Semiconductor device and method of forming a shielding layer over a semiconductor die disposed in a cavity of an interconnect structure and grounded through the die TSV
A semiconductor device has an interconnect structure with a cavity formed partially through the interconnect structure. A first semiconductor die is mounted in the cavity. A first TSV is formed through the first semiconductor die. An adhesive layer is deposited over the interconnect structure and first semiconductor die. A shielding layer is mounted over the first semiconductor die. The shielding layer is secured to the first semiconductor die with the adhesive layer and grounded through the first TSV and interconnect structure to block electromagnetic interference. A second semiconductor die is mounted to the shielding layer and electrically connected to the interconnect structure. A second TSV is formed through the second semiconductor die. An encapsulant is deposited over the shielding layer, second semiconductor die, and interconnect structure. A slot is formed through the shielding layer for the encapsulant to flow into the cavity and cover the first semiconductor die.
1. A semiconductor device, comprising:
a substrate including a cavity;
a first semiconductor die or component disposed in the cavity of the substrate;
a first conductive via formed through the first semiconductor die or component;
a shielding layer disposed over the first semiconductor die or component and electrically connected to the first conductive via; and
an encapsulant deposited over the shielding layer and substrate and further through an opening in the shielding layer over the semiconductor die or component.
2. The semiconductor device of claim 1 , wherein the opening in the shielding layer includes a slot extending along a length of the shielding layer to dispense the encapsulant into the cavity over the first semiconductor die or component.
3. The semiconductor device of claim 1 , wherein the shielding layer is planar with the substrate.
4. The semiconductor device of claim 1 , further including a second semiconductor die or component disposed over the shielding layer.
5. The semiconductor device of claim 1 , further including a second conductive via formed through the substrate.
6. The semiconductor device of claim 1 , wherein the shielding layer blocks electromagnetic interference.
7. A semiconductor device, comprising:
a substrate;
a first semiconductor die or component disposed in a cavity of the substrate;
a shielding layer disposed over the first semiconductor die or component; and
an encapsulant deposited over the shielding layer and substrate and into the cavity of the substrate over the first semiconductor die or component.
8. The semiconductor device of claim 7 , further including a conductive via formed through the first semiconductor die or component.
9. The semiconductor device of claim 7 , wherein the shielding layer includes an opening.
10. The semiconductor device of claim 7 , wherein a surface of the first semiconductor die or component is substantially co-planar with a surface of the substrate.
11. The semiconductor device of claim 7 , further including a second semiconductor die or component disposed over the shielding layer.
12. The semiconductor device of claim 7 , further including a conductive via formed through the substrate.
13. The semiconductor device of claim 7 , wherein the shielding layer blocks electromagnetic interference.
14. A semiconductor device, comprising:
a substrate;
a first semiconductor die or component disposed in a cavity of the substrate;
a planar shielding layer disposed over the first semiconductor die or component and including an opening disposed over the cavity of the substrate; and
an encapsulant deposited into the cavity of the substrate over the first semiconductor die or component.
15. The semiconductor device of claim 14 , wherein the opening in the planar shielding layer extends along a length of the planar shielding layer.
16. The semiconductor device of claim 14 , further including a conductive via formed through the first semiconductor die or component.
17. The semiconductor device of claim 14 , further including a second semiconductor die or component disposed over the planar shielding layer.
18. The semiconductor device of claim 14 , further including a conductive via formed through the substrate.
19. The semiconductor device of claim 18 , wherein the planar shielding is electrically connected to the conductive via.
20. A semiconductor device, comprising:
a substrate;
a first semiconductor die or component disposed in a cavity of the substrate;
a planar shielding layer disposed over the first semiconductor die or component and electrically connected to the substrate; and
a second semiconductor die or component disposed over the planar shielding layer.
21. The semiconductor device of claim 20 , further including an encapsulant deposited over the planar shielding layer and substrate.
22. The semiconductor device of claim 20 , further including an opening formed in the planar shielding layer.
23. The semiconductor device of claim 20 , wherein a surface of the first semiconductor die or component is substantially co-planar with a surface of the substrate.
24. The semiconductor device of claim 20 , further including a conductive via formed through the first semiconductor die or component.