Patent Assignment
Reel/Frame 026720/0803
Change of Name
Recorded: 2011-08-09
Pages: 8
Assignor
LUXTRON CORPORATION
Executed: 2011-07-01
Assignee
LUMASENSE TECHNOLOGIES HOLDINGS, INC.
3301 LEONARD COURT, SANTA CLARA, CALIFORNIA, 95054
Covered Properties
(33)
Fiberoptic Sensing of Temperature and/or Other Physical Parameters
Patent:
4,752,141 →
Application:
06/921,637 →
Modular Luminescence-Based Measuring System Using Fast Digital Signal Processing
Patent:
5,351,268 →
Application:
07/773,039 →
Apparatus and Method for Monitoring a Temperature Using a Thermally Fused Composite Blackbody Temperature Probe
Patent:
5,364,186 →
Application:
07/874,829 →
Endpoint and Uniformity Determinations in Material Layer Processing Through Monitoring Multiple Surface Regions Across the Layer
Patent:
5,308,447 →
Application:
07/896,132 →
Luminescent Decay Time Measurements by Use of a Ccd Camera
Patent:
5,304,809 →
Application:
07/945,229 →
Interference Removal
Patent:
5,414,504 →
Application:
08/019,748 →
Processing Endpoint Detecting Technique and Detector Structure Using Multiple Radiation Sources or Discrete Detectors
Patent:
5,362,969 →
Application:
08/052,401 →
Measuring System Employing a Luminescent Sensor and Methods of Designing the System
Patent:
5,414,266 →
Application:
08/075,680 →
Apparatus and Method for Measuring Temperatures at a Plurality of Locations Using Luminescent-Type Temperature Sensors Which Are Excited in a Time Sequence
Patent:
5,470,155 →
Application:
08/075,743 →
Optical Techniques of Measuring Endpoint During the Processing of Material Layers in an Optically Hostile Environment
Patent:
5,499,733 →
Application:
08/122,207 →
Non-Contact Optical Techniques for Measuring Surface Conditions
Patent:
5,490,728 →
Application:
08/180,641 →
Non-Contact Optical Techniques for Measuring Surface Conditions
Patent:
5,769,540 →
Application:
08/180,852 →
Electro-Optical Board Assembly for Measuring the Temperature of an Object Surface from Infra-Red Emissions Thereof, Including an Automatic Gain Control Therefore
Patent:
5,717,608 →
Application:
08/312,146 →
Interference Removal
Patent:
5,786,886 →
Application:
08/436,946 →
Temperature Measuring System Having Improved Signal Processing and Multiple Optical Sensors
Patent:
5,600,147 →
Application:
08/465,827 →
In Situ Technique for Monitoring and Controlling a Process of Chemical-Mechanical-Polishing via a Radiative Communication Link
Patent:
6,010,538 →
Application:
08/585,164 →
Optical Techniques of Measuring Endpoint During the Processing of Material Layers in an Optically Hostile Environment
Patent:
5,695,660 →
Application:
08/615,417 →
Optical Techniques of Measuring Endpoint During the Processing of Material Layers in an Optically Hostile Environment
Patent:
5,891,352 →
Application:
08/872,885 →
Liquid Etch Endpoint Detection and Process Metrology
Patent:
6,406,641 →
Application:
08/877,537 →
Signal Processing for in Situ Monitoring of the Formation or Removal of a Transparent Layer
Patent:
6,028,669 →
Application:
08/899,470 →
Optical Techniques of Measuring Endpoint During the Processing of Material Layers in an Optically Hostile Environment
Patent:
6,110,752 →
Application:
08/918,907 →
Electro Optical Board Assembly for Measuring the Temperature of an Object Surface from Infra Red Emissiions Thereof Including an Automatic Gain Control Therefore
Patent:
5,897,610 →
Application:
08/938,138 →
Optical Techniques of Measuring Endpoint During the Processing of Material Layers in an Optically Hostile Environment
Patent:
6,426,232 →
Application:
09/097,429 →
Polarization Interferometer Spectrometer with Rotatable Birefringent Element
Patent:
6,222,632 →
Application:
09/287,651 →
Optical Techniques of Measuring Endpoint During the Processing of Material Layers in an Optically Hostile Environment
Patent:
6,077,452 →
Application:
09/291,831 →
Optical Techniques for Measuring Layer Thicknesses and Other Surface Characteristics of Objects Such as Semiconductor Wafers
Patent:
6,570,662 →
Application:
09/317,697 →
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
Patent:
6,413,147 →
Application:
09/505,929 →
Optical Techniques for Measuring Layer Thicknesses and Other Surface Characteristics of Objects Such as Semiconductor Wafers
Patent:
6,654,132 →
Application:
09/577,795 →
In Situ Optical Surface Temperature Measuring Techniques and Devices
Patent:
6,572,265 →
Application:
09/839,857 →
Optical Techniques for Measuring Layer Thicknesses and Other Surface Characteristics of Objects Such as Semiconductor Wafers
Patent:
6,934,040 →
Application:
10/672,558 →
In Situ Optical Surface Temperature Measuring Techniques and Devices
Optical Techniques for Measuring Layer Thicknesses and Other Surface Characteristics of Objects Such as Semiconductor Wafers
In Situ Optical Surface Temperature Measuring Techniques and Devices
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.