IP Library › Granted Patent US 12,482,733
Granted Patent B2
US 12,482,733 · App. 18/530,006 · Granted Nov 25, 2025

Ground via clustering for crosstalk mitigation

Inventors: Zhiguo Qian (Chandler, AZ); Kemal Aygun (Tempe, AZ); Yu Zhang (Raleigh, NC)
Assignee: Intel Corporation
H01L23/49827H01L23/49816H01L23/49838H01L21/486H01L2924/0002
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,482,733
App. No.
18/530,006
Granted
Nov 25, 2025
Kind
B2
Abstract

Embodiments of the present disclosure are directed towards techniques and configurations for ground via clustering for crosstalk mitigation in integrated circuit (IC) assemblies. In some embodiments, an IC package assembly may include a first package substrate configured to route input/output (I/O) signals and ground between a die and a second package substrate. The first package substrate may include a plurality of contacts disposed on one side of the first package substrate and at least two ground vias of a same layer of vias, and the at least two ground vias may form a cluster of ground vias electrically coupled with an individual contact. Other embodiments may be described and/or claimed.

Claims (30)

1 . A semiconductor package, comprising:

a substrate having a die side and a second side opposite the die side; and

a plurality of ball pads on the second side of the substrate, individual ones of the plurality of ball pads having a first side opposite a second side, and individual ones of the plurality of ball pads having a first vertical interconnect structure, a second vertical interconnect structure, and a third vertical interconnect structure coupled directly to the first side of the ball pad, each of the first vertical interconnect structure, the second vertical interconnect structure, and the third vertical interconnect structure comprising a corresponding stack of vias.

2 . The semiconductor package of claim 1 , further comprising:

a plurality of solder balls, individual ones of the plurality of solder balls coupled to the second side of a corresponding one of the plurality of ball pads.

3 . The semiconductor package of claim 2 , wherein the first vertical interconnect structure, the second vertical interconnect structure, and the third vertical interconnect structure are coupled directly to the first side of the corresponding one of the plurality of ball pads and are within a footprint of the corresponding individual one of the plurality of solder balls.

4 . The semiconductor package of claim 1 , further comprising:

a die coupled to the die side of the substrate.

5 . The semiconductor package of claim 1 , further comprising:

an interposer coupled to the second side of the substrate.

6 . The semiconductor package of claim 5 , wherein the interposer is coupled to the second side of the substrate by a plurality of solder balls, individual ones of the plurality of solder balls coupled to the second side of a corresponding one of the plurality of ball pads.

7 . The semiconductor package of claim 6 , wherein the first vertical interconnect structure, the second vertical interconnect structure, and the third vertical interconnect structure are coupled directly to the first side of the corresponding one of the plurality of ball pads and are within a footprint of the corresponding individual one of the plurality of solder balls.

8 . The semiconductor package of claim 1 , wherein each corresponding stack of vias has at least three vias.

9 . The semiconductor package of claim 1 , wherein one of the plurality of ball pads is coupled to ground.

10 . The semiconductor package of claim 1 , wherein the first vertical interconnect structure, the second vertical interconnect structure, and the third vertical interconnect structure extend from the die side of the substrate to the second side of the substrate.

11 . A semiconductor package, comprising:

a substrate having a die side and a second side opposite the die side; and

a plurality of ball pads on the second side of the substrate, individual ones of the plurality of ball pads having a first side opposite a second side, and individual ones of the plurality of ball pads having a first vertical interconnect structure and a second vertical interconnect structure coupled directly to the first side of the ball pad, each of the first vertical interconnect structure and the second vertical interconnect structure comprising a corresponding stack of vias.

12 . The semiconductor package of claim 11 , further comprising:

a plurality of solder balls, individual ones of the plurality of solder balls coupled to the second side of a corresponding one of the plurality of ball pads.

13 . The semiconductor package of claim 12 , wherein the first vertical interconnect structure and the second vertical interconnect structure are coupled directly to the first side of the corresponding one of the plurality of ball pads and are within a footprint of the corresponding individual one of the plurality of solder balls.

14 . The semiconductor package of claim 11 , further comprising:

a die coupled to the die side of the substrate.

15 . The semiconductor package of claim 11 , further comprising:

an interposer coupled to the second side of the substrate.

16 . The semiconductor package of claim 15 , wherein the interposer is coupled to the second side of the substrate by a plurality of solder balls, individual ones of the plurality of solder balls coupled to the second side of a corresponding one of the plurality of ball pads.

17 . The semiconductor package of claim 16 , wherein the first vertical interconnect structure and the second vertical interconnect structure are coupled directly to the first side of the corresponding one of the plurality of ball pads and are within a footprint of the corresponding individual one of the plurality of solder balls.

18 . The semiconductor package of claim 11 , wherein each corresponding stack of vias has at least three vias.

19 . The semiconductor package of claim 11 , wherein one of the plurality of ball pads is coupled to ground.

20 . The semiconductor package of claim 11 , wherein the first vertical interconnect structure and the second vertical interconnect structure extend from the die side of the substrate to the second side of the substrate.

Continuity (9)
Continuation 17956766 · Sep 29, 2022
Continuation 17566523 · Dec 30, 2021
Continuation 17074820 · Oct 20, 2020
Continuation 16509387 · Jul 11, 2019
Continuation 16026824 · Jul 3, 2018
Continuation 15369659 · Dec 5, 2016
Continuation 14943880 · Nov 17, 2015
Continuation 14575956 · Dec 18, 2014
Related Publication 20240105572A1 · Mar 28, 2024
References Cited (113)
US 5629838A · Knight · 1997 [cited by applicant]
US 5841191A · Chia et al. · 1998 [cited by applicant]
US 6563340B1 · Jones · 2003 [cited by applicant]
US 6743661B1 · Drewery · 2004 [cited by applicant]
US 8138021B2 · Corisis et al. · 2012 [cited by applicant]
US 8736068B2 · Bartley · 2014 [cited by applicant]
US 8805132B2 · Barowski · 2014 [cited by applicant]
US 9230900B1 · Qian · 2016 [cited by applicant]
US 9455181B2 · Mohammed · 2016 [cited by applicant]
US 9515017B2 · Qian · 2016 [cited by applicant]
US 10026682B2 · Qian · 2018 [cited by examiner]
US 10431537B1 · Pietambaram · 2019 [cited by applicant]
US 10833053B1 · Chen · 2020 [cited by applicant]
US 11901280B2 · Qian · 2024 [cited by examiner]
US 20020081816A1 · Spooner · 2002 [cited by applicant]
US 20020096743A1 · Spooner · 2002 [cited by applicant]
US 20030001282A1 · Meynen et al. · 2003 [cited by applicant]
US 20050104172A1 · Awujoola · 2005 [cited by applicant]
US 20060057832A1 · Kripesh · 2006 [cited by applicant]
US 20070018287A1 · Coenen · 2007 [cited by applicant]
US 20080036061A1 · Chainer · 2008 [cited by applicant]
US 20080284037A1 · Anday · 2008 [cited by applicant]
US 20090283894A1 · Lee · 2009 [cited by applicant]
US 20100019374A1 · Hundt · 2010 [cited by applicant]
US 20100032196A1 · Kaneko et al. · 2010 [cited by applicant]
US 20100279466A1 · Corisis · 2010 [cited by applicant]
US 20110042795A1 · Knickerbocker · 2011 [cited by applicant]
US 20110115075A1 · Hu · 2011 [cited by applicant]
US 20120061821A1 · Black · 2012 [cited by applicant]
US 20120146216A1 · Kang et al. · 2012 [cited by applicant]
US 20120187570A1 · Bartley et al. · 2012 [cited by applicant]
US 20130214432A1 · Wu · 2013 [cited by applicant]
US 20140084476A1 · Lin · 2014 [cited by applicant]
US 20140300003A1 · Kariyazaki et al. · 2014 [cited by applicant]
US 20140374921A1 · Yu · 2014 [cited by applicant]
US 20150048523A1 · Suga · 2015 [cited by applicant]
US 20150091178A1 · Reber · 2015 [cited by applicant]
US 20160035588A1 · Lin · 2016 [cited by applicant]
US 20160181189A1 · Qian · 2016 [cited by applicant]
US 20160254249A1 · Jeng · 2016 [cited by applicant]
US 20170278780A1 · May · 2017 [cited by examiner]
US 20190304887A1 · Ganesan · 2019 [cited by examiner]
US 20190304889A1 · Jiao · 2019 [cited by examiner]
US 20190304916A1 · Reichman · 2019 [cited by applicant]
US 20190385989A1 · Yu · 2019 [cited by applicant]
US 20200035625A1 · Wang · 2020 [cited by applicant]
US 20200168550A1 · Ryu · 2020 [cited by applicant]
US 20200227386A1 · Kim · 2020 [cited by applicant]
US 20200243464A1 · Hsu · 2020 [cited by applicant]
US 20200350241A1 · Kim · 2020 [cited by examiner]
US 20200411441A1 · Darmawikarta · 2020 [cited by examiner]
US 20210125886A1 · Wang · 2021 [cited by applicant]
US 20210183755A1 · Ong · 2021 [cited by applicant]
US 20210193616A1 · Cheah · 2021 [cited by applicant]
US 20210202455A1 · Tsai · 2021 [cited by applicant]
US 20220068847A1 · Brown · 2022 [cited by applicant]
US 20220130742A1 · Qian · 2022 [cited by applicant]
US 20220302003A1 · Pan · 2022 [cited by examiner]
US 20220320022A1 · Kuo · 2022 [cited by applicant]
US 20220406753A1 · Eah · 2022 [cited by applicant]
US 20230136656A1 · Lai · 2023 [cited by examiner]
US 20230307330A1 · Chen · 2023 [cited by examiner]
US 20230386988A1 · Liao · 2023 [cited by examiner]
US 20230395519A1 · Yew · 2023 [cited by examiner]
US 20240105572A1 · Qian · 2024 [cited by examiner]
US 20240266266A1 · Hsu · 2024 [cited by examiner]
US 20250022810A1 · Chen · 2025 [cited by examiner]
CN 101194360 · 2008 [cited by applicant]
CN 101199248 · 2008 [cited by applicant]
CN 101416303 · 2009 [cited by applicant]
CN 102683228 · 2012 [cited by applicant]
CN 103098204A · 2013 [cited by applicant]
CN 103608913 · 2014 [cited by applicant]
JP 10326851 · 1998 [cited by applicant]
JP 2010045134 · 2010 [cited by applicant]
JP 2013538460 · 2013 [cited by applicant]
KR 1020130094523 · 2013 [cited by applicant]
WO WO2008112643 · 2008 [cited by applicant]
WO WO2014011615 · 2014 [cited by applicant]
Office Action from Chinese Patent Application No. 201580062829.7 mailed Jun. 27, 2019, 7 pgs. [cited by applicant]
Extended European Search Report for European Patent Application No. 15870674.7, mailed Jul. 11, 2018, 6 pgs. [cited by applicant]
Office Action from European Patent Application No. 15870674.7, mailed Apr. 24, 2019, 5 pgs. [cited by applicant]
International Search Report and Written Opinion for International Application No. PCT/US2015/063822 mailed Feb. 29, 2016, 11 pgs. [cited by applicant]
International Preliminary Report on Patentability for International Application No. PCT/US2015/063822 mailed Jun. 29, 2017, 8 pgs. [cited by applicant]
Office Action for Taiwan Patent Application No. 104137886 mailed Aug. 9, 2016, 3 pgs., no translation. [cited by applicant]
Notice of Allowance for Taiwan Patent Application No. 104137886 mailed Feb. 6, 2017, 3 pgs., with English translation. [cited by applicant]
Extended European Search Report for European Patent Application No. 18214233.1, mailed Jul. 26, 2019, 5 pgs. [cited by applicant]
Office Action from Japanese Patent Application No. 2017-530112 mailed Jan. 7, 2020, 7 pages. [cited by applicant]
Office Action from Indian Patent Application No. 201747017636, mailed Aug. 16, 2019, 10 pages. [cited by applicant]
Notice of Allowance from Chinese Patent Application No. 201580062829.7 mailed Feb. 3, 2020, 8 pgs. [cited by applicant]
Office Action from European Patent Application No. 15870674.7, mailed Apr. 16, 2020, 4 pgs. [cited by applicant]
Notice of Allowance from Japanese Patent Application No. 2017-530112 mailed Oct. 6, 2020, 3 pages. [cited by applicant]
Notice of Allowance for European Patent Application No. 18214233.1, mailed Dec. 17, 2020, 2 pgs. [cited by applicant]
Search Report for European Patent Application No. 20200804.1, mailed Sep. 8, 2021, 10 pgs. [cited by applicant]
Search Report for European Patent Application No. 21175747.1, mailed Jan. 7, 2022, 8 pgs. [cited by applicant]
Office Action from Korean Patent Application No. 10-2017-7013475, mailed Mar. 30, 2022, 8 pgs. [cited by applicant]
Office Action from Korean Patent Application No. 10-2017-7013475, mailed Apr. 1, 2022, 7 pgs. [cited by applicant]
Notice of Allowance from Korean Patent Application No. 10-2017-7013475, mailed Oct. 28, 2022, 4 pgs., with English translation. [cited by applicant]
Office Action from Chinese Patent Application No. 201811450623.3 mailed Nov. 14, 2022, 7 pgs., no translation. [cited by applicant]
Office Action from Singapore Patent Application No. 10201904967Y mailed Apr. 17, 2023, 10 pgs. [cited by applicant]
Notice of Allowance from U.S. Appl. No. 17/566,523 mailed Apr. 20, 2023, 9 pgs. [cited by applicant]
Search Report for European Patent Application No. 22217374.2, mailed Jul. 6, 2023, 5 pgs. [cited by applicant]
Search Report for Chinese Patent Application No. 201811450623.3, mailed Jul. 31, 2023, 9 pgs. [cited by applicant]
Office Action from Korean Patent Application No. 10-2023-7003300 mailed Oct. 3, 2023, 3 pgs. [cited by applicant]
Office Action from Chinese Patent Application No. 201811450623.3 mailed Aug. 21, 2024, 9 pgs. [cited by applicant]
Office Action from Chinese Patent Application No. 201811450623.3 mailed Sep. 29, 2024, 11 pgs. [cited by applicant]
Office Action from Chinese Patent Application No. 201811450623.3 mailed Oct. 16, 2024, 4 pgs. [cited by applicant]
Office Action from Chinese Patent Application No. 201811450623.3 mailed Oct. 30, 2023, 5 pgs. [cited by applicant]
Notice of Allowance from Korean Patent Application No. 10-2023-7003300 mailed Feb. 21, 2024, 3 pgs. [cited by applicant]
Office Action from India Patent Application No. 202348030802 mailed Mar. 7, 2024, 7 pgs. [cited by applicant]
Notice of Allowance from Singapore Patent Application No. 10201904967Y mailed Mar. 1, 2024, 3 pgs. [cited by applicant]
Notice of Allowance from Korean Patent Application No. 10-2024-7016680 mailed Jun. 21, 2025, 4 pgs. [cited by applicant]
Notice of Allowance for European Patent Application No. 20200804.1, mailed Aug. 28, 2025, 2 pgs. [cited by applicant]