the linear tracks to linearly transfer substrates along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers. A four-axis robot arm is disclosed, capable of linear translation, rotation and articulation, and z-motion.
1. A method for transferring wafers from a loadlock to a processing chamber via an evacuated transfer chamber, comprising:
providing at least one robot arm within the evacuated transfer chamber;
magnetically coupling an input linear inertial motion from a motion coupling magnet of at least one magnetic coupling member outside a vacuum partition, movement of which defines the input linear inertial motion, to the at least one robot arm across the vacuum partition so that the input linear inertial motion of the motion coupling magnet of the at least one magnetic coupling member outside the vacuum partition is transferred, via magnetic coupling effecting matching inertial motion of another motion coupling magnet of at least one magnetic complementing coupling member inside the evacuated transfer chamber with the linear input inertial motion that defines an input linear inertial motion inside the evacuated transfer chamber to the at least one robot arm;
magnetically coupling an input rotational inertial motion from the motion coupling magnet of the at least one magnetic coupling member outside the vacuum partition, movement of which defines the input rotational inertial motion, to the at least one robot arm across the vacuum partition so that the input rotational inertial motion of the motion coupling magnet of the at least one magnetic coupling member outside the vacuum partition is transferred, via magnetic coupling effecting matching inertial motion of the other motion coupling magnet of the at least one magnetic complimenting coupling member inside the evacuated transfer chamber with the input rotational inertial motion that defines an input rotational inertial motion inside the evacuated transfer chamber to the at least one robot arm; and
reducing a speed of the input rotational inertial motion generated inside the evacuated transfer chamber to a reduced rotational inertial motion within the evacuated transfer chamber.
2. The method of claim 1 , further comprising:
determining a first center point defined as the center of a wafer as it is located in the loadlock;
determining a second center point defined as the center of the wafer as it is located in the processing chamber;
determining a location of a pivotal point of the at least one robot arm; and
calculating a combination of the input linear inertial motion and input rotational inertial motion of the at least one robot arm such that the wafer positioned on the at least one robot arm moves in only straight lines between the loadlock and the processing chamber.
3. The method of claim 1 , wherein the at least one robot arm comprises two robot arms provided within the evacuated transfer chamber such that a pivotal point of the two robot arms coincide with each other.
4. The method of claim 1 , further comprising reducing attractive forces created between the motion coupling magnet and the other motion coupling magnet when magnetically coupling the input linear inertial motion and the input rotation inertial motion to the at least one robot arm.
5. The method of claim 1 , wherein the input linear inertial motion and the input rotational inertial motion of the at least one robot arm within the evacuated transfer chamber are free-unmotorized motions.
6. The method of claim 1 , further comprising magnetically levitating the at least one robot arm within the evacuated transfer chamber.
7. The method of claim 1 , further comprising transferring wafers carried by the at least one robot arm through ports on one or more sides of the evacuated transfer chamber.
8. A method for transferring wafers, comprising:
providing an elongated substrate transfer chamber having an evacuated section;
providing a load lock connected to the elongated substrate transfer chamber through a load lock opening;
effecting transfer of wafers from the load lock through the evacuated section of the elongated substrate transfer chamber by providing both input linear inertial motion and input rotational inertial motion to at least one robot arm movably disposed within the elongated substrate transfer chamber; and
imparting at least the input rotational inertial motion from at least one magnetic coupling member outside the evacuated section, movement of which defines the at least the input rotational inertial motion, with a rotary motor mounted outside the evacuated section, to a speed reducer movably mounted within the evacuated section so that the input rotational inertial motion of the at least one magnetic coupling outside the evacuated section is transferred, via magnetic coupling effecting motion of at least one magnetic complimenting coupling member inside the evacuated section that defines an input rotational inertial motion inside the evacuated section to the at least one robot arm;
wherein the at least one robot arm is mounted to the speed reducer and the rotary motor is movable to traverse a length of the elongated transfer chamber.
9. The method of claim 8 , wherein:
the speed reducer freely rides on a first linear track mounted within the evacuated section; and
the rotary motor rides along a second linear track mounted outside the evacuated section.
10. The method of claim 8 , further comprising moving the rotary motor along the length of the elongated transfer chamber with a linear motor affixed to the rotary motor.
11. The method of claim 10 , further comprising:
actuating the rotary motor and the linear motor, with a controller, in a combination of linear and rotational motions so that a substrate positioned on the at least one robot arm moves only in straight lines between the load lock opening and a plurality of processing chamber openings provided in walls of the elongated substrate transfer chamber.
12. The method of claim 8 , further comprising magnetically levitating the speed reducer within the evacuated section.
13. The method of claim 8 , wherein the at least one robot arm is unmotorized.
14. The method of claim 8 , wherein the speed reducer rides along a linear track disposed within the evacuated section.
15. The method of claim 8 , further comprising magnetically coupling the rotary motor to the speed reducer through a vacuum partition of the elongated substrate transfer chamber where a first magnetic coupling of the speed reducer drivingly interfaces with a second magnetic coupling member of the rotary motor.
16. The method of claim 15 , further comprising reducing attractive forces between the first and second magnetic coupling members with repulsing magnets included in the first magnetic coupling member and the second magnetic coupling member.
17. The method of claim 8 , further comprising actuating the at least one robot arm with the speed reducer at a rotational speed that is lower than a rotation speed of the rotary motor.