Polishing pad with homogeneous body having discrete protrusions thereon

1. A polishing pad for polishing a substrate, the polishing pad comprising:

a homogeneous body having a polishing side and a back side, the homogeneous body comprising a material having a first hardness, and the polishing side comprising a plurality of protrusions having a pattern;

a plurality of discrete protrusions disposed on and aligned with the plurality of protrusions of the polishing side of the homogeneous body, the plurality of discrete protrusions comprising a material having a second hardness different from the first hardness, and the plurality of discrete protrusions having the pattern; and

a fill layer disposed on the homogeneous body, around the plurality of protrusions of the polishing side of the homogeneous body, the fill layer comprising the material of the plurality of discrete protrusions.

2. The polishing pad of claim 1 , wherein the fill layer is discontinuous with the plurality of discrete protrusions.

3. The polishing pad of claim 1 , wherein both the fill layer and the plurality of discrete protrusions are covalently bonded with the homogeneous body.

4. The polishing pad of claim 1 , wherein the homogeneous body is a molded homogeneous body, wherein the plurality of discrete protrusions is a plurality of molded protrusions, and wherein the fill layer is a molded fill layer.

5. The polishing pad of claim 1 , wherein the material of the homogeneous body comprises a first thermoset polyurethane material, and the material of the plurality of discrete protrusions and the fill layer comprises a second, different, thermoset polyurethane material.

6. The polishing pad of claim 1 , wherein the first hardness of the material of the homogeneous body is less than the second hardness of the material of the plurality of discrete protrusions and the fill layer.

7. The polishing pad of claim 6 , wherein the first hardness is less than approximately 40 Shore D, and the second hardness is greater than approximately 30 Shore D.

8. The polishing pad of claim 7 , wherein the first hardness is less than approximately 25 Shore D, and the second hardness is greater than approximately 40 Shore D.

9. The polishing pad of claim 1 , wherein the first hardness of the material of the homogeneous body is greater than the second hardness of the material of the plurality of discrete protrusions and the fill layer.

10. The polishing pad of claim 9 , wherein the second hardness is less than approximately 40 Shore D, and the first hardness is greater than approximately 30 Shore D.

11. The polishing pad of claim 10 , wherein the second hardness is less than approximately 25 Shore D, and the first hardness is greater than approximately 40 Shore D.

12. The polishing pad of claim 1 , wherein the homogeneous body is substantially circular, and one or more of the plurality of discrete protrusions is a partial circumferential protrusion or an arc-shaped protrusion.

13. The polishing pad of claim 1 , wherein the plurality of discrete protrusions comprises a plurality of tiles selected from the group consisting of circular tiles, oval tiles, square tiles, hexagonal tiles, and rectangular tiles.

14. The polishing pad of claim 1 , wherein each of the plurality of discrete protrusions has, in a global plane of the polishing side of the homogeneous body, a shortest dimension approximately in the range of 5-50 millimeters.

15. The polishing pad of claim 1 , further comprising:

a detection region disposed in the back side of the homogeneous body.

16. The polishing pad of claim 1 , further comprising:

a local area transparency (LAT) region disposed in the homogeneous body.