Semiconductor device and method of forming interconnect structure with conductive pads having expanded interconnect surface area for enhanced interconnection properties
A semiconductor device has a substrate and first conductive pads formed over the substrate. An interconnect surface area of the first conductive pads is expanded by forming a plurality of recesses into the first conductive pads. The recesses can be an arrangement of concentric rings, arrangement of circular recesses, or arrangement of parallel linear trenches. Alternatively, the interconnect surface area of the first conductive pads is expanded by forming a second conductive pad over the first conductive pad. A semiconductor die has a plurality of interconnect structures formed over a surface of the semiconductor die. The semiconductor die is mounted to the substrate with the interconnect structures contacting the expanded interconnect surface area of the first conductive pads to increase bonding strength of the interconnect structure to the first conductive pads. A mold underfill material is deposited between the semiconductor die and substrate.
1. A method of making a semiconductor device, comprising:
providing a substrate;
forming a plurality of conductive pads over the substrate;
expanding an interconnect surface area of the conductive pads by removing a first portion of the conductive pads to form a plurality of recesses partially into the conductive pads while retaining a second portion of the conductive pads under the recesses; and
disposing a semiconductor die including a plurality of bumps over the substrate by bonding the bumps around the conductive pads and into the recesses of the expanded interconnect surface area of the conductive pads.
2. The method of claim 1 , further including:
forming an insulating layer including patterned openings over the conductive pads; and
forming the recesses through a surface of the conductive pads within the patterned openings of the insulating layer.
3. The method of claim 2 , wherein the patterned openings include ring openings, circular openings, or linear openings.
4. The method of claim 1 , further including:
forming a first conductive layer over the substrate;
forming an insulating layer over the substrate;
forming a second conductive layer over the first conductive layer; and
forming the conductive pads over the second conductive layer.
5. The method of claim 1 , further including depositing a mold underfill material between the semiconductor die and substrate.
6. A method of making a semiconductor device, comprising:
providing a substrate;
forming a first conductive pad over the substrate;
expanding an interconnect surface area of the first conductive pad by forming a second conductive pad over a portion of the first conductive pad; and
disposing a semiconductor die including an interconnect structure over the substrate by bonding the interconnect structure to the first conductive pad and second conductive pad while maintaining the expanded interconnect surface area.
7. The method of claim 6 , wherein the second conductive pad includes a circular shape or ring shape.
8. The method of claim 6 , further including depositing a mold underfill material between the semiconductor die and substrate.
9. The method of claim 6 , further including:
forming a first conductive layer over the substrate;
forming an insulating layer over the substrate;
forming a second conductive layer over the first conductive layer; and
forming the first conductive pad over the second conductive layer.
10. A method of making a semiconductor device, comprising:
providing a substrate;
forming a first conductive pad over the substrate;
expanding an interconnect surface area of the first conductive pad by forming a recess over the first conductive pad; and
disposing a semiconductor die including an interconnect structure over the substrate by bonding the interconnect structure into the expanded interconnect surface area of the first conductive pad.
11. The method of claim 10 , further including forming a plurality of recesses partially into the first conductive pad while retaining a portion of the first conductive pad under the recesses.
12. The method of claim 11 , further including:
forming an insulating layer with patterned openings disposed over the first conductive pad; and
forming the recesses through a surface of the first conductive pad within the patterned openings of the insulating layer.
13. The method of claim 12 , wherein the patterned openings include ring openings, circular openings, or linear openings.
14. The method of claim 10 further including forming a second conductive pad over the first conductive pad.
15. The method of claim 14 , wherein the second conductive pad includes a circular shape or ring shape.
16. The method of claim 10 , further including depositing a mold underfill material between the semiconductor die and substrate.
17. A semiconductor device, comprising:
a substrate;
a first conductive pad formed over the substrate with an expanded interconnect surface area formed over the first conductive pad; and
a semiconductor die including an interconnect structure disposed over the substrate with the interconnect structure bonded around the first conductive pad and into the expanded interconnect surface area of the first conductive pad.
18. The semiconductor device of claim 17 , wherein the expanded interconnect surface area of the first conductive pad includes a plurality of recesses formed partially into the first conductive pad while retaining a portion of the first conductive pad under the recesses.
19. The semiconductor device of claim 18 , wherein the recesses include a ring shape, circular shape, or linear shape.
20. The semiconductor device of claim 17 , wherein the expanded interconnect surface area of the first conductive pad includes a second conductive pad formed over the first conductive pad.
21. The semiconductor device of claim 17 , further including depositing a mold underfill material between the semiconductor die and substrate.