Semiconductor interconnect structures with vertically offset bonding surfaces, and associated systems and methods
Semiconductor devices having interconnect structures with vertically offset bonding surfaces, and associated systems and methods, are disclosed herein. In one embodiment, a semiconductor device includes a semiconductor substrate at least partially covered by a first dielectric material having an upper surface, and an interconnect structure extending therefrom. The interconnect structure can include a plurality of conductive elements, and a continuous region of a first insulating material at least partially between the plurality of conductive elements. The plurality of conductive elements and the continuous region can have coplanar end surfaces. The interconnect structure can further include a perimeter structure at least partially surrounding the plurality of conductive elements and the continuous region. The perimeter structure can have an uppermost surface that can be vertically offset from the upper surface of the first dielectric material and/or the coplanar end surfaces.
1 . A semiconductor device, comprising:
a semiconductor substrate;
a dielectric layer formed over the semiconductor substrate, the dielectric layer having an upper surface; and
an interconnect structure disposed at least partially within the dielectric layer, the interconnect structure including:
a conductive element electrically coupled to circuitry in the semiconductor substrate, the conductive element having an end surface, and
a perimeter structure of an insulating material surrounding the conductive element, an uppermost surface of the perimeter structure being vertically offset from the end surface of the conductive element and/or the upper surface of the dielectric layer.
2 . The semiconductor device of claim 1 wherein the perimeter structure further includes an intermediate surface being parallel to and vertically offset from the uppermost surface of the perimeter structure.
3 . The semiconductor device of claim 2 wherein the intermediate surface is coplanar with the end surface of the conductive element.
4 . The semiconductor device of claim 2 wherein the perimeter structure further includes a lateral surface extending from the uppermost surface to the intermediate surface.
5 . The semiconductor device of claim 4 wherein the lateral surface is perpendicular to the uppermost surface and/or the intermediate surface.
6 . The semiconductor device of claim 2 wherein the intermediate surface is vertically offset from the upper surface of the dielectric layer.
7 . The semiconductor device of claim 1 wherein—
the insulating material is a first insulating material,
the interconnect structure further includes a continuous region of a second insulating material, and
the perimeter structure surrounds the conductive element and the continuous region of the second insulating material.
8 . The semiconductor device of claim 7 wherein the continuous region extends at least partially between the perimeter structure and the conductive element.
9 . The semiconductor device of claim 7 , wherein the perimeter structure further includes an intermediate surface being parallel to and vertically offset from the uppermost surface of the perimeter structure, and wherein the intermediate surface is coplanar with the end surface of the conductive element and the continuous region.
10 . The semiconductor device of claim 7 wherein the second insulating material is different than the first insulating material.
11 . The semiconductor device of claim 7 wherein the continuous region of the second insulating material is coupled to and extends outwardly from the semiconductor substrate.
12 . The semiconductor device of claim 1 wherein the dielectric layer is formed from the insulating material.
13 . The semiconductor device of claim 1 wherein the conductive element is one of a plurality of conductive elements coupled to the circuitry in the semiconductor substrate, and wherein the perimeter structure surrounds the plurality of conductive elements.
14 . The semiconductor device of claim 13 wherein each of the plurality of conductive elements have a respective end surface that is coplanar with the end surface.
15 . The semiconductor device of claim 13 wherein—
the insulating material is a first insulating material,
the interconnect structure further includes a continuous region of a second insulating material, and
the continuous region is at least partially between individual ones of the plurality of conductive elements.
16 . The semiconductor device of claim 15 wherein at least a portion of the continuous region is between the plurality of conductive elements and the perimeter structure.
17 . The semiconductor device of claim 1 wherein the perimeter structure is coupled to the upper surface of the dielectric layer.
18 . The semiconductor device of claim 1 wherein at least a portion of the dielectric layer is positioned between the semiconductor substrate and the perimeter structure.
19 . The semiconductor device of claim 1 wherein the end surface of the conductive element is coplanar with the upper surface of the dielectric layer.
20 . The semiconductor device of claim 1 wherein the end surface of the conductive element is vertically offset from the upper surface of the dielectric layer.