Electrochromic devices
Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.
1. A method of fabricating an electrochromic device, the method comprising:
(a) forming either (i) an electrochromic layer comprising an electrochromic material, or (ii) a counter electrode layer comprising a counter electrode material,
wherein the electrochromic material comprises tungsten oxide mixed with a metal oxide selected from the group consisting of molybdenum oxide, vanadium oxide, titanium oxide, and
combinations thereof, and
wherein the counter electrode material comprises nickel oxide mixed with tungsten oxide and tantalum; and
(b) forming the other of the electrochromic layer and the counter electrode layer without first providing an ionically conducting and electrically insulating layer between the electrochromic layer and the counter electrode layer,
wherein the electrochromic device is all solid state.
2. The method of claim 1 , wherein the electrochromic material comprises tungsten oxide mixed with molybdenum oxide.
3. The method of claim 1 , wherein the electrochromic material comprises tungsten oxide mixed with vanadium oxide.
4. The method of claim 1 , wherein the electrochromic material comprises tungsten oxide mixed with titanium oxide.
5. The method of claim 1 , wherein the electrochromic material comprises tungsten oxide mixed with molybdenum oxide and titanium oxide.
6. A method of fabricating an electrochromic device from an electrochromic device precursor, the method comprising:
(a) receiving an electrochromic device precursor comprising:
(i) a substrate;
(ii) an electrochromic layer comprising tungsten oxide mixed with a metal oxide selected from the group consisting of molybdenum oxide, vanadium oxide, titanium oxide, and combinations thereof;
(iii) a counter electrode layer comprising nickel oxide mixed with tungsten oxide and tantalum, wherein the electrochromic layer and the counter electrode layer are in direct contact;
(iv) a first transparent conducting oxide layer; and
(v) a second transparent conducting oxide layer,
wherein the electrochromic layer and the counter electrode layer are sandwiched between the first transparent conducting oxide layer and the second transparent conducting oxide layer, and
wherein the electrochromic device precursor is all solid state; and
(b) after (a), forming an ionically conducting and electrically insulating material between the electrochromic layer and the counter electrode layer.
7. The method of claim 6 , wherein the electrochromic layer comprises tungsten oxide mixed with molybdenum oxide.
8. The method of claim 6 , wherein the electrochromic layer comprises tungsten oxide mixed with vanadium oxide.
9. The method of claim 6 , wherein the electrochromic layer comprises tungsten oxide mixed with the titanium oxide.
10. The method of claim 6 , wherein the electrochromic layer comprises tungsten oxide mixed with molybdenum oxide and titanium oxide.