High aspect ratio dielectric etch with chlorine
Various embodiments herein relate to methods and apparatus for etching recessed features on a semiconductor substrate. The techniques described herein can be used to form high quality recessed features with a substantially vertical profile, low bowing, low twisting, and highly circular features. These high quality results can be achieved with a high degree of selectivity and a relatively high etch rate. In various embodiments, etching involves exposing the substrate to plasma generated from a processing gas that includes a chlorine source, a carbon source, a hydrogen source, and a fluorine source. The chlorine source may have particular properties. In some cases, particular chlorine sources may be used. Etching typically occurs at low temperatures, for example at about 25 C or lower.
1 . A method of etching recessed features on a substrate, the method comprising:
a. providing the substrate on a substrate support in a reaction chamber, the substrate having a stack thereon, the stack comprising one or more layers of a first material comprising a silicon-containing material alternating with one or more layers of a second material, the substrate further comprising a patterned mask layer positioned over the stack;
b. flowing processing gas into the reaction chamber and generating a plasma from the processing gas, wherein the processing gas comprises:
i. a chlorine source comprising molecules containing only carbon, hydrogen, bromine, and chlorine, or comprising molecules containing only chlorine, carbon, and nitrogen,
ii. a carbon source,
iii. a fluorine source, and
iv. a hydrogen source; and
c. exposing the substrate to the plasma to etch recessed features into the stack on the substrate, the recessed features being etched through one or more of the layers of the first material and through one or more of the layers of the second material, wherein the substrate support is maintained at a cryogenic temperature during etching.
2 . The method of claim 1 , wherein the first material comprises silicon nitride and the second material comprises silicon oxide.
3 . The method of claim 2 , wherein the stack further comprises one or more layers of a third material alternating with the one or more layers of the first material comprising silicon nitride and the one or more layers of the second material comprising silicon oxide.
4 . The method of claim 3 , wherein the third material comprises polysilicon.
5 . The method of claim 1 , wherein the first material comprises silicon nitride and the second material comprises polysilicon.
6 . The method of claim 1 , wherein the chlorine source comprises at least one species selected from the group consisting of ClCN, CH 2 BrCl, C 2 H 2 BrCl, and C 2 H 4 BrCl.
7 . The method of claim 1 , wherein the substrate support is maintained at a cryogenic temperature between about −40° C. and −10° C. during etching.
8 . The method of claim 1 , wherein the plasma is a capacitively coupled plasma generated at an RF power between about 10-100 kW.
9 . The method of claim 1 , wherein the hydrogen source comprises at least one material selected from the group consisting of: H 2 , CH x F y (where 1≤x≤4, and x+y=4), C x H y F z (where z>0), and combinations thereof.
10 . The method of claim 1 , wherein the hydrogen source comprises H 2 .
11 . The method of claim 1 , wherein the fluorine source comprises at least one material selected from the group consisting of: NF 3 , CH x F y (where 0≤x≤3, and x+y=4), C x F y (where y>x), C x H y F z (where z>0), and combinations thereof.
12 . The method of claim 1 , wherein the carbon source comprises at least one material selected from the group consisting of: CH x F y (where 0≤x≤4, and x+y=4), C x F y (where y>x), C x H y F z (where z>0), and combinations thereof.
13 . The method of claim 1 , wherein the processing gas comprises Cl 2 , H 2 , NF 3 , CH 2 F 2 , CF 4 , and at least one of HBr and CF 3 I.
14 . The method of claim 1 , wherein the recessed features that are formed have a 3σ twist of about 10 nm or less.
15 . The method of claim 1 , wherein the recessed features that are formed have a depth of at least about 4000 nm.
16 . The method of claim 1 , wherein the recessed features that are formed have an ellipticity of about 1.15 or less.
17 . The method of claim 1 , wherein the recessed features that are formed have a maximum critical dimension of about 115 nm or less, and/or a Max−Bottom CD of about 40 nm or less.