IP Library › Assignment 007815/0833

Patent Assignment

Reel/Frame 007815/0833

Assignment of Assignor's Interest

Recorded: 1996-02-20 Pages: 8

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Assignor

CIBA-GEIGY CORPORATION

Executed: 1995-08-23

Assignee

OCG MICROELECTRONIC MATERIALS, INC.

P. O. BOX 4500, 501 MERRITT 7, NORWALK, CONNECTICUT, 06856

Covered Properties (56)

Process for the Development of Relief Structures Based on Radiation- Crosslinked Polymeric Precursors of Polymers Which Are Resistant to High Temperature

Patent: 4,539,288 →

Application: 06/561,505 →

Photosensitive Polymers as Coating Materials

Patent: 4,657,832 →

Application: 06/608,754 →

Polyimides, a Process for Their Preparation and Their Use

Patent: 4,629,777 →

Application: 06/608,755 →

Homopolymers, Copolymers and Coated Material and Its Use

Patent: 4,680,195 →

Application: 06/732,334 →

A Process for Irradiating Polyimidies

Patent: 4,629,685 →

Application: 06/795,591 →

Polyimides, a Process for Their Preparation and Their Use, and Tetracarboxylic Acids and Tetracarboxylic Acid Derivatives

Patent: 4,698,295 →

Application: 06/796,380 →

Polyamide Ester Photoresist Formulations of Enhanced Sensitivity

Patent: 4,701,300 →

Application: 06/818,950 →

Stabilized Solutions of Radiation-Crosslinkable Polymer Precursors of Highly Heat-Resistant Polymers

Patent: 4,757,098 →

Application: 06/853,102 →

Negatively Operating Photoresist Composition, with Radiation-Absorbing Additives

Patent: 4,762,767 →

Application: 06/857,663 →

Cyclic Acetals or Ketals of Beta-Keto Esters or Amides

Patent: 4,737,426 →

Application: 06/859,683 →

Polyimides and a Process for Their Preparation

Patent: 4,677,186 →

Application: 06/895,603 →

Adhesively Bonded Photostructurable Polyimide Film

Patent: 4,786,569 →

Application: 06/901,095 →

Substituted O-Phthalaldehydes

Patent: 4,820,829 →

Application: 07/001,309 →

Novel Organometallic Polymers

Patent: 4,734,481 →

Application: 07/001,312 →

Homopolymers, Copolymers and Coated Material and Its Use

Patent: 4,783,372 →

Application: 07/041,889 →

Diamino-9,10-Dihydroanthracenes and Polyamide Acid (Esters) and Polyimides Derived Therefrom

Patent: 4,847,359 →

Application: 07/063,881 →

Radiation-Sensitive Polycondensates, Processes for Their Preparation, Coated Material and Its Use

Patent: 4,785,074 →

Application: 07/064,728 →

Material Coated with Polyamic Acid Ester

Patent: 4,814,233 →

Application: 07/067,589 →

Polyimides, a Process for Their Preparation and Their Use, and Tetracarboxylic Acids and Tetracarboxylic Acid Derivatives

Patent: 4,914,182 →

Application: 07/070,749 →

Polyimides, a Process for Their Preparation and Their Use, and Tetracarboxylic Acids and Tetracarboxylic Acid Derivatives

Patent: 4,914,181 →

Application: 07/070,750 →

Radiation-Sensitive Polycondensates, Their Preparation, Material Coated Therewith and the Use Thereof

Patent: 4,764,584 →

Application: 07/099,373 →

Positive O - Quinone Diazide Photoresist Composition with a Bis - Benzotriazole

Patent: 4,871,644 →

Application: 07/099,880 →

1,2-Naphthoquinone Diazide Sulfonyl Ester Compound with Linking Benzotriazole Groups and Light-Sensitive Composition with Compound

Patent: 4,835,085 →

Application: 07/105,379 →

Amino-Tetraalkylbenzoylphthalic Acids

Patent: 4,808,732 →

Application: 07/115,544 →

Cyclic Acetals or Ketals of 8-Keto Esters or Amides

Patent: 4,806,448 →

Application: 07/125,668 →

Photostructurable Polyimide Mixtures

Patent: 4,851,506 →

Application: 07/135,813 →

Adhesively Bonded Photostructurable Polyimide Film

Patent: 4,935,320 →

Application: 07/231,323 →

Auto-Photocrosslinkable Copolyimides and Polyimide Compositions

Patent: 4,925,912 →

Application: 07/281,429 →

Process for the Preparation of 1,2-Disulfone Compounds

Patent: 4,980,508 →

Application: 07/308,483 →

Positive Photoresist Composition Containing Radiation Sensitive Quinonediazide Compound and Completely Esterified Polyamic Acid Polymer

Patent: 5,104,768 →

Application: 07/430,760 →

Disubstituted Aromatic Dianhydrides

Patent: 5,077,415 →

Application: 07/467,622 →

Polyimides Prepared from Disubstituted Aromatic Tetracarboxylic Acid Dianhydrides

Patent: 5,153,303 →

Application: 07/467,710 →

Auto-Photocrosslinkable Copolyimides and Polyimide Compositions

Patent: 5,102,959 →

Application: 07/487,563 →

Positive Photoresist Composition Containing Alkali-Soluble Phenolic Resin, Photosensitive Quinonediazide Compound and Sulfonyl Containing Compound

Patent: 5,106,718 →

Application: 07/648,954 →

Positive Photoresist Containing 2,3,4-Trihydroxybenzophenone and 1,2-Naphthoquinone-Diazide-5-Sulfonyl Trisester of 1,3,5-Trihydroxy- Benzene

Patent: 5,077,173 →

Application: 07/649,271 →

Desensitized Quinone Diazide Compounds Utilizing Microcrystalline Cellulose as Desensitizing Agent

Patent: 5,075,193 →

Application: 07/662,395 →

Positive Diazo Quinone Photoresist Compositions Containing Antihalation Compound

Patent: 5,334,481 →

Application: 07/692,811 →

Benzoates Containing a Substituent Having Olefinic Unsaturation

Patent: 5,106,932 →

Application: 07/731,188 →

Acid Labile Dissolution Inhibitors and Positive- and Negative-Acting Photosensitive Composition Based Thereon

Patent: 5,210,003 →

Application: 07/756,631 →

Positive Photoresist Containing 1,2-Naphthoquinone-Diazide-5-Sulfonyl Tris Ester of 1,3,5-Trihydroxybenzene and Aromatic Hydroxy Compound Sensitizer

Patent: 5,219,701 →

Application: 07/771,088 →

Photoresist Composition Containing Specific Amounts of a Naphtho- Quinone Diazide Sulfonyl Ester of Tetrahydroxy Diphenyl Sulfide and a Polyhydroxy Compound

Patent: 5,200,293 →

Application: 07/793,494 →

Benzoates Containing a Substituent Having Olefinic Unsaturation

Patent: 5,166,405 →

Application: 07/831,119 →

Copolymers Crosslinkable by Acid Catalysis

Patent: 5,274,060 →

Application: 07/843,798 →

Photosensitive Compositions Based on Polyphenols and Acetals

Patent: 5,238,781 →

Application: 07/843,799 →

Positive Photoresists Containing Quinone Diazide Photosensitizer, Alkali-Soluble Resin and Tetra(Hydroxyphenyl) Alkane Additive

Patent: 5,296,330 →

Application: 07/932,128 →

Radiation-Sensitive Compositions

Patent: 5,356,740 →

Application: 07/979,498 →

Acid Labile Solution Inhibitors and Positive- and Negative-Acting Photosensitive Composition Based Thereon

Patent: 5,380,881 →

Application: 08/007,420 →

Phenylacetates and the Use Thereof

Patent: 5,380,882 →

Application: 08/040,230 →

Photoresist Material Based on Polystryenes

Patent: 5,324,804 →

Application: 08/051,720 →

Positive Photoresists with Enhanced Resolution and Reduced Crystallisation Containing Novel Tetra(Hydroxyphenyl)Alkanes

Patent: 5,436,098 →

Application: 08/180,180 →

Module in an Integrated Delivery System for Chemical Vapors from Liquid Sources

Patent: 5,399,200 →

Application: 08/209,090 →

A Process of Photopatterning a Substrate with a Positive Photoresist Composition Containing a Diazoquinone Photosensitizer

Patent: 5,399,463 →

Application: 08/227,831 →

Positive Photoresist Having Improved Processing Properties

Patent: 5,397,680 →

Application: 08/249,972 →

Phenylacetates and Their Use in Radiation Sensitive Compositions

Patent: 5,476,751 →

Application: 08/323,482 →

Photoresist Compositions Containing Copolymers Having Acid-Labile Groups and Recurring Units Derived from Either N-(Hydroxymethyl)Maleimide or N-(Acetoxymethyl)Maleimide or Both

Patent: 5,558,978 →

Application: 08/358,131 →

Tetra(Hydroxphenyl)Alkanes

Patent: 5,554,797 →

Application: 08/399,686 →

Related Assignments (11)

Other recorded transfers of the patents in this record — the chain of ownership.

Assignment of Assignors Interest. Apr 16, 1985

From: MERREM, HANS-JOACHIM; NEISIUS, KARLHEINZ; KLUG, RUDOLF; HARTNER, HARTMUT

To: MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG

Reel/Frame 004388/0357 →

Assignment of Assignors Interest. Aug 11, 1986