IP Library › Granted Patent US 12,621,937
Granted Patent B2
US 12,621,937 · App. 17/339,420 · Granted May 5, 2026

Package substrate including core with trench vias and planes

Inventor: Telesphor Kamgaing (Chandler, AZ)
Assignee: Intel Corporation
H05K3/4038H05K1/115H05K2201/09827H05K2203/0528
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Quick Facts
Patent No.
US 12,621,937
App. No.
17/339,420
Granted
May 5, 2026
Kind
B2
Abstract

Embodiments disclosed herein comprise package substrates and methods of forming package substrates. In an embodiment, a package substrate comprises a core substrate. A hole is disposed into the core substrate, and a via is disposed in the hole. In an embodiment, the via completely fills the hole. In an embodiment, a method of forming a package substrate comprises exposing a region of a core substrate with a laser. In an embodiment, the laser changes the morphology of the exposed region. The method may further comprise etching the core substrate, where the exposed region etches at a faster rate than the remainder of the core substrate to form a hole in the core substrate. The method may further comprise disposing a via in the hole.

Claims (65)

1 . A package substrate, comprising:

a core substrate;

a hole into the core substrate, and a trench into the core substrate, the trench laterally spaced apart from the hole, wherein the hole does not pass entirely through a thickness of the core substrate;

a via in the hole, wherein the via completely fills the hole, and wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

a via plane in the trench.

2 . The package substrate of claim 1 wherein the core substrate comprises a glass, a silicon, a ceramic, or a nonconductive semiconductor.

3 . The package substrate of claim 2 , wherein the core substrate comprises the glass, and wherein the glass is a photo-definable glass.

4 . The package substrate of claim 1 , wherein the hole passes entirely through a thickness of the core substrate.

5 . The package substrate of claim 1 , wherein the hole has sidewalls that are sloped.

6 . The package substrate of claim 5 , wherein the sidewalls have a slope that is approximately 10° or less.

7 . The package substrate of claim 5 , wherein the sidewalls form an hourglass shaped cross-section.

8 . The package substrate of claim 1 wherein the hole is elongated to form a trench into the core substrate.

9 . The package substrate of claim 1 , wherein the hole is circular.

10 . The package substrate of claim 1 , wherein the hole is rectangular.

11 . The package substrate of claim 1 , wherein the hole is rectangular with rounded ends.

12 . The package substrate of claim 1 , further comprising a second hole and a second via filling the second hole.

13 . The package substrate of claim 12 , wherein the second hole intersects the first hole.

14 . The package substrate of claim 1 , further comprising:

a buildup layer over a surface of the core substrate.

15 . The package substrate of claim 1 , wherein the core substrate has a thickness that is approximately 200 μm or greater, and wherein a diameter of the hole is approximately 50 μm or smaller.

16 . A method of forming a package substrate, comprising:

exposing a region of a core substrate with a laser, wherein the laser changes the morphology of the exposed region;

etching the core substrate, wherein the exposed region etches at a faster rate than the remainder of the core substrate to form a hole in the core substrate, and to form a trench into the core substrate, the trench laterally spaced apart from the hole;

forming a via in the hole, wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

forming a via plane in the trench.

17 . The method of claim 16 , wherein a first surface of the core substrate and a second surface of the core substrate are exposed with the laser.

18 . The method of claim 17 , wherein the hole has an hourglass shaped cross-section.

19 . The method of claim 16 , wherein the hole passes through an entire thickness of the core substrate.

20 . The method of claim 16 , wherein the hole does not pass through an entire thickness of the core substrate.

21 . An electronic package, comprising:

a package substrate, wherein the package substrate comprises:

a core substrate that comprises a glass section with a via through the glass section, wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate, and the glass section having a via plane through the glass section, the via plane laterally spaced apart from the via; and

a buildup layer over the core substrate; and

a die coupled to the package substrate, wherein the die is electrically coupled to the via; and

a board, wherein the package substrate is coupled to the board.

22 . The electronic package of claim 21 , wherein the glass section is embedded within the core substrate.

23 . The electronic package of claim 21 , wherein an entirety of the core substrate comprises the glass section.

24 . The electronic package of claim 21 , wherein the via has an hourglass shaped cross-section.

25 . A package substrate, comprising:

a core substrate, wherein the core substrate comprises a glass, and wherein the glass is a photo-definable glass;

a hole into the core substrate, and a trench into the core substrate, the trench laterally spaced apart from the hole;

a via in the hole, wherein the via completely fills the hole, and wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

a via plane in the trench.

26 . A package substrate, comprising:

a core substrate;

a hole into the core substrate, wherein the hole has sidewalls that are sloped, and a trench into the core substrate, the trench laterally spaced apart from the hole;

a via in the hole, wherein the via completely fills the hole, and wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

a via plane in the trench.

27 . The package substrate of claim 26 , wherein the sidewalls have a slope that is approximately 10° or less.

28 . The package substrate of claim 26 , wherein the sidewalls form an hourglass shaped cross-section.

29 . A package substrate, comprising:

a core substrate;

a hole into the core substrate, wherein the hole is elongated to form a trench into the core substrate, and a trench into the core substrate, the trench laterally spaced apart from the hole;

a via in the hole, wherein the via completely fills the hole, and wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

a via plane in the trench.

30 . A package substrate, comprising:

a core substrate;

a hole into the core substrate, wherein the hole is rectangular, and a trench into the core substrate, the trench laterally spaced apart from the hole;

a via in the hole, wherein the via completely fills the hole, and wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

a via plane in the trench.

31 . A package substrate, comprising:

a core substrate;

a hole into the core substrate, wherein the hole is rectangular with rounded ends, and a trench into the core substrate, the trench laterally spaced apart from the hole;

a via in the hole, wherein the via completely fills the hole, and wherein the via has an outermost surface at a same level as an outermost surface of the core substrate, the outermost surface of the via having a maximum diameter less than a vertical thickness of the via through the core substrate; and

a via plane in the trench.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE APPLICATION NUMBER 17339720 PREVIOUSLY RECORDED AT REEL: 057131 FRAME: 0307. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT . Recorded Oct 21, 2021
From: KAMGAING, TELESPHOR
To: INTEL CORPORATION
Reel/Frame 057888/0930 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 9, 2021
From: KAMGAING, TELESPHOR
To: INTEL CORPORATION
Reel/Frame 057131/0307 →
Continuity (1)
Related Publication 20220394858A1 · Dec 8, 2022
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